JPH04180531A - Electrically conductive material - Google Patents

Electrically conductive material

Info

Publication number
JPH04180531A
JPH04180531A JP30602390A JP30602390A JPH04180531A JP H04180531 A JPH04180531 A JP H04180531A JP 30602390 A JP30602390 A JP 30602390A JP 30602390 A JP30602390 A JP 30602390A JP H04180531 A JPH04180531 A JP H04180531A
Authority
JP
Japan
Prior art keywords
less
size
alloy
migration
precipitates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP30602390A
Other languages
Japanese (ja)
Inventor
Tamio Toe
東江 民夫
Masahiro Tsuji
正博 辻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Nippon Mining Co Ltd
Nikko Kyodo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining Co Ltd, Nikko Kyodo Co Ltd filed Critical Nippon Mining Co Ltd
Priority to JP30602390A priority Critical patent/JPH04180531A/en
Publication of JPH04180531A publication Critical patent/JPH04180531A/en
Pending legal-status Critical Current

Links

Landscapes

  • Conductive Materials (AREA)

Abstract

PURPOSE:To obtain an electrically conductive material having high electrical conductivity and superior migration resistance by regulating the oxygen content of a Cu alloy contg. prescribed amts. of Si and other added element such as Ni and the size of a precipitate formed by aging. CONSTITUTION:The oxygen content of an alloy consisting of 0.05-3.0wt.% Si, 0.1-5.0wt.% one or more among Ni, Fe, Co, Cr and Ti and the balance Cu with inevitable impurities is regulated to <=20ppm and the size of a precipitate formed by aging is regulated to <=2mum to obtain the above-mentioned material. About 0.001-5.0wt.%, in total, of one or more among Zn, Sn Mg, Mn, Al, B, P, As and Sb as secondary components may further be added to the above- mentioned compsn. as required. The grain size of the obtd. material is preferably about <=30mum.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、リードフレーム、端子、コネクター、バスバ
ー(ブスバーともいう)間でのマイグレーションの発生
を抑えた電気部品材料用の通電材料に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a current-carrying material for electrical component materials that suppresses migration between lead frames, terminals, connectors, and bus bars (also referred to as bus bars).

〔従来の技術〕[Conventional technology]

近年、電子、電気機器等の小型軽量化が進み、使用され
るコネクター等の部品も小型化するとともに、部品間の
距離知著しく短くなる傾向にある。
BACKGROUND ART In recent years, electronic and electrical equipment, etc. have become smaller and lighter, and the parts used, such as connectors, have also become smaller, and the distances between parts have tended to become significantly shorter.

又、回路はますます集積化される傾向にある。すなわち
、従来、個々の電子部品はリード線により接続されて回
路が形成されていたが、部品数が増すに従い回路が複雑
となるので、これらを集積化することにより回路の小型
化が進められている。
Also, circuits are becoming increasingly integrated. In other words, in the past, individual electronic components were connected by lead wires to form a circuit, but as the number of components increases, circuits become more complex, so circuits are becoming smaller by integrating them. There is.

[発明が解決しようとする課題] 従来の小型化、集積化された回路において、異なる回路
又は配線が小型化のためにわずかな間隔をおいて隔てら
れているが、この間隔内に水などの電解質が介在すると
電気化学的反応が生じ、高電位側の通電部の材料となっ
ている銅合金から熔解した銅イオンが低電位側で析出し
、更にその量が増すと短絡する現象が生じる。この現象
をマイグレーションといい、このようなアイグレーショ
ンが起ると、回路が正常に機能しなくなる。したがって
、近年では高い導電率を有し、かつ、マイグレーション
の発生しない材料が強く望まれていた。
[Problem to be solved by the invention] In conventional miniaturized and integrated circuits, different circuits or wiring are separated by a small interval for miniaturization. When an electrolyte is present, an electrochemical reaction occurs, and copper ions melted from the copper alloy that is the material of the current-carrying part on the high potential side are deposited on the low potential side, and when the amount increases further, a short circuit occurs. This phenomenon is called migration, and when such migration occurs, the circuit no longer functions properly. Therefore, in recent years, there has been a strong desire for materials that have high electrical conductivity and do not cause migration.

