JPH04231433A - Electrifying material - Google Patents

Electrifying material

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Publication number
JPH04231433A
JPH04231433A JP41777490A JP41777490A JPH04231433A JP H04231433 A JPH04231433 A JP H04231433A JP 41777490 A JP41777490 A JP 41777490A JP 41777490 A JP41777490 A JP 41777490A JP H04231433 A JPH04231433 A JP H04231433A
Authority
JP
Japan
Prior art keywords
plating
migration
resistance
weldability
heat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP41777490A
Other languages
Japanese (ja)
Inventor
Tamio Toe
東江 民夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Nippon Mining Co Ltd
Nikko Kyodo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining Co Ltd, Nikko Kyodo Co Ltd filed Critical Nippon Mining Co Ltd
Priority to JP41777490A priority Critical patent/JPH04231433A/en
Publication of JPH04231433A publication Critical patent/JPH04231433A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To obtain an electrifying material having high strength and high electric conductivity and excellent in migration resistance, thermal peeling resistance of plating, etc., by specifying a composition consisting of Ni, P, Fe, Cr, Mn, Mg, Co, and Cu. CONSTITUTION:The electrifying material can be obtained by providing a composition consisting of, by weight, 0.5-3.0% Ni, 0.05-1.0% P, 0.05-5.0% of one or more elements among Fe, Cr, Mn, Mg, and Co, and the balance Cu with inevitable impurities and further containing, if necessary, 0.1-3.0% Zn and/or 0.001-5.0% of one or more elements among Ti, Sn, Al, B, As, Sb, Ag, Pb, Be, and Zr as accessory components. This electrifying material has high strength and high electric conductivity and also has superior migration resistance, thermal peeling resistance of solder plating and tin plating, weldability, and hot rollability.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、リードフレーム、端子
、コネクター、バスバー(ブスバーともいう)間でのマ
イグレーションの発生を抑えた電気部品材料用の通電材
料に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a current-carrying material for electrical parts that suppresses migration between lead frames, terminals, connectors, and bus bars (also referred to as bus bars).

【0002】0002

【従来の技術】近年、電子、電気機器等の小型軽量化が
進み、使用されるコネクター等の部品も小型化するとと
もに、部品間の距離も著しく短くなる傾向にある。又、
回路はますます集積化される傾向にある。すなわち、従
来、個々の電子部品はリード線により接続されて回路が
形成されていたが、部品数が増すに従い回路が複雑とな
るので、これらを集積化することにより回路の小型化が
進められている。
2. Description of the Related Art In recent years, electronic and electrical equipment, etc. have become smaller and lighter, and the parts used, such as connectors, have become smaller and the distances between parts have also tended to become significantly shorter. or,
Circuits are becoming increasingly integrated. In other words, in the past, individual electronic components were connected by lead wires to form a circuit, but as the number of components increases, circuits become more complex, so circuits are becoming smaller by integrating them. There is.

【0003】0003

【発明が解決しようとする課題】従来の小型化、集積化
された回路において、異なる回路又は配線が小型化のた
めにわずかな間隔をおいて隔てられているが、この間隔
内に水などの電解質が介在すると電気化学的反応が生じ
、高電位側の通電部の材料となっている銅合金から溶解
した銅イオンが低電位側で析出し、更にその量が増すと
短絡する現象が生じる。この現象をマイグレーションと
いい、このようなマイグレーションが起ると、回路が正
常に機能しなくなる。したがって、近年では高い導電率
を有し、かつ、マイグレーションの発生しない材料が強
く望まれていた。
[Problems to be Solved by the Invention] In conventional miniaturized and integrated circuits, different circuits or wiring are separated by a small interval for miniaturization, but there is a problem that water, etc. When an electrolyte is present, an electrochemical reaction occurs, and copper ions dissolved from the copper alloy that is the material of the current-carrying part on the high-potential side are deposited on the low-potential side, and when the amount increases further, a short circuit occurs. This phenomenon is called migration, and when such migration occurs, the circuit no longer functions properly. Therefore, in recent years, there has been a strong desire for materials that have high electrical conductivity and do not cause migration.

