JPH04231443A - Electrifying material - Google Patents
Electrifying materialInfo
- Publication number
- JPH04231443A JPH04231443A JP41777290A JP41777290A JPH04231443A JP H04231443 A JPH04231443 A JP H04231443A JP 41777290 A JP41777290 A JP 41777290A JP 41777290 A JP41777290 A JP 41777290A JP H04231443 A JPH04231443 A JP H04231443A
- Authority
- JP
- Japan
- Prior art keywords
- alloy
- size
- migration
- content
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title abstract description 10
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 20
- 239000000956 alloy Substances 0.000 claims abstract description 20
- 239000002244 precipitate Substances 0.000 claims abstract description 13
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 4
- 229910052790 beryllium Inorganic materials 0.000 claims abstract description 4
- 229910052733 gallium Inorganic materials 0.000 claims abstract description 4
- 229910052735 hafnium Inorganic materials 0.000 claims abstract description 4
- 239000012535 impurity Substances 0.000 claims abstract description 4
- 229910052742 iron Inorganic materials 0.000 claims abstract description 4
- 229910052745 lead Inorganic materials 0.000 claims abstract description 4
- 229910052748 manganese Inorganic materials 0.000 claims abstract description 4
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 4
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 4
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 4
- 229910052698 phosphorus Inorganic materials 0.000 claims abstract description 4
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 4
- 229910052709 silver Inorganic materials 0.000 claims abstract description 4
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 4
- 229910052718 tin Inorganic materials 0.000 claims abstract description 4
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 4
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 4
- 229910052720 vanadium Inorganic materials 0.000 claims abstract description 4
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 4
- 230000032683 aging Effects 0.000 claims abstract 4
- 239000004020 conductor Substances 0.000 claims description 5
- 239000013078 crystal Substances 0.000 claims description 3
- 230000005012 migration Effects 0.000 abstract description 28
- 238000013508 migration Methods 0.000 abstract description 28
- 239000010949 copper Substances 0.000 abstract description 8
- 229910000881 Cu alloy Inorganic materials 0.000 abstract description 4
- 238000005097 cold rolling Methods 0.000 abstract description 3
- 238000000137 annealing Methods 0.000 abstract description 2
- 229910052804 chromium Inorganic materials 0.000 abstract description 2
- 239000000203 mixture Substances 0.000 abstract description 2
- 238000005554 pickling Methods 0.000 abstract description 2
- 230000001105 regulatory effect Effects 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 1
- 229910052726 zirconium Inorganic materials 0.000 abstract 1
- 230000000052 comparative effect Effects 0.000 description 6
- 230000007423 decrease Effects 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 239000000523 sample Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910001431 copper ion Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000003487 electrochemical reaction Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 229910001651 emery Inorganic materials 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Conductive Materials (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、リードフレーム、端子
、コネクター、バスバー(ブスバーともいう)間でのマ
イグレーションの発生を抑えた電気部品材料用の通電材
料に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a current-carrying material for electrical parts that suppresses migration between lead frames, terminals, connectors, and bus bars (also referred to as bus bars).
【0002】0002
【従来の技術】近年、電子、電気機器等の小型軽量化が
進み、使用されるコネクター等の部品も小型化するとと
もに、部品間の距離も著しく短くなる傾向にある。又、
回路はますます集積化される傾向にある。すなわち、従
来、個々の電子部品はリード線により接続されて回路が
形成されていたが、部品数が増すに従い回路が複雑とな
るので、これらを集積化することにより回路の小型化が
進められている。2. Description of the Related Art In recent years, electronic and electrical equipment, etc. have become smaller and lighter, and the parts used, such as connectors, have become smaller and the distances between parts have also tended to become significantly shorter. or,
Circuits are becoming increasingly integrated. In other words, in the past, individual electronic components were connected by lead wires to form a circuit, but as the number of components increases, circuits become more complex, so circuits are becoming smaller by integrating them. There is.