〔訓題を解決するための手段〕[Means for solving the problem]

本発明者らは上記の問題点に鑑み、マイグレーションの
研究を進め、陽極側に接続された端子、コネクター、バ
スバー等の通電材料として810.05〜3.0wt%
を含み、さらにNi、Fe、Co、Cr、Tiからなる
1種又は2種以上を総量で0.1〜5.0wt%含み、
残部Cu及び不可避的不純物からなる合金の酸素含有量
が20PPm以下であり、かつ時効処理による析出物が
存在し、その析出物の大きさが2μm以下であること、
あるいはSi0.05〜3.0wt%、さらにN1、F
e、Co、Cr、Tiからなる1種又は2種以上を総量
で0.1〜5.Qwt%含み、副成分としてZn、Sn
、Mg、Mn、Al、B、P、As、sbからなる1種
又は2種以上を総量で0.001〜5.0wt%を含み
、残部Cu及び不可避的不純物からなる合金の酸素含有
量が20ppm以下であり、かつ時効処理による析出物
が存在し、その析出物の大きさが′2μm以下であるこ
と、さらに上記合金の結晶粒度が3oμm以下であるこ
とを特徴とすものである。
In view of the above-mentioned problems, the present inventors have conducted research on migration, and have used 810.05 to 3.0 wt% as current-carrying materials for terminals, connectors, bus bars, etc. connected to the anode side.
and further contains one or more of Ni, Fe, Co, Cr, and Ti in a total amount of 0.1 to 5.0 wt%,
The oxygen content of the alloy consisting of the balance Cu and unavoidable impurities is 20 PPm or less, and there are precipitates due to aging treatment, and the size of the precipitates is 2 μm or less,
Or Si0.05~3.0wt%, further N1, F
e, Co, Cr, and Ti in a total amount of 0.1 to 5. Contains Qwt%, Zn and Sn as subcomponents
, Mg, Mn, Al, B, P, As, and sb in a total amount of 0.001 to 5.0 wt%, and the balance is Cu and unavoidable impurities. 20 ppm or less, the presence of precipitates due to aging treatment, the size of the precipitates is 2 μm or less, and the crystal grain size of the alloy is 3 μm or less.

〔発明の詳細な説明〕[Detailed description of the invention]

本発明にしたがってCuに添加される元素のそれぞれの
添加量は次のことを考慮して定められる。
According to the present invention, the amount of each element added to Cu is determined in consideration of the following.

すなわち、まずSiは銅及び銅合金に含有されることに
より、銅及び銅合金のマイグレーション性を抑制する効
果を有する元素である。
That is, first of all, Si is an element that has the effect of suppressing the migration property of copper and copper alloys by being contained in copper and copper alloys.

マイグレーション現象を抑制する機構は明確ではないが
、Slの存在によりCuイオンの溶出量が減少し、Si
の化合物の生成により、析出したCu粒子を介する通電
が妨害されることによって、電極間のマイグレーション
現象が抑制されると推察される。
Although the mechanism that suppresses the migration phenomenon is not clear, the presence of Sl reduces the amount of Cu ions eluted and increases the
It is presumed that the generation of the compound prevents the conduction of electricity through the deposited Cu particles, thereby suppressing the migration phenomenon between the electrodes.

Si含有量を0.05〜3 、 Ow t%とする理由
は、S1含有量が0.05wt%未満では、マイグレー
ション現象を抑制する効果がなく、3.0wt%を超え
るとマイグレーション現象の抑制効果はあるが、導電率
が低下し、通電時の発熱量が大きくなり、熱放散性も低
くなるためである。
The reason why the Si content is set to 0.05 to 3 Owt% is that if the S1 content is less than 0.05wt%, there is no effect of suppressing the migration phenomenon, and if it exceeds 3.0wt%, the effect of suppressing the migration phenomenon is reduced. However, this is because the electrical conductivity decreases, the amount of heat generated when electricity is applied increases, and the heat dissipation performance also decreases.