【0004】Cu−Ni−P系合金は特開平1−242
740により公知のように耐マイグレーション性に優れ
、かつ高強度で高導電性を有し、リードフレームや端子
、コネクター、バスバーなどの通電材料に適した合金で
あるが、本発明者が研究を進めた結果、溶接や熱間圧延
時に割れが発生し易く、製造性や半田めっき、Snめっ
きなどの耐熱剥離性に問題があり、めっきを要する製品
に使用するのには問題があった。
[0004] Cu-Ni-P alloy is disclosed in Japanese Patent Application Laid-Open No. 1-242.
740 is an alloy that has excellent migration resistance, high strength, and high conductivity, and is suitable for conductive materials such as lead frames, terminals, connectors, and bus bars. As a result, cracks tend to occur during welding or hot rolling, and there are problems with manufacturability and heat-resistant peeling properties for solder plating, Sn plating, etc., and there are problems in using it for products that require plating.

【0005】[0005]

【課題を解決するための手段】本発明者らは上記の問題
点に鑑み研究を進め、Cu−Ni−P系合金にFe、C
r、Mn、Mg、Coのうち1種又は2種以上を添加す
ることにより、耐マイグレーション性に優れ、高強度で
高導電性に優れるという特性を損うことなく、溶接性、
熱間圧延性及び半田めっきやSnめっきの耐熱剥離性を
改善することを見出したものであり、リードフレーム、
端子、コネクター、バスバー等の通電材料として、Ni
0.5〜3.0wt%、P0.05〜1.0wt%とF
e、Cr、Mn、Mg、Coのうち1種又は2種以上を
0.05〜5.0wt%含み、あるいはこれにZn0.
1〜3.0%を含み、あるいはさらに上記双方に副成分
として、Ti、Sn、Al、B、As、Sb、Ag、P
b、Be、Zrからなる群の1種又は2種以上を総量で
0.001〜5.0wt%含み、残部Cu及び不可避的
不純物からなることを特徴とするものである。
[Means for Solving the Problems] The present inventors have conducted research in view of the above problems, and have developed a method for adding Fe and C to Cu-Ni-P alloys.
By adding one or more of r, Mn, Mg, and Co, weldability and
It has been discovered that hot rolling properties and heat peeling properties of solder plating and Sn plating can be improved, and lead frames,
Ni can be used as a conductive material for terminals, connectors, bus bars, etc.
0.5-3.0wt%, P0.05-1.0wt% and F
containing 0.05 to 5.0 wt% of one or more of e, Cr, Mn, Mg, and Co, or Zn0.
1 to 3.0%, or further contains Ti, Sn, Al, B, As, Sb, Ag, P as subcomponents in both of the above.
It is characterized in that it contains one or more of the group consisting of Zr, Be, and Zr in a total amount of 0.001 to 5.0 wt%, and the balance consists of Cu and inevitable impurities.

【0006】本発明にしたがってCuに添加される元素
のそれぞれの添加量は次のことを考慮して定められる。 すなわち、まずNiは銅及び銅合金に含有されることに
より、銅及び銅合金のマイグレーション性を抑制する効
果を有する元素である。
According to the present invention, the amount of each element added to Cu is determined in consideration of the following. That is, first of all, Ni is an element that has the effect of suppressing the migration property of copper and copper alloys by being contained in copper and copper alloys.

【0007】マイグレーション現象を抑制する機構は明
確ではないが、Niの存在によりCuイオンの溶出量が
減少し、Niの化合物の生成により、析出したCu粒子
を介する通電が妨害されることによって、電極間のマイ
グレーション現象が抑制されると推察される。
Although the mechanism for suppressing the migration phenomenon is not clear, the presence of Ni reduces the elution amount of Cu ions, and the formation of Ni compounds obstructs the conduction of electricity through the deposited Cu particles. It is presumed that the migration phenomenon between them is suppressed.

【0008】NiとPを同時に含有させるのは、Niと
Pは化合物をつくって、銅及び銅合金中に析出するため
、Ni又はPを単独で含有する場合より強度、誘電率を
向上させるからである。
[0008] The reason why Ni and P are contained at the same time is that Ni and P form a compound and precipitate into the copper and copper alloy, which improves the strength and dielectric constant compared to when Ni or P is contained alone. It is.

【0009】Ni含有量を0.5〜3.0wt%とする
理由はNi含有量が0.5wt%未満では、マイグレー
ション現象を抑制する効果がなく、3.0wt%を超え
るとマイグレーション現象の抑制効果はあるが、導電率
が低下し、通電時の発熱量が大きくなり、熱放散性も低
くなるためである。
[0009] The reason for setting the Ni content to 0.5 to 3.0 wt% is that if the Ni content is less than 0.5 wt%, it will not be effective in suppressing the migration phenomenon, and if it exceeds 3.0 wt%, the migration phenomenon will not be suppressed. This is because although it is effective, the conductivity decreases, the amount of heat generated when electricity is applied increases, and the heat dissipation performance also decreases.