【0003】0003
【発明が解決しようとする課題】従来の小型化、集積化
された回路において、異なる回路又は配線が小型化のた
めにわずかな間隔をおいて隔てられているが、この間隔
内に水などの電解質が介在すると電気化学的反応が生じ
、高電位側の通電部の材料となっている銅合金から溶解
した銅イオンが低電位側で析出し、更にその量が増すと
短絡する現象が生じる。この現象をマイグレーションと
いい、このようなマイグレーションが起ると、回路が正
常に機能しなくなる。したがって、近年では高い導電率
を有し、かつ、マイグレーションの発生しない材料が強
く望まれていた。[Problems to be Solved by the Invention] In conventional miniaturized and integrated circuits, different circuits or wiring are separated by a small interval for miniaturization, but there is a problem that water, etc. When an electrolyte is present, an electrochemical reaction occurs, and copper ions dissolved from the copper alloy that is the material of the current-carrying part on the high-potential side are deposited on the low-potential side, and when the amount increases further, a short circuit occurs. This phenomenon is called migration, and when such migration occurs, the circuit no longer functions properly. Therefore, in recent years, there has been a strong desire for materials that have high electrical conductivity and do not cause migration.
【0004】0004
【課題を解決するための手段】本発明者らは上記の問題
点に鑑み、マイグレーションの研究を進め、陽極側に接
続された端子、コネクター、バスバー等の通電材料とし
てZr0.05〜1.0wt%を含み、あるいは、さら
に副成分としてAg、Al、Au、B、Be、Co、C
r、Fe、Ga、Ge、Mg、Mn、Mo、Ni、P、
Pb、Pt、Si、Sb、Sn、Ta、V、W、Zn、
Hf、Nb、Tiからなる群から1種又は2種以上を総
量で0.001〜5.0wt%含み、残部Cu及び不可
避的不純物からなる合金の酸素含有量が20ppm以下
であり、かつ、時効処理による析出物が存在し、その析
出物の大きさが2μm以下であること、さらに、上記合
金の結晶粒度が30μm以下であることを特徴とするも
のである。[Means for Solving the Problems] In view of the above-mentioned problems, the present inventors have conducted migration research and have developed Zr0.05 to 1.0 wt as a conductive material for terminals, connectors, bus bars, etc. connected to the anode side. %, or further contains Ag, Al, Au, B, Be, Co, C as subcomponents.
r, Fe, Ga, Ge, Mg, Mn, Mo, Ni, P,
Pb, Pt, Si, Sb, Sn, Ta, V, W, Zn,
The alloy contains one or more from the group consisting of Hf, Nb, and Ti in a total amount of 0.001 to 5.0 wt%, the balance being Cu and unavoidable impurities, and the oxygen content is 20 ppm or less, and The alloy is characterized in that precipitates are present due to the treatment, and the size of the precipitates is 2 μm or less, and further, the crystal grain size of the alloy is 30 μm or less.
【0005】本発明にしたがってCuに添加される元素
のそれぞれの添加量は次のことを考慮して定められる。
すなわち、まずZrは銅及び銅合金に含有されることに
より、銅及び銅合金のマイグレーション性を抑制する効
果を有する元素である。According to the present invention, the amount of each element added to Cu is determined in consideration of the following. That is, first of all, Zr is an element that has the effect of suppressing the migration property of copper and copper alloys by being contained in copper and copper alloys.
【0006】マイグレーション現象を抑制する機構は明
確ではないが、Zrの存在によりCuイオンの溶出量が
減少し、Zrの化合物の生成により、析出したCu粒子
を介する通電が妨害されることによって、電極間のマイ
グレーション現象が抑制されると推察される。Although the mechanism for suppressing the migration phenomenon is not clear, the presence of Zr reduces the elution amount of Cu ions, and the generation of Zr compounds impedes the conduction of electricity through the deposited Cu particles. It is presumed that the migration phenomenon between them is suppressed.
【0007】Zr含有量を0.05〜1.0wt%とす
る理由はZr含有量が0.05wt%未満では、マイグ
レーション現象を抑制する効果がなく、1.0wt%を
超えるとマイグレーション現象の抑制効果はあるが、導
電率が低下し、通電時の発熱量が大きくなり、熱放散性
も低くなるためである。[0007] The reason why the Zr content is set to 0.05 to 1.0 wt% is that if the Zr content is less than 0.05 wt%, it will not be effective in suppressing the migration phenomenon, and if it exceeds 1.0 wt%, the migration phenomenon will not be suppressed. This is because although it is effective, the conductivity decreases, the amount of heat generated when electricity is applied increases, and the heat dissipation performance also decreases.
