JP4750602B2 - Copper alloy with excellent hot workability - Google Patents

Copper alloy with excellent hot workability Download PDF

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JP4750602B2
JP4750602B2 JP2006097728A JP2006097728A JP4750602B2 JP 4750602 B2 JP4750602 B2 JP 4750602B2 JP 2006097728 A JP2006097728 A JP 2006097728A JP 2006097728 A JP2006097728 A JP 2006097728A JP 4750602 B2 JP4750602 B2 JP 4750602B2
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alloy
precipitates
conductivity
strength
rolling
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JP2007270274A (en
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雅俊 衛藤
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JX Nippon Mining and Metals Corp
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Description

本発明は、高強度、高導電性の電子機器部品用の、熱間加工性に優れた銅合金に関するものであり、特に小型、高集積化された半導体機器リード用及び端子コネクタ用銅合金において、曲げ加工性を損なうことなく特に強度、導電性に優れた、熱間加工性に優れた電子部品用銅合金に関する。   The present invention relates to a copper alloy excellent in hot workability for high-strength, high-conductivity electronic device parts, and particularly in a small and highly integrated copper alloy for semiconductor device leads and terminal connectors. The present invention relates to a copper alloy for electronic parts that is particularly excellent in strength and conductivity without deteriorating bending workability and excellent in hot workability.

銅及び銅合金は、コネクタ、リード端子等の電子部品及びフレキシブル回路基板用として多用途に亘って幅広く利用されている材料であり、急速に展開するIT化による情報機器の高機能化及び小型化・薄肉化に対応して更なる特性(強度、曲げ加工性、導電性)の向上を要求されている。
又、ICの高集積化に伴い、消費電力の高い半導体素子が多く使用されるようになり、半導体機器のリードフレーム材には、放熱性(導電性)の良いCu−Ni−Si系やCu−Fe−P、Cu−Cr−Sn、Cu−Ni−P等の析出型合金が使用されるようになった。上記Cu−Ni−P系合金はNi−P系化合物の微細析出により強化が生じるが、特許文献1では合金中のNi、P、Mg成分量を調整して、強度及び導電性、耐応力緩和性を備えた合金を得たことが報告されている。
Copper and copper alloys are materials that are widely used for electronic parts such as connectors and lead terminals and flexible circuit boards, and are highly functional and miniaturized due to the rapid development of IT.・ Further improvements in properties (strength, bending workability, conductivity) are required in response to thinning.
In addition, with the high integration of ICs, many semiconductor elements with high power consumption are used, and the lead frame material of semiconductor devices has a good heat dissipation (conductivity) such as Cu-Ni-Si or Cu. Precipitation alloys such as -Fe-P, Cu-Cr-Sn, and Cu-Ni-P have come to be used. The Cu—Ni—P alloy is strengthened by the fine precipitation of the Ni—P compound, but in Patent Document 1, the amount of Ni, P, and Mg components in the alloy is adjusted to reduce the strength, conductivity, and stress resistance. It has been reported that an alloy with properties is obtained.

特開2000−273562号公報JP 2000-273562 A

一般に、銅合金の鋳造、例えば連続或いは半連続鋳造において、鋳塊はモールドにより抜熱され、塊の表層の数mmを除いて内部はやや時間をかけて凝固する。この際に、凝固時及び凝固後の冷却過程で限界を超えて含有された合金元素が結晶粒界及び結晶粒内に晶出又は析出する。1.0%以上のNi及び0.2%以上のPを含有する銅合金は、高強度高導電という長所を有するが、室温においてはCu母相への固溶限以上のNi−P成分を多く含有しているため、鋳塊を製造すると通常はNi−P系化合物が結晶粒界に晶出又は析出してしまう。そして、Cu−Ni−P系合金の結晶粒界に晶出又は析出したNi−P系化合物は母相のCuより融点が低いため、これら銅合金の凝固は不均一なものとなり内部歪が発生し、その応力や外力によりNi−P系化合物の部分で破壊が生じ、鋳造、冷却段階での割れを引き起こす。又、熱間圧延の加熱時にもNi−P系化合物が母相よりも先に軟化又は液相化するため同様に割れが生じる。
しかし、特許文献1のCu−Ni−P系合金の組成はNiが0.01〜1.0%、Pが0.01〜0.2%であるため上記問題は特に意識されていなかった。
本発明の目的は、鋳造、冷却、熱間加工加熱又は熱間加工中に発生する割れを防止し、高温延性に優れており熱間加工性が良好なCu−Ni−P系合金を提供しようとするものである。
In general, in the casting of a copper alloy, for example, continuous or semi-continuous casting, the ingot is heat-extracted by a mold, and the inside solidifies with some time except for a few mm of the surface layer of the ingot. At this time, alloy elements contained exceeding the limit during the solidification and after the solidification cooling process are crystallized or precipitated in the crystal grain boundaries and in the crystal grains. A copper alloy containing 1.0% or more of Ni and 0.2% or more of P has the advantage of high strength and high conductivity, but at room temperature, it has a Ni-P component exceeding the solid solubility limit in the Cu matrix. Since it is contained in a large amount, when an ingot is produced, a Ni-P compound is usually crystallized or precipitated at the crystal grain boundary. And since the melting point of the Ni-P compound compound crystallized or precipitated at the grain boundary of the Cu-Ni-P alloy is lower than that of the parent phase Cu, the solidification of these copper alloys becomes uneven and internal strain occurs. However, due to the stress and external force, fracture occurs in the Ni-P-based compound portion, causing cracks in the casting and cooling stages. Moreover, since the Ni-P compound softens or becomes a liquid phase prior to the parent phase during the hot rolling, cracks are similarly generated.
However, since the composition of the Cu-Ni-P alloy of Patent Document 1 is 0.01 to 1.0% for Ni and 0.01 to 0.2% for P, the above problem was not particularly conscious.
An object of the present invention is to provide a Cu-Ni-P alloy that prevents cracking during casting, cooling, hot working heating or hot working, has excellent high temperature ductility and good hot workability. It is what.