【0010】P含有量を0.05〜1.0wt%とする
理由は、P含有量が0.05wt%未満ではNiと化合
物をつくって強度、導電率を向上させる効果が少なく、
1.0wt%を超えると導電率の低下が著しく、又、半
田めっき、Snめっきの耐熱剥離性、溶接性及び熱間圧
延性が低下するためである。
[0010] The reason why the P content is set to 0.05 to 1.0 wt% is that if the P content is less than 0.05 wt%, the effect of forming a compound with Ni and improving strength and conductivity is small;
This is because if it exceeds 1.0 wt%, the electrical conductivity decreases significantly, and the heat peelability, weldability, and hot rollability of solder plating and Sn plating decrease.

【0011】Zn含有量を0.1〜3.0wt%とする
理由は、ZnはNiと共添されることによりNiのマイ
グレーション現象の抑制効果を助長するとともにSnめ
っきや半田めっきの耐熱剥離性を改善するためであり、
0.1wt%未満ではその効果は低く、3.0wt%を
超えると導電率の低下が著しくなるためである。
[0011] The reason why the Zn content is set to 0.1 to 3.0 wt% is that Zn promotes the effect of suppressing the Ni migration phenomenon by being co-added with Ni, and also improves the heat-resistant peeling property of Sn plating and solder plating. The purpose is to improve
This is because if the content is less than 0.1 wt%, the effect will be low, and if it exceeds 3.0 wt%, the conductivity will decrease significantly.

【0012】Fe、Cr、Mn、Mg、Coのうち1種
又は2種以上を0.05〜5.0wt%とする理由は、
これらの元素はマイグレーション現象の抑制効果をもつ
とともに、Pと化合物を作りやすく、そのためNiとP
の化合物が粗大化するのを防止して溶接性や熱間圧延性
を改善し、かつPの固溶量を減少させ、Snめっきや半
田めっきの耐熱剥離性の改善にも寄与するものであるが
、0.05wt%未満ではその効果は低く、5.0wt
%を超えると導電率の低下が著しくなるためである。
[0012] The reason why one or more of Fe, Cr, Mn, Mg, and Co is set at 0.05 to 5.0 wt% is as follows.
These elements have the effect of suppressing the migration phenomenon and easily form compounds with P, so Ni and P
It prevents the compounds from becoming coarse and improves weldability and hot rollability, and also reduces the amount of solid solution of P, contributing to improving the heat peeling properties of Sn plating and solder plating. However, the effect is low below 0.05wt%, and 5.0wt%
%, the conductivity will drop significantly.

【0013】さらに、副成分としてTi、Sn、Al、
B、As、Sb、Ag、Be、Zr、からなる群から1
種又は2種以上を総量で0.001〜5.0wt%含む
理由は、強度を向上させるためであるが、0.001w
t%未満ではその効果はなく、逆に5.0wt%を超え
ると導電性が低下するためである。
Furthermore, Ti, Sn, Al,
1 from the group consisting of B, As, Sb, Ag, Be, Zr
The reason for including the species or two or more species in a total amount of 0.001 to 5.0 wt% is to improve the strength, but 0.001 w
This is because if it is less than t%, there is no effect, and if it exceeds 5.0wt%, the conductivity decreases.

【0014】[0014]

【実施例】以下に本発明の具体例を示す。[Example] Specific examples of the present invention are shown below.

【0015】まず表1に示す組成の本発明合金を大気中
又は不活性雰囲気中で溶解鋳造し、面削後熱間圧延し、
その後、冷却圧延と焼鈍酸洗をくり返し、比較合金No
.11、12以外は450℃で10時間最終焼鈍、酸洗
後加工度20%で冷間圧延した0.8mmの厚さの板を
得た。そして、#1200エメリー紙で表面研摩した。   なお、比較合金No.11、12はそれぞれ市販の
タフピッチ銅と黄銅1種を用いた。
First, the alloy of the present invention having the composition shown in Table 1 was melted and cast in the air or an inert atmosphere, and hot rolled after facing.
After that, cooling rolling, annealing and pickling were repeated, and comparative alloy No.
.. All specimens other than No. 11 and No. 12 were final annealed at 450° C. for 10 hours, pickled, and then cold-rolled at a workability of 20% to obtain a plate with a thickness of 0.8 mm. Then, the surface was polished with #1200 emery paper. In addition, comparative alloy No. For Nos. 11 and 12, commercially available tough pitch copper and one type of brass were used, respectively.