【0008】副成分としてAg、Al、Au、B、Be
、Co、Cr、Fe、Ga、Ge、Mg、Mn、Mo、
Ni、P、Pb、Pt、Si、Sb、Sn、Ta、V、
W、Zn、Hf、Nb、Tiからなる群から1種又は2
種以上を総量で0.001〜5.0wt%添加するのは
、これら元素はZrと金属間化合物を形成すること、又
はCu中に固溶することにより、強度向上に寄与するも
のであるが、これらの元素の添加量が0.001wt%
未満ではその効果は低く、5.0wt%を超えると導電
性が著しく低下するためである。[0008] Ag, Al, Au, B, Be as subcomponents
, Co, Cr, Fe, Ga, Ge, Mg, Mn, Mo,
Ni, P, Pb, Pt, Si, Sb, Sn, Ta, V,
One or two from the group consisting of W, Zn, Hf, Nb, and Ti
The reason why these elements are added in a total amount of 0.001 to 5.0 wt% is that these elements contribute to improving strength by forming intermetallic compounds with Zr or by solid solution in Cu. , the amount of these elements added is 0.001wt%
This is because if the content is less than 5.0 wt%, the effect will be low, and if it exceeds 5.0 wt%, the conductivity will be significantly reduced.
【0009】析出物の大きさを2μm以下に限定した理
由は析出物が2μmを超えるような粗大なものになると
、急激にマイグレーション現象が発生し易くなるためで
ある。 酸素含有量を20ppm以下とした理由は、
Zrが酸化物として合金中にとらえられているとマイグ
レーション性の改善には寄与しない事が判明したためで
ある。すなわち、酸素含有量が20ppmを超える合金
中ではZrは酸化物としてとらえられ易く、Zr酸化物
が生成されるとさらにそこにZrの濃化が起り易いため
、マイグレーション性が急激に低下するためである。The reason why the size of the precipitates is limited to 2 μm or less is that if the precipitates become coarse and larger than 2 μm, the migration phenomenon is likely to occur rapidly. The reason why the oxygen content was set to 20 ppm or less was
This is because it has been found that if Zr is captured as an oxide in the alloy, it does not contribute to improving migration properties. In other words, in an alloy with an oxygen content exceeding 20 ppm, Zr is easily regarded as an oxide, and when Zr oxide is generated, Zr is likely to be further concentrated there, resulting in a rapid decrease in migration properties. be.
【0010】さらに、結晶粒度が30μmを超えて粗大
化してくると、加工性が低下するとともに、マイグレー
ション性も低下する傾向が見られるため、結晶粒度は3
0μm以下であることが推奨される。Furthermore, when the grain size becomes coarser and exceeds 30 μm, there is a tendency for workability to decrease and migration performance to decrease.
It is recommended that the thickness be 0 μm or less.
【0011】[0011]
【実施例】以下に本発明の具体例を示す。[Example] Specific examples of the present invention are shown below.
【0012】まず表1に示す組成の本発明合金及び比較
合金を不活性雰囲気中で溶解鋳造し、面削後熱間圧延し
、その後、冷却圧延と焼鈍酸洗をくり返し、400〜6
00℃で所定時間の最終焼鈍により結晶粒度を調整し、
酸洗後加工度20%で冷却圧延した0.6mmの厚さの
板を得た。そして、#1200エメリー紙で表面研摩し
た。First, the alloys of the present invention and comparative alloys having the compositions shown in Table 1 were melted and cast in an inert atmosphere, and hot-rolled after facing, and then cool-rolled, annealed, and pickled repeatedly.
The grain size is adjusted by final annealing at 00°C for a predetermined time,
After pickling, a plate with a thickness of 0.6 mm was obtained by cold rolling at a processing degree of 20%. Then, the surface was polished with #1200 emery paper.
