JPH0427692B2 - - Google Patents
Info
- Publication number
- JPH0427692B2 JPH0427692B2 JP19785181A JP19785181A JPH0427692B2 JP H0427692 B2 JPH0427692 B2 JP H0427692B2 JP 19785181 A JP19785181 A JP 19785181A JP 19785181 A JP19785181 A JP 19785181A JP H0427692 B2 JPH0427692 B2 JP H0427692B2
- Authority
- JP
- Japan
- Prior art keywords
- oxide film
- silicon
- silicon oxide
- element isolation
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/76224—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using trench refilling with dielectric materials
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Local Oxidation Of Silicon (AREA)
- Element Separation (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19785181A JPS5898935A (ja) | 1981-12-09 | 1981-12-09 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19785181A JPS5898935A (ja) | 1981-12-09 | 1981-12-09 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5898935A JPS5898935A (ja) | 1983-06-13 |
| JPH0427692B2 true JPH0427692B2 (enrdf_load_stackoverflow) | 1992-05-12 |
Family
ID=16381387
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19785181A Granted JPS5898935A (ja) | 1981-12-09 | 1981-12-09 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5898935A (enrdf_load_stackoverflow) |
-
1981
- 1981-12-09 JP JP19785181A patent/JPS5898935A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5898935A (ja) | 1983-06-13 |
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