【0016】[0016]

【表1】 こうして得られた供試材について引張強さ、伸び、導電
率、Snめっき及び半田めっきの耐熱剥離性、溶接性及
び耐マイグレーション性を評価した。結果を表2に示す
。又、溶解鋳造後面削したインゴットを用いて熱間圧延
性を調査した。
[Table 1] The test materials thus obtained were evaluated for tensile strength, elongation, electrical conductivity, heat peeling resistance of Sn plating and solder plating, weldability, and migration resistance. The results are shown in Table 2. In addition, hot rolling properties were investigated using ingots that had been melted and cast and then face-milled.

【0017】Snめっきの耐熱剥離性は銅下地めっき上
にSnめっきを施した10mm×50mmの短冊試験片
を150℃にて所定時間加熱した後、90°曲げを往復
1回行ない、曲げ部のめっきが剥離する時間を測定した
[0017] The heat-resistant peeling property of Sn plating was determined by heating a 10 mm x 50 mm strip test piece of Sn plating on a copper base plating for a predetermined time at 150°C, and then bending it back and forth by 90° once. The time required for the plating to peel off was measured.

【0018】半田めっきの耐熱剥離性は90%Sn10
%Pbの光沢半田めっきを施した10mm×50mmの
短冊試験片を大気中で150℃にて所定時間加熱した後
、90°曲げを往復1回行い曲げ部のめっきが剥離する
時間を測定した。
[0018] Heat-resistant peelability of solder plating is 90% Sn10
A 10 mm x 50 mm strip test piece coated with % Pb gloss solder was heated in the air at 150° C. for a predetermined time, then bent 90° back and forth once, and the time it took for the plating to peel off at the bent portion was measured.

【0019】溶接性は、80mm×200mmの供試材
中央にイナートガスアーク溶接により長さ100mmの
溶接ビードを作製後割れの有無を5倍の拡大鏡にて観察
した。耐マイグレーション性は供試材を10mm×10
0mmに切断し、2枚1組として、図1に示すようにセ
ットした供試材を図2に示すようにして水道水中(30
0cc)中に浸漬した。次にこの2枚の供試材に14V
の直流電圧を加え、経過時間に対する電流値の変化を記
録計にて測定した。この結果の代表例を図3に示す。 又、各供試材における電流値が1.0Aになるまでの時
間(図3中矢印)を表2に示す。
Weldability was determined by making a weld bead with a length of 100 mm in the center of a 80 mm x 200 mm specimen by inert gas arc welding, and then observing the presence or absence of cracks using a 5x magnifying glass. Migration resistance test material was 10mm x 10
The test material was cut to 0 mm and set as a set of two pieces as shown in Figure 1, and then soaked in tap water (30 mm) as shown in Figure 2.
0cc). Next, apply 14V to these two test materials.
A direct current voltage of 200 mL was applied, and the change in current value with respect to elapsed time was measured using a recorder. A representative example of this result is shown in FIG. Further, Table 2 shows the time required for the current value to reach 1.0 A (arrow in FIG. 3) for each sample material.

【0020】[0020]

【表2】 熱間圧延性は各供試材のインゴットを800℃で一定時
間加熱後、板厚25mmより8mmまで熱間圧延を行な
い、割れの有無を目視にて観察した。
[Table 2] Hot rolling property was determined by heating an ingot of each test material at 800° C. for a certain period of time, then hot rolling from a plate thickness of 25 mm to 8 mm, and visually observing the presence or absence of cracks.

【0021】表2より、本発明合金No1〜6は、いず
れも導電率が57%IACS以上でかつ強度とSnめっ
きと半田めっきの耐熱剥離性及び耐マイグレーション性
に優れリードフレームや自動車の端子、コネクター、バ
スバー等の耐マイグレーション性の求められる通電材料
として最適な合金であり、さらに、溶接性と熱間圧延性
が良好で製造性に優れる合金である。
From Table 2, alloys Nos. 1 to 6 of the present invention all have electrical conductivity of 57% IACS or higher, and are excellent in strength, heat peeling resistance of Sn plating and solder plating, and migration resistance, and are suitable for use in lead frames, automobile terminals, This alloy is ideal for electrically conductive materials that require migration resistance, such as connectors and bus bars. Furthermore, it has good weldability, hot rolling properties, and excellent manufacturability.