【0013】[0013]
【表1】
これらの供試材について引張強さ、伸び、導電率、耐マ
イグレーション性を評価した。結果を表2に示す。耐マ
イグレーション性は供試材を10mm×100mmに切
断し、2枚1組として、図1に示すようにセットした供
試材を図2に示すようにして水道水中(300cc)中
に浸漬した。次にこの2枚の供試材に14Vの直流電圧
を加え、経過時間に対する電流値の変化を記録計にて測
定した。この結果の代表例を図3に示す。又、各供試材
における電流値が1.0Aになるまでの時間(図3中矢
印)を表2に示す。[Table 1] These test materials were evaluated for tensile strength, elongation, electrical conductivity, and migration resistance. The results are shown in Table 2. To test the migration resistance, the test material was cut into 10 mm x 100 mm pieces, set in pairs as shown in FIG. 1, and immersed in tap water (300 cc) as shown in FIG. Next, a DC voltage of 14 V was applied to these two test materials, and the change in current value with respect to elapsed time was measured using a recorder. A representative example of this result is shown in FIG. Further, Table 2 shows the time required for the current value to reach 1.0 A (arrow in FIG. 3) for each sample material.
【0014】[0014]
【表2】
なお、析出物の大きさは供試材断面を1000倍で2m
m2 検鏡し、最大の析出物の大きさにより求めた。[Table 2] The size of the precipitates is 2 m when the cross section of the sample material is multiplied by 1000.
m2 was determined by examining the size of the largest precipitate.
【0015】表2より、本発明合金No.1〜9は、い
ずれも導電率が40%IACS以上でかつ強度と耐マイ
グレーション性に優れ、リードフレームや自動車の端子
,コネクターバスバー等の耐マイグレーション性の求め
られる通電材料として最適な合金であることがわかる。
但し、No.9は結晶粒度が60μmと大きいため、マ
イグレーション性は若干劣化している。From Table 2, the alloy No. of the present invention. All alloys 1 to 9 have a conductivity of 40% IACS or higher, have excellent strength and migration resistance, and are optimal as conductive materials for lead frames, automotive terminals, connector bus bars, etc. that require migration resistance. I understand. However, No. Sample No. 9 has a large crystal grain size of 60 μm, so the migration property is slightly deteriorated.
【0016】また、比較合金No.10はZr含有量が
少ないため、耐マイグレーション性が悪く、強度も低い
。比較合金No.11はZr含有量が多すぎるため、導
電率が低い。比較合金No.12は、本発明合金No.
3に比べて析出物が大きすぎるため、耐マイグレーショ
ン性が悪い。比較合金No.13は、本発明合金No.
3に比べて酸素含有量が多いため、耐マイグレーション
性が悪い。比較合金No.14は従来自動車のバスバー
等に用いられている黄銅1種で耐マイグレーション性は
高いが、導電率が低い。[0016] Also, comparative alloy No. Since No. 10 has a low Zr content, it has poor migration resistance and low strength. Comparative alloy No. No. 11 has too much Zr content, so its conductivity is low. Comparative alloy No. 12 is the invention alloy No.
Since the precipitates were too large compared to No. 3, migration resistance was poor. Comparative alloy No. 13 is the invention alloy No.
Since the oxygen content is higher than that of No. 3, migration resistance is poor. Comparative alloy No. 14 is a type of brass conventionally used for automobile bus bars, etc., and has high migration resistance but low electrical conductivity.
【0017】[0017]
【発明の効果】本発明の通電材料は高強度で高い導電性
を有し、かつ耐マイグレーション性の優れた材料である
。[Effects of the Invention] The current-carrying material of the present invention has high strength, high conductivity, and excellent migration resistance.
【図1】耐マイグレーション性のテストのための供試材
の斜視図である。FIG. 1 is a perspective view of a sample material for a migration resistance test.
【図2】同テストの説明図である。FIG. 2 is an explanatory diagram of the test.
【図3】耐マイグレーションテスト結果を示すグラフで
ある。FIG. 3 is a graph showing migration resistance test results.
Claims (3)
、残部Cuおよび不可避的不純物からなる合金のO含有
量が20ppm以下であり、かつ時効処理による析出物
が存在し、その析出物の大きさが2μm以下であること
を特徴とする通電材料。Claim 1: The alloy contains 0.05 to 1.0 wt% of Zr, the balance being Cu and unavoidable impurities, and the O content is 20 ppm or less, and there are precipitates due to aging treatment, and the precipitates are An electrically conductive material characterized by having a size of 2 μm or less.