Ni、Fe、Co、Cr、Tiの1種又は2種以上の含
有量を0.1〜5.0wt%とする理由は。
The reason why the content of one or more of Ni, Fe, Co, Cr, and Ti is set to 0.1 to 5.0 wt%.

これら元素はマイグレーション現象の抑制効果を持つと
ともに強度向上にも寄与するものであるが、0.1wt
%未満ではその効果は低く、5.0wt%を超えると導
電率の低下が著しくなるためである。
These elements have the effect of suppressing migration phenomena and also contribute to improving strength, but at 0.1 wt.
If the content is less than 5.0 wt%, the effect will be low, and if it exceeds 5.0 wt%, the conductivity will decrease significantly.

更に副成分としてZn、Sn、Mg、Mn、A1、B、
P、As、Sbからなる1種又は2種以上を0.001
wt%以上5.0 w t%以下添加するのは、強度を
向上させるためであるが、0.001wt%未満ではそ
の効果はなく、5.Ow t%を超えると導電率が低下
するためである。
Furthermore, Zn, Sn, Mg, Mn, A1, B,
0.001 of one or more of P, As, and Sb
The reason for adding 5.0 wt% or more is to improve the strength, but if it is less than 0.001 wt%, there is no effect. This is because if it exceeds Owt%, the conductivity decreases.

析出物の大きさを2μm以下に限定した理由は、析出物
が2μmを超えるような粗大なものになると、急激にマ
イクレージョン現象が発生し易くなるためである。
The reason why the size of the precipitates is limited to 2 μm or less is that if the precipitates become coarse and have a size exceeding 2 μm, the microcrash phenomenon will suddenly occur.

酸素含有量を20ppm以下とした理由は。What is the reason for setting the oxygen content to 20 ppm or less?

Siが酸化物として合金中にとらえられているとマイグ
レーション性の改善には寄与しない事が判明したためで
ある。すなわち、酸素含有量が20ppmを超える合金
中ではSiは酸化物としてとらえられ易<、Si酸化物
が生成されるとさらにそこにSiの濃化が起こり易いた
め、マイグレーション性が急激に低下するためである。
This is because it has been found that if Si is captured as an oxide in the alloy, it does not contribute to improving migration properties. In other words, in an alloy with an oxygen content exceeding 20 ppm, Si is likely to be treated as an oxide. If Si oxide is generated, Si concentration is likely to occur there, resulting in a rapid decrease in migration properties. It is.

結晶粒度を30μm以下とした理由は、結晶粒度が30
μmを超えて粗大化してくると、加工性が低下するとと
もに、マイグレーション性もt下する傾向が見られるた
めである。
The reason why the crystal grain size is 30 μm or less is that the crystal grain size is 30 μm or less.
This is because when the grain size exceeds μm, there is a tendency for workability to decrease and migration performance to decrease by t.

〔実施例〕〔Example〕

以下に本発明の具体例を示す。 Specific examples of the present invention are shown below.

まず、第1表に示す組成の本発明合金及び比較合金を不
活性雰囲気中で溶解鋳造し、面削後熱間圧延し、その後
冷間圧延、焼鈍酸洗をくり返し、400〜600℃で所
定時間の最終焼鈍により結晶粒度を調整し、酸洗後加工
度20%で冷間圧延した0、6nynの厚さの板を得た
。 そして1200工メリー紙で表面を研磨した。
First, the alloys of the present invention and comparative alloys having the compositions shown in Table 1 were melted and cast in an inert atmosphere, subjected to hot rolling after facing, and then cold rolled, annealed and pickled repeatedly, and then heated to a predetermined temperature of 400 to 600°C. The grain size was adjusted by final annealing for 3 hours, and after pickling, a plate with a thickness of 0.6 nyn was obtained which was cold rolled at a workability of 20%. Then, the surface was polished with 1200mm merry paper.

これらの供試材について引張強さ、伸び、導電率、耐マ
イグレーション性を評価した。耐マイグレーション性は
供試材をlommXloommに切断し、2枚1組とし
て、第1図に示すようにセットした供試材を第2図に示
すようにして水道水中(300cc)中に浸漬した。次
にこの2枚の供試材に14Vの直流電圧を加え、経過時
間に対する電流値の変化を記録計にて測定した。この結
果の代表例を第3図に示す。又、各供試材における電流
値が1.OAになるまでの時間(第3図中矢印)を第1
表に示す。
These test materials were evaluated for tensile strength, elongation, electrical conductivity, and migration resistance. To test the migration resistance, the test material was cut into lommXloomm pieces, set as a set of two pieces as shown in FIG. 1, and the test material was immersed in tap water (300 cc) as shown in FIG. 2. Next, a DC voltage of 14 V was applied to these two test materials, and the change in current value with respect to elapsed time was measured using a recorder. A typical example of this result is shown in FIG. Also, the current value in each sample material is 1. The time until OA (arrow in Figure 3) is the first
Shown in the table.

なお、析出物の大きさは供試材断面を1000倍で21
ffll 2検鏡し、最大の析出物の大きさより求めた
The size of the precipitates is 21 times the cross section of the sample material 1000 times.
The size of the largest precipitate was determined using ffll 2 microscopy.

第1表より、本発明合金No1〜7はいずれも導電率が
40%lAC3以上でかつ強度と耐マイグレーション性
に優れ、リードフレームや自動車の端子・コネクター、
バスバー等の耐マイグレーション性の求められる通電材
料として最適な合金であることがわかる。
From Table 1, alloys Nos. 1 to 7 of the present invention all have electrical conductivity of 40%lAC3 or higher, and are excellent in strength and migration resistance, and are suitable for use in lead frames, automotive terminals and connectors,
It can be seen that this alloy is optimal as a current-carrying material that requires migration resistance, such as in bus bars.

また、比較合金Nα8は本発明合金Na 1に比べS1
含有量が少ないため耐マイグレーション性が悪く、また
、強度も低い。比較合金Nα9はSi含有量が多すぎる
ため、導電率が低い。比較合金Nα10は本発明合金N
α2に比べ酸素含有量が多いため耐マイグレーション性
が悪い。比較合金Nα11は本発明合金NQ6に比べ析
出物が大きすぎるため耐マイグレーション性が悪い。比
較合金NQ12は本発明合金Nα5に比べ結晶粒が大き
すぎるため、耐マイグレーション性が悪い。比較合金N
α13は従来自動車のバスバー等に用いられている黄銅
1種で耐マイグレーション性は高いが、導電率が低い。
In addition, the comparative alloy Nα8 has S1 compared to the present invention alloy Na1.
Since the content is low, migration resistance is poor and strength is also low. Comparative alloy Nα9 has too much Si content and therefore has low electrical conductivity. Comparative alloy Nα10 is the invention alloy N
Since it has a higher oxygen content than α2, it has poor migration resistance. Comparative alloy Nα11 has too large precipitates compared to alloy NQ6 of the present invention, and therefore has poor migration resistance. Comparative alloy NQ12 has grains that are too large compared to invention alloy Nα5, and therefore has poor migration resistance. Comparative alloy N
α13 is a type of brass conventionally used for automobile bus bars and the like, and has high migration resistance but low electrical conductivity.

〔発明の効果〕〔Effect of the invention〕

本発明の通電材料は高い導電率を有し、かつ、耐マイグ
レーション性の優れた材料である。
The current-carrying material of the present invention has high electrical conductivity and is a material with excellent migration resistance.

以下余白Margin below

【図面の簡単な説明】[Brief explanation of drawings]

第1図は耐マイグレーション性のテストのための供試材
の斜視図、第2図は同テストの説明図、第3図は測定結
果を示すグラフである。
FIG. 1 is a perspective view of a sample material for a migration resistance test, FIG. 2 is an explanatory diagram of the test, and FIG. 3 is a graph showing the measurement results.

Claims (3)

【特許請求の範囲】[Claims] (1)Si0.05〜3.0wt%とNi、Fe、Co
、Cr、Tiのうちの1種または2種以上を0.1〜5
.0wt%含み、残部Cu及び不可避不純物からなる合
金の酸素含有量が20ppm以下であり、かつ時効処理
による析出物が存在し、その析出物の大きさが2μm以
下であることを特徴とする通電材料。
(1) Si0.05-3.0wt% and Ni, Fe, Co
, Cr, Ti or more from 0.1 to 5
.. A current-carrying material characterized in that an alloy containing 0 wt% and the balance consisting of Cu and unavoidable impurities has an oxygen content of 20 ppm or less, and has precipitates due to aging treatment, and the size of the precipitates is 2 μm or less. .
(2)Si0.05〜3.0wt%とNi、Fe、Co
、Cr、Tiのうちの1種または2種以上を0.1〜5
.0wt%とさらに副成分としてZn、Sn、Mg、M
n、Al、B、P、As、Sbからなる1種または2種
以上を総量で0.001〜5.0wt%を含み、残部C
u及び不可避不純物からなる合金の酸素含有量が20p
pm以下であり、かつ時効処理による析出物が存在し、
その析出物の大きさが2μm以下であることを特徴とす
る通電材料。
(2) Si0.05-3.0wt% and Ni, Fe, Co
, Cr, Ti or more from 0.1 to 5
.. 0wt% and further subcomponents of Zn, Sn, Mg, M
Contains one or more of n, Al, B, P, As, and Sb in a total amount of 0.001 to 5.0 wt%, and the balance is C.
The oxygen content of the alloy consisting of u and inevitable impurities is 20p
pm or less, and there are precipitates due to aging treatment,
An electrically conductive material characterized in that the size of the precipitates is 2 μm or less.
(3)結晶粒度が30μm以下であることを特徴とする
(1)ないし(2)項記載の通電材料。
(3) The electrically conductive material according to items (1) or (2), characterized in that the crystal grain size is 30 μm or less.
JP30602390A 1990-11-14 1990-11-14 Electrically conductive material Pending JPH04180531A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30602390A JPH04180531A (en) 1990-11-14 1990-11-14 Electrically conductive material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30602390A JPH04180531A (en) 1990-11-14 1990-11-14 Electrically conductive material

Publications (1)

Publication Number Publication Date
JPH04180531A true JPH04180531A (en) 1992-06-26

Family

ID=17952148

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30602390A Pending JPH04180531A (en) 1990-11-14 1990-11-14 Electrically conductive material

Country Status (1)

Country Link
JP (1) JPH04180531A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005083137A1 (en) * 2004-02-27 2005-09-09 The Furukawa Electric Co., Ltd. Copper alloy
EP1873266A1 (en) * 2005-02-28 2008-01-02 The Furukawa Electric Co., Ltd. Copper alloy
JP2008056977A (en) * 2006-08-30 2008-03-13 Mitsubishi Electric Corp Copper alloy and its production method
EP2248921A1 (en) * 2008-01-31 2010-11-10 The Furukawa Electric Co., Ltd. Copper alloy material for electric/electronic component and method for manufacturing the copper alloy material
US8070893B2 (en) * 2005-03-31 2011-12-06 Jx Nippon Mining & Metals Corporation Cu—Ni—Si—Co—Cr copper alloy for electronic materials and method for manufacturing same
US8845829B2 (en) 2003-10-24 2014-09-30 Hitachi Metals, Ltd. Cu alloy material, method of manufacturing Cu alloy conductor using the same, Cu alloy conductor obtained by the method, and cable or trolley wire using the Cu alloy conductor
DE102013012288A1 (en) * 2013-07-24 2015-01-29 Wieland-Werke Ag Grain-refined copper casting alloy
US9255311B2 (en) * 2005-01-17 2016-02-09 Hitachi Metals, Ltd. Copper alloy conductor, and trolley wire and cable using same, and copper alloy conductor fabrication method
DE112009000731B4 (en) * 2008-03-31 2018-02-08 Jx Nippon Mining & Metals Corp. Cu-Ni-Si-Co-Cr system alloy for electronic materials

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8845829B2 (en) 2003-10-24 2014-09-30 Hitachi Metals, Ltd. Cu alloy material, method of manufacturing Cu alloy conductor using the same, Cu alloy conductor obtained by the method, and cable or trolley wire using the Cu alloy conductor
WO2005083137A1 (en) * 2004-02-27 2005-09-09 The Furukawa Electric Co., Ltd. Copper alloy
US8951371B2 (en) 2004-02-27 2015-02-10 The Furukawa Electric Co., Ltd. Copper alloy
US9255311B2 (en) * 2005-01-17 2016-02-09 Hitachi Metals, Ltd. Copper alloy conductor, and trolley wire and cable using same, and copper alloy conductor fabrication method
EP1873266A1 (en) * 2005-02-28 2008-01-02 The Furukawa Electric Co., Ltd. Copper alloy
EP1873266A4 (en) * 2005-02-28 2010-07-28 Furukawa Electric Co Ltd Copper alloy
US8070893B2 (en) * 2005-03-31 2011-12-06 Jx Nippon Mining & Metals Corporation Cu—Ni—Si—Co—Cr copper alloy for electronic materials and method for manufacturing same
DE102007040822B4 (en) * 2006-08-30 2013-08-14 Mitsubishi Electric Corp. Copper alloy and process for its production
JP2008056977A (en) * 2006-08-30 2008-03-13 Mitsubishi Electric Corp Copper alloy and its production method
EP2248921A4 (en) * 2008-01-31 2011-03-16 Furukawa Electric Co Ltd Copper alloy material for electric/electronic component and method for manufacturing the copper alloy material
EP2248921A1 (en) * 2008-01-31 2010-11-10 The Furukawa Electric Co., Ltd. Copper alloy material for electric/electronic component and method for manufacturing the copper alloy material
DE112009000731B4 (en) * 2008-03-31 2018-02-08 Jx Nippon Mining & Metals Corp. Cu-Ni-Si-Co-Cr system alloy for electronic materials
DE102013012288A1 (en) * 2013-07-24 2015-01-29 Wieland-Werke Ag Grain-refined copper casting alloy

Similar Documents

Publication Publication Date Title
JP2001207229A (en) Copper alloy for electronic material
JPH06184679A (en) Copper alloy for electrical parts
JPH04180531A (en) Electrically conductive material
JP5002768B2 (en) Highly conductive copper-based alloy with excellent bending workability and manufacturing method thereof
JP2020002439A (en) Copper alloy for fuse
JPH04311544A (en) Electrically conductive material
JP2007246931A (en) Copper alloy for electrical and electronic equipment parts having excellent electric conductivity
JPH1143731A (en) High strength copper alloy excellent in stamping property and suitable for silver plating
JPH04231430A (en) Electrifying material
JPH04231447A (en) Conductive material
JPH04231443A (en) Electrifying material
JPS62182240A (en) Conductive high-tensile copper alloy
JPH04231446A (en) Conductive material
JPH04231432A (en) Electrifying material
JPH04231433A (en) Electrifying material
JPH04180532A (en) Electrically conductive material
JPH0499839A (en) Conductive material
JPH0499838A (en) Conductive material
JPH04231444A (en) Production of electrifying material
JPH04231445A (en) Production of electrifying material
JPH01168830A (en) Electric conductive material
JPH01168831A (en) Electric conductive material
JPH0499837A (en) Conductive material
JPS63230837A (en) Copper alloy for fuse
JPH05311291A (en) Conductive material