【0022】また、本発明合金No.2と3よりZnを
含有させることにより、さらにSnめっきと半田めっき
の耐熱剥離性と耐マイグレーション性が改善される。
[0022] Also, the alloy No. of the present invention. By containing Zn from 2 and 3, the heat peeling resistance and migration resistance of Sn plating and solder plating are further improved.

【0023】比較合金No.7、8、13は本発明合金
No.2、4、5に比べ、Cr、Mn、Mg、Co及び
Feを含まないため、Snめっき及び半田めっきの耐熱
剥離性が悪くさらに溶接性と熱間圧延性が悪いし、また
耐マイグレーション性も低下している。比較合金No.
9はPを含有しないため、NiがPとの化合物として析
出せず、強度と導電率が低い。比較合金No.10はN
iとPの含有量が多すぎるため、導電率が低く、Snめ
っき、半田めっきの耐熱剥離性と溶接性および熱間圧延
性が悪い。比較合金No.11はタフピッチ銅だが強度
が低く、耐マイグレーション性が悪い。No.12は従
来自動車のバスバー等に用いられる黄銅1種で耐マイグ
レーション性は高いが、導電率が低い。
Comparative alloy No. 7, 8, and 13 are alloy Nos. 7, 8, and 13 of the present invention. Compared to 2, 4, and 5, it does not contain Cr, Mn, Mg, Co, and Fe, so the heat peeling resistance of Sn plating and solder plating is poor, and the weldability and hot rolling property are poor, and the migration resistance is also poor. It is declining. Comparative alloy No.
Since No. 9 does not contain P, Ni does not precipitate as a compound with P, and the strength and conductivity are low. Comparative alloy No. 10 is N
Since the content of i and P is too large, the conductivity is low, and the heat-resistant peelability, weldability, and hot rollability of Sn plating and solder plating are poor. Comparative alloy No. Although No. 11 is tough pitch copper, its strength is low and its migration resistance is poor. No. No. 12 is a type of brass conventionally used for automobile bus bars, etc., and has high migration resistance but low electrical conductivity.

【0024】[0024]

【発明の効果】本発明の通電材料は高い導電率を有し、
かつ耐マイグレーション性、めっきの耐熱剥離性および
溶接性や熱間圧延性の優れた材料である。
[Effect of the invention] The current-carrying material of the present invention has high electrical conductivity,
Moreover, it is a material with excellent migration resistance, heat peeling resistance of plating, weldability, and hot rollability.

【図面の簡単な説明】[Brief explanation of the drawing]

【図1】耐マイグレーション性のテストのための供試材
の斜視図である。
FIG. 1 is a perspective view of a sample material for a migration resistance test.

【図2】同テストの説明図である。FIG. 2 is an explanatory diagram of the test.

【図3】耐マイグレーションテスト結果を示すグラフで
ある。
FIG. 3 is a graph showing migration resistance test results.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】  Ni0.5〜3.0wt%,P0.0
5〜1.0wt%とFe、Cr、Mn、Mg、Coのう
ち1種又は2種以上を0.05〜5.0wt%含み、残
部Cuおよび不可避的不純物からなることを特徴とする
通電材料。
[Claim 1] Ni0.5-3.0wt%, P0.0
5 to 1.0 wt% and 0.05 to 5.0 wt% of one or more of Fe, Cr, Mn, Mg, and Co, with the balance consisting of Cu and inevitable impurities. .
【請求項2】  Ni0.5〜3.0wt%,P0.0
5〜1.0wt%と、Fe、Cr、Mn、Mg、Coの
うち1種又は2種以上を0.05〜5.0wt%、さら
に、副成分としてTi、Sn、Al、B、As、Sb、
Ag、Pb、Be、Zrからなる群から1種又は2種以
上を総量で0.001〜5.0wt%含み、残部Cuお
よび不可避的不純物からなることを特徴とする通電材料
[Claim 2] Ni0.5-3.0wt%, P0.0
5 to 1.0 wt%, and 0.05 to 5.0 wt% of one or more of Fe, Cr, Mn, Mg, and Co, and further subcomponents of Ti, Sn, Al, B, As, Sb,
1. A current-carrying material characterized in that it contains one or more of the group consisting of Ag, Pb, Be, and Zr in a total amount of 0.001 to 5.0 wt%, with the balance consisting of Cu and inevitable impurities.
【請求項3】  Ni0.5〜3.0wt%、P0.0
5〜1.0wt%、Zn0.1〜3.0wt%と、Fe
、Cr、Mn、Mg、Coのうち1種又は2種以上を0
.05〜5.0wt%含み、残部Cu及び不可避的不純
物からなることを特徴とする通電材料。
[Claim 3] Ni0.5-3.0wt%, P0.0
5 to 1.0 wt%, Zn0.1 to 3.0 wt%, and Fe
, Cr, Mn, Mg, and Co.
.. A current-carrying material characterized in that it contains 05 to 5.0 wt% of Cu, and the remainder consists of Cu and unavoidable impurities.
【請求項4】  Ni0.5〜3.0wt%、P0.0
5〜1.0wt%、Zn0.1〜3.0wt%と、Fe
、Cr、Mn、Mg、Coのうち1種又は2種以上を0
.05〜5.0wt%、さらに副成分としてTi、Sn
、Al、B、As、Sb、Ag、Pb、Be、Zrから
なる群から1種又は2種以上を総量で0.001〜5.
0wt%含み、残部Cu及び不可避的不純物からなるこ
とを特徴とする通電材料。
[Claim 4] Ni0.5-3.0wt%, P0.0
5 to 1.0 wt%, Zn0.1 to 3.0 wt%, and Fe
, Cr, Mn, Mg, and Co.
.. 05 to 5.0 wt%, and further contains Ti and Sn as subcomponents.
, Al, B, As, Sb, Ag, Pb, Be, and Zr in a total amount of 0.001 to 5.
A current-carrying material characterized by containing 0 wt% of Cu and the remainder consisting of Cu and unavoidable impurities.
JP41777490A 1990-12-27 1990-12-27 Electrifying material Pending JPH04231433A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP41777490A JPH04231433A (en) 1990-12-27 1990-12-27 Electrifying material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP41777490A JPH04231433A (en) 1990-12-27 1990-12-27 Electrifying material

Publications (1)

Publication Number Publication Date
JPH04231433A true JPH04231433A (en) 1992-08-20

Family

ID=18525817

Family Applications (1)

Application Number Title Priority Date Filing Date
JP41777490A Pending JPH04231433A (en) 1990-12-27 1990-12-27 Electrifying material

Country Status (1)

Country Link
JP (1) JPH04231433A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2809419A1 (en) * 2000-05-25 2001-11-30 Kobe Steel Ltd COPPER ALLOY FOR USE IN ELECTRICAL AND ELECTRONIC PARTS
JP2006152413A (en) * 2004-12-01 2006-06-15 Nikko Metal Manufacturing Co Ltd High functional copper alloy for electronic equipment having excellent strength and electrical conductivity and method for producing the same
JP2007270274A (en) * 2006-03-31 2007-10-18 Nikko Kinzoku Kk Copper alloy having excellent hot workability
JP2007270314A (en) * 2006-03-31 2007-10-18 Nikko Kinzoku Kk Copper alloy having excellent hot workability and its production method
CN104332211A (en) * 2014-11-17 2015-02-04 苏州科茂电子材料科技有限公司 Tinning phosphor copper line
WO2015027976A3 (en) * 2013-09-02 2015-09-11 Kme Germany Gmbh & Co. Kg Copper alloy containing nickel and phosphorus

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2809419A1 (en) * 2000-05-25 2001-11-30 Kobe Steel Ltd COPPER ALLOY FOR USE IN ELECTRICAL AND ELECTRONIC PARTS
JP2006152413A (en) * 2004-12-01 2006-06-15 Nikko Metal Manufacturing Co Ltd High functional copper alloy for electronic equipment having excellent strength and electrical conductivity and method for producing the same
JP4493083B2 (en) * 2004-12-01 2010-06-30 日鉱金属株式会社 High-performance copper alloy for electronic equipment with excellent strength and conductivity and method for producing the same
JP2007270274A (en) * 2006-03-31 2007-10-18 Nikko Kinzoku Kk Copper alloy having excellent hot workability
JP2007270314A (en) * 2006-03-31 2007-10-18 Nikko Kinzoku Kk Copper alloy having excellent hot workability and its production method
JP4750602B2 (en) * 2006-03-31 2011-08-17 Jx日鉱日石金属株式会社 Copper alloy with excellent hot workability
WO2015027976A3 (en) * 2013-09-02 2015-09-11 Kme Germany Gmbh & Co. Kg Copper alloy containing nickel and phosphorus
CN104332211A (en) * 2014-11-17 2015-02-04 苏州科茂电子材料科技有限公司 Tinning phosphor copper line

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