、副成分としてAg、Al、Au、B、Be、Co、C
r、Fe、Ga、Ge、Mg、Mn、Mo、Ni、P、
Pb、Pt、Si、Sb、Sn、Ta、V、W、Zn、
Hf、Nb、Tiからなる群から1種又は2種以上を総
量で0.001〜5.0wt%含み、残部Cuおよび不
可避的不純物からなる合金のO含有量が20ppm以下
であり、かつ時効処理による析出物が存在し、その析出
物の大きさが2μm以下であることを特徴とする通電材
料。2. Contains 0.05 to 1.0 wt% of Zr, and contains Ag, Al, Au, B, Be, Co, and C as subcomponents.
r, Fe, Ga, Ge, Mg, Mn, Mo, Ni, P,
Pb, Pt, Si, Sb, Sn, Ta, V, W, Zn,
The alloy contains one or more from the group consisting of Hf, Nb, and Ti in a total amount of 0.001 to 5.0 wt%, the balance being Cu and unavoidable impurities, and the O content is 20 ppm or less, and the aging treatment is performed. 1. An electrically conductive material characterized by the presence of precipitates caused by the above, and the size of the precipitates being 2 μm or less.
(1)または(2)項記載の通電材料。3. The electrically conductive material according to claim 1 or 2, wherein the crystal grain size is 30 μm or less.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP41777290A JPH04231443A (en) | 1990-12-27 | 1990-12-27 | Electrifying material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP41777290A JPH04231443A (en) | 1990-12-27 | 1990-12-27 | Electrifying material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04231443A true JPH04231443A (en) | 1992-08-20 |
Family
ID=18525815
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP41777290A Pending JPH04231443A (en) | 1990-12-27 | 1990-12-27 | Electrifying material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04231443A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998048068A1 (en) * | 1997-04-18 | 1998-10-29 | Olin Corporation | Grain refined tin brass |
US5853505A (en) * | 1997-04-18 | 1998-12-29 | Olin Corporation | Iron modified tin brass |
US6132528A (en) * | 1997-04-18 | 2000-10-17 | Olin Corporation | Iron modified tin brass |
US6334915B1 (en) * | 1998-03-26 | 2002-01-01 | Kabushiki Kaish Kobe Seiko Sho | Copper alloy sheet for electronic parts |
JP2002025353A (en) * | 2000-07-07 | 2002-01-25 | Hitachi Cable Ltd | Flex resistant flat cable |
AU757115B2 (en) * | 2000-04-05 | 2003-02-06 | Ishikawajima-Harima Heavy Industries Co., Ltd. | Copper base alloy casting, and methods for producing casting and forging employing copper base alloy casting |
JP2009153851A (en) * | 2007-12-27 | 2009-07-16 | Konica Minolta Medical & Graphic Inc | Ultrasonic diagnostic apparatus and manufacturing method of wire used therefor |
-
1990
- 1990-12-27 JP JP41777290A patent/JPH04231443A/en active Pending
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998048068A1 (en) * | 1997-04-18 | 1998-10-29 | Olin Corporation | Grain refined tin brass |
US5853505A (en) * | 1997-04-18 | 1998-12-29 | Olin Corporation | Iron modified tin brass |
US6132528A (en) * | 1997-04-18 | 2000-10-17 | Olin Corporation | Iron modified tin brass |
US6334915B1 (en) * | 1998-03-26 | 2002-01-01 | Kabushiki Kaish Kobe Seiko Sho | Copper alloy sheet for electronic parts |
AU757115B2 (en) * | 2000-04-05 | 2003-02-06 | Ishikawajima-Harima Heavy Industries Co., Ltd. | Copper base alloy casting, and methods for producing casting and forging employing copper base alloy casting |
US6679955B2 (en) | 2000-04-05 | 2004-01-20 | Ishikawajima-Harima Heavy Industries, Co., Ltd. | Copper base alloy casting, and methods for producing casting and forging employing copper base alloy casting |
US7204893B2 (en) | 2000-04-05 | 2007-04-17 | Ishikawajima-Harima Heavy Industries, Co., Ltd. | Copper base alloy casting, and methods for producing casting and forging employing copper base alloy casting |
JP2002025353A (en) * | 2000-07-07 | 2002-01-25 | Hitachi Cable Ltd | Flex resistant flat cable |
JP4734695B2 (en) * | 2000-07-07 | 2011-07-27 | 日立電線株式会社 | Flex-resistant flat cable |
JP2009153851A (en) * | 2007-12-27 | 2009-07-16 | Konica Minolta Medical & Graphic Inc | Ultrasonic diagnostic apparatus and manufacturing method of wire used therefor |
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