本発明者らは上記の目的を達成すべく、研究を重ねた結果、下記構成を特定することにより優れた熱間加工性と優れた強度及び導電性を具備するCu−Ni−P系合金が得られることを見出した。
本発明は銅合金においてNi:1.0%以上2.0%以下(本明細書では、成分割合を表す%は質量%とする)、P:0.10%以上0.50%以下を含有し、NiとPの含有量比率Ni/P:4.0以上6.5以下で且つ、Cr:0.03%以上0.45%以下で残部がCu及び不可避的不純物から成ることを特徴とする熱間加工性に優れた銅合金であり、好ましくは引張強さ:700MPa以上且つ、導電率:40%IACS以上の特性値を示す熱間加工性に優れた高強度高導電電子機器用銅合金に関する。上記成分組成にSn、Inのうち1種類以上を0.01%以上1.0%以下含有すると、好ましくは引張強さ:750MPa以上且つ、導電率:40%IACS以上の特性値を示す。
As a result of repeated research to achieve the above object, the present inventors have identified a Cu-Ni-P alloy having excellent hot workability, excellent strength and conductivity by specifying the following configuration. It was found that it can be obtained.
In the present invention, the copper alloy contains Ni: 1.0% or more and 2.0% or less (in the present specification,% representing the component ratio is mass%), P: 0.10% or more and 0.50% or less And the content ratio of Ni and P Ni / P: 4.0 to 6.5 and Cr: 0.03% to 0.45%, with the balance being Cu and inevitable impurities Copper alloy excellent in hot workability, preferably exhibiting a characteristic value of tensile strength: 700 MPa or more and electrical conductivity: 40% IACS or more, high strength and high conductivity copper for high-conductivity electronic equipment Regarding alloys. When one or more of Sn and In are contained in the above component composition in an amount of 0.01% or more and 1.0% or less, preferably the tensile strength is 750 MPa or more and the electrical conductivity is 40% IACS or more.

本発明は、Cu−Ni−P系合金にCrを特定量添加することによって、Ni−P系化合物の結晶粒界への晶出又は析出を抑制し、これによって粒界の高温脆性を改善して熱間加工性の向上を図ったものである。
本発明の熱間加工性に優れた銅合金は高強度高導電電子機器用として優れた効果を奏する。
In the present invention, by adding a specific amount of Cr to the Cu—Ni—P alloy, crystallization or precipitation of the Ni—P compound at the grain boundary is suppressed, thereby improving the high temperature brittleness of the grain boundary. Thus, the hot workability is improved.
The copper alloy excellent in hot workability of the present invention has an excellent effect for high-strength and high-conductivity electronic equipment.

