KR920016898A - 포지형 감광성 전착 수지 조성물 - Google Patents
포지형 감광성 전착 수지 조성물 Download PDFInfo
- Publication number
- KR920016898A KR920016898A KR1019920002104A KR920002104A KR920016898A KR 920016898 A KR920016898 A KR 920016898A KR 1019920002104 A KR1019920002104 A KR 1019920002104A KR 920002104 A KR920002104 A KR 920002104A KR 920016898 A KR920016898 A KR 920016898A
- Authority
- KR
- South Korea
- Prior art keywords
- resin composition
- acid
- electrodeposition resin
- group
- composition according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000004070 electrodeposition Methods 0.000 title claims 12
- 239000011342 resin composition Substances 0.000 title claims 12
- 239000002253 acid Substances 0.000 claims 13
- 239000000178 monomer Substances 0.000 claims 7
- 150000002500 ions Chemical group 0.000 claims 6
- 230000003472 neutralizing effect Effects 0.000 claims 4
- 229920000642 polymer Polymers 0.000 claims 4
- 229920002959 polymer blend Polymers 0.000 claims 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims 3
- 239000003795 chemical substances by application Substances 0.000 claims 3
- 239000000203 mixture Chemical group 0.000 claims 3
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 claims 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims 2
- 150000007513 acids Chemical class 0.000 claims 2
- 230000000379 polymerizing effect Effects 0.000 claims 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 claims 2
- 239000007787 solid Substances 0.000 claims 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 claims 2
- 229920002554 vinyl polymer Polymers 0.000 claims 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims 1
- 229910021529 ammonia Inorganic materials 0.000 claims 1
- 239000012736 aqueous medium Substances 0.000 claims 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims 1
- 125000002843 carboxylic acid group Chemical group 0.000 claims 1
- 125000005520 diaryliodonium group Chemical group 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N phosphonic acid group Chemical group P(O)(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims 1
- 229910000027 potassium carbonate Inorganic materials 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 150000003839 salts Chemical class 0.000 claims 1
- 125000003748 selenium group Chemical class *[Se]* 0.000 claims 1
- 229910000029 sodium carbonate Inorganic materials 0.000 claims 1
- 125000000542 sulfonic acid group Chemical group 0.000 claims 1
- XKXIQBVKMABYQJ-UHFFFAOYSA-M tert-butyl carbonate Chemical compound CC(C)(C)OC([O-])=O XKXIQBVKMABYQJ-UHFFFAOYSA-M 0.000 claims 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims 1
- 125000005409 triarylsulfonium group Chemical group 0.000 claims 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/164—Coating processes; Apparatus therefor using electric, electrostatic or magnetic means; powder coating
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Paints Or Removers (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3020922A JPH04258957A (ja) | 1991-02-14 | 1991-02-14 | ポジ型感光性電着樹脂組成物 |
| JP91-20922 | 1991-02-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR920016898A true KR920016898A (ko) | 1992-09-25 |
Family
ID=12040716
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019920002104A Withdrawn KR920016898A (ko) | 1991-02-14 | 1992-02-13 | 포지형 감광성 전착 수지 조성물 |
Country Status (4)
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5384229A (en) | 1992-05-07 | 1995-01-24 | Shipley Company Inc. | Photoimageable compositions for electrodeposition |
| DE69425862T2 (de) * | 1993-11-17 | 2001-05-03 | At & T Corp., New York | Verfahren zur Herstellung einer Vorrichtung unter Benutzung einer lichtempfindlichen Zusammensetzung |
| JP6195445B2 (ja) * | 2012-02-27 | 2017-09-13 | 東京応化工業株式会社 | ポジ型ホトレジスト組成物、ホトレジスト積層体、ホトレジストパターンの製造方法、及び接続端子の製造方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0662636A3 (en) * | 1986-10-23 | 1995-11-22 | Ciba Geigy Ag | Imaging processes. |
| JP2593305B2 (ja) * | 1987-02-02 | 1997-03-26 | 日本ペイント株式会社 | ポジ型感光性樹脂組成物 |
| JP2585070B2 (ja) * | 1988-08-02 | 1997-02-26 | 日本ペイント株式会社 | 画像形成方法 |
| US5045431A (en) * | 1990-04-24 | 1991-09-03 | International Business Machines Corporation | Dry film, aqueous processable photoresist compositions |
| JPH0488346A (ja) * | 1990-07-31 | 1992-03-23 | Nippon Paint Co Ltd | レジスト組成物 |
-
1991
- 1991-02-14 JP JP3020922A patent/JPH04258957A/ja active Pending
-
1992
- 1992-02-13 KR KR1019920002104A patent/KR920016898A/ko not_active Withdrawn
- 1992-02-13 EP EP92102425A patent/EP0501243A1/en not_active Ceased
- 1992-02-17 TW TW081101132A patent/TW221500B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| JPH04258957A (ja) | 1992-09-14 |
| TW221500B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1994-03-01 |
| EP0501243A1 (en) | 1992-09-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 19920213 |
|
| PG1501 | Laying open of application | ||
| PC1203 | Withdrawal of no request for examination | ||
| WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |