JPH0429213B2 - - Google Patents
Info
- Publication number
- JPH0429213B2 JPH0429213B2 JP1234596A JP23459689A JPH0429213B2 JP H0429213 B2 JPH0429213 B2 JP H0429213B2 JP 1234596 A JP1234596 A JP 1234596A JP 23459689 A JP23459689 A JP 23459689A JP H0429213 B2 JPH0429213 B2 JP H0429213B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- optical system
- laser beam
- scanning
- detection device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 claims description 58
- 238000001514 detection method Methods 0.000 claims description 48
- 210000001747 pupil Anatomy 0.000 claims description 31
- 238000006073 displacement reaction Methods 0.000 claims description 8
- 238000007493 shaping process Methods 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 47
- 238000010586 diagram Methods 0.000 description 27
- 230000004907 flux Effects 0.000 description 13
- 230000010287 polarization Effects 0.000 description 7
- 230000010355 oscillation Effects 0.000 description 6
- 238000012937 correction Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000005357 flat glass Substances 0.000 description 3
- 230000002265 prevention Effects 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 239000013256 coordination polymer Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1234596A JPH02191314A (ja) | 1989-09-12 | 1989-09-12 | パターン検出装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1234596A JPH02191314A (ja) | 1989-09-12 | 1989-09-12 | パターン検出装置 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58005184A Division JPS59132126A (ja) | 1983-01-14 | 1983-01-18 | 位置合わせ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02191314A JPH02191314A (ja) | 1990-07-27 |
| JPH0429213B2 true JPH0429213B2 (en, 2012) | 1992-05-18 |
Family
ID=16973512
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1234596A Granted JPH02191314A (ja) | 1989-09-12 | 1989-09-12 | パターン検出装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02191314A (en, 2012) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6826424B1 (en) * | 2000-12-19 | 2004-11-30 | Haishan Zeng | Methods and apparatus for fluorescence and reflectance imaging and spectroscopy and for contemporaneous measurements of electromagnetic radiation with multiple measuring devices |
| JP5261665B2 (ja) * | 2008-05-27 | 2013-08-14 | 株式会社ブイ・テクノロジー | 近接露光装置 |
| JP5637931B2 (ja) * | 2011-05-17 | 2014-12-10 | キヤノン株式会社 | インプリント装置、インプリント方法およびデバイス製造方法 |
| JP5800977B2 (ja) * | 2014-10-23 | 2015-10-28 | キヤノン株式会社 | インプリント装置、インプリント方法およびデバイス製造方法 |
| JP6039770B2 (ja) * | 2015-08-27 | 2016-12-07 | キヤノン株式会社 | インプリント装置およびデバイス製造方法 |
-
1989
- 1989-09-12 JP JP1234596A patent/JPH02191314A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02191314A (ja) | 1990-07-27 |
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