JPH0425223Y2 - - Google Patents
Info
- Publication number
- JPH0425223Y2 JPH0425223Y2 JP11865685U JP11865685U JPH0425223Y2 JP H0425223 Y2 JPH0425223 Y2 JP H0425223Y2 JP 11865685 U JP11865685 U JP 11865685U JP 11865685 U JP11865685 U JP 11865685U JP H0425223 Y2 JPH0425223 Y2 JP H0425223Y2
- Authority
- JP
- Japan
- Prior art keywords
- electrodes
- disk
- electrode
- substrate
- pair
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 21
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 238000001816 cooling Methods 0.000 description 6
- 239000012212 insulator Substances 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 4
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11865685U JPH0425223Y2 (enExample) | 1985-07-31 | 1985-07-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11865685U JPH0425223Y2 (enExample) | 1985-07-31 | 1985-07-31 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6228839U JPS6228839U (enExample) | 1987-02-21 |
| JPH0425223Y2 true JPH0425223Y2 (enExample) | 1992-06-16 |
Family
ID=31005316
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11865685U Expired JPH0425223Y2 (enExample) | 1985-07-31 | 1985-07-31 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0425223Y2 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7590851B2 (ja) | 2020-11-04 | 2024-11-27 | エドワーズ株式会社 | 真空ポンプ |
-
1985
- 1985-07-31 JP JP11865685U patent/JPH0425223Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6228839U (enExample) | 1987-02-21 |
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