JPH04258957A - ポジ型感光性電着樹脂組成物 - Google Patents

ポジ型感光性電着樹脂組成物

Info

Publication number
JPH04258957A
JPH04258957A JP3020922A JP2092291A JPH04258957A JP H04258957 A JPH04258957 A JP H04258957A JP 3020922 A JP3020922 A JP 3020922A JP 2092291 A JP2092291 A JP 2092291A JP H04258957 A JPH04258957 A JP H04258957A
Authority
JP
Japan
Prior art keywords
group
acid
polymer
ionic hydrophilic
side chain
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3020922A
Other languages
English (en)
Japanese (ja)
Inventor
Akira Matsumura
晃 松村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Priority to JP3020922A priority Critical patent/JPH04258957A/ja
Priority to EP92102425A priority patent/EP0501243A1/en
Priority to KR1019920002104A priority patent/KR920016898A/ko
Priority to TW081101132A priority patent/TW221500B/zh
Publication of JPH04258957A publication Critical patent/JPH04258957A/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/04Chromates
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/039Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • G03F7/164Coating processes; Apparatus therefor using electric, electrostatic or magnetic means; powder coating

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Optical Filters (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP3020922A 1991-02-14 1991-02-14 ポジ型感光性電着樹脂組成物 Pending JPH04258957A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP3020922A JPH04258957A (ja) 1991-02-14 1991-02-14 ポジ型感光性電着樹脂組成物
EP92102425A EP0501243A1 (en) 1991-02-14 1992-02-13 Positive type photosensitive electrocoating resin composition
KR1019920002104A KR920016898A (ko) 1991-02-14 1992-02-13 포지형 감광성 전착 수지 조성물
TW081101132A TW221500B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-02-14 1992-02-17

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3020922A JPH04258957A (ja) 1991-02-14 1991-02-14 ポジ型感光性電着樹脂組成物

Publications (1)

Publication Number Publication Date
JPH04258957A true JPH04258957A (ja) 1992-09-14

Family

ID=12040716

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3020922A Pending JPH04258957A (ja) 1991-02-14 1991-02-14 ポジ型感光性電着樹脂組成物

Country Status (4)

Country Link
EP (1) EP0501243A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPH04258957A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
KR (1) KR920016898A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
TW (1) TW221500B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5384229A (en) 1992-05-07 1995-01-24 Shipley Company Inc. Photoimageable compositions for electrodeposition
EP0653681B1 (en) * 1993-11-17 2000-09-13 AT&T Corp. A process for device fabrication using an energy sensitive composition
JP6195445B2 (ja) * 2012-02-27 2017-09-13 東京応化工業株式会社 ポジ型ホトレジスト組成物、ホトレジスト積層体、ホトレジストパターンの製造方法、及び接続端子の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0265387B1 (en) * 1986-10-23 1995-11-15 Ciba-Geigy Ag Method of forming images
JP2593305B2 (ja) * 1987-02-02 1997-03-26 日本ペイント株式会社 ポジ型感光性樹脂組成物
JP2585070B2 (ja) * 1988-08-02 1997-02-26 日本ペイント株式会社 画像形成方法
US5045431A (en) * 1990-04-24 1991-09-03 International Business Machines Corporation Dry film, aqueous processable photoresist compositions
JPH0488346A (ja) * 1990-07-31 1992-03-23 Nippon Paint Co Ltd レジスト組成物

Also Published As

Publication number Publication date
EP0501243A1 (en) 1992-09-02
TW221500B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1994-03-01
KR920016898A (ko) 1992-09-25

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