次に、本発明において銅合金の成分組成の数値範囲を限定した理由をその作用と共に説明する。
[Ni量]
Niは合金の強度及び耐熱性を確保する作用があると共に後述するPとのNi−P系化合物を析出させ、合金の強度上昇に寄与する。しかし、その含有量が1.0%未満であると所望の強度が得られず、一方、2.0%を超えてNiを含有させると熱間加工性が低下すると共に製品の曲げ加工性及び導電率の低下が顕著となる。更にその上、長径の大きなNi−P系析出物の面積率を増してしまい好ましくない。従って本発明の合金のNi含有量は1.0%〜2.0%、好ましくは1.1〜1.8%である。
Next, the reason for limiting the numerical range of the component composition of the copper alloy in the present invention will be described together with its action.
[Ni content]
Ni has the effect of ensuring the strength and heat resistance of the alloy and precipitates a Ni—P compound with P, which will be described later, thereby contributing to an increase in the strength of the alloy. However, if the content is less than 1.0%, the desired strength cannot be obtained. On the other hand, if Ni exceeds 2.0%, the hot workability decreases and the bending workability of the product and The decrease in conductivity becomes remarkable. Furthermore, the area ratio of Ni—P-based precipitates having a large major axis is increased, which is not preferable. Therefore, the Ni content of the alloy of the present invention is 1.0% to 2.0%, preferably 1.1 to 1.8%.

[P量]
Pは、Niとの化合物を析出して合金の強度及び耐熱性を向上させる。P含有量が0.10%未満であると化合物の析出が不充分であるため、所望の強度が得られない。一方、P含有量が0.50%を超えて含有させると熱間加工性が低下すると共に導電率の低下が顕著となる。更にその上、長径の大きなNi−P系析出物の面積率を増してしまい好ましくない。従って本発明の合金のP含有量は0.1%〜0.5%、好ましくは0.2〜0.4%である。
[P amount]
P precipitates a compound with Ni to improve the strength and heat resistance of the alloy. If the P content is less than 0.10%, precipitation of the compound is insufficient, so that the desired strength cannot be obtained. On the other hand, when the P content exceeds 0.50%, hot workability is lowered and the conductivity is significantly lowered. Furthermore, the area ratio of Ni—P-based precipitates having a large major axis is increased, which is not preferable. Therefore, the P content of the alloy of the present invention is 0.1% to 0.5%, preferably 0.2 to 0.4%.

[Ni/P比]
NiとPの含有量が上記の限定範囲内にあってもNiとPの含有比率Ni/PがNi−P系化合物の適切な化学量論的組成比から外れると、すなわち、4.0未満の場合にはPの、6.5を超えた場合にはNiの固溶する量が増大してしまい、導電率の低下が顕著となり好ましくない。従って本発明の合金のNi/P比は4.0以上6.5以下、好ましくは4.5〜6.0である。
[Ni / P ratio]
If the Ni / P content ratio Ni / P deviates from the appropriate stoichiometric composition ratio of the Ni-P compound even if the Ni and P contents are within the above-mentioned limited range, that is, less than 4.0 In this case, when P exceeds 6.5, the amount of Ni dissolved increases, which is not preferable because the decrease in conductivity is remarkable. Therefore, the Ni / P ratio of the alloy of the present invention is 4.0 or more and 6.5 or less, preferably 4.5 to 6.0.

[Ni−P系析出物の大きさと面積率]
Ni−P系析出物の長径をa(nm)、短径をb(nm)とすると、最終冷間圧延前のaが20nm未満の析出物は、加工歪η=2以上の圧延加工を行うと、析出物が銅中に再固溶し、導電率を低下させてしまい好ましくない。一方、最終冷間圧延前のaが20nm以上の析出物は、加工歪η=2以上の圧延加工でも再固溶しにくく、10nm以上の析出物として存在する。上記20nm以上の析出物は圧延前後で大きさの変化が少なく、特に圧延前の長径aが50nmを超える析出物は圧延後の50nmを超える長径を保つが、合金中の析出物の分散間隔が大きくなりすぎるため析出強化及び加工強化が得られなくなる。
尚、長径a及び短径bは最終冷間圧延前の合金条を圧延方向に平行に厚み直角に切断し、断面画像を画像解析装置を用いて長径aが5nm以上の析出物のすべてについて測定した全析出物の長径及び短径それぞれの平均値である。又、加工歪ηは、圧延前の板厚をt0、圧延後の板厚をtとした場合、η=ln(t0/t)で表される。
上記より、本発明の合金の最終冷間圧延前のNi−P系析出物の大きさは、好ましくは長径aが20nm〜50nmである。
又析出物のアスペクト比をa/bで表すと、a/bが5を超える場合には、η=2以上の圧延加工を行うと析出物が銅中に再固溶してしまい導電率を低下させてしまう。従って析出物のアスペクト比a/bは、好ましくは1〜5、更に好ましくは1〜3である。
強度及び導電率の低下を防ぐために好ましくは、最終冷間圧延後のaは10nm〜50nmかつa/bは1〜5である。
[Size and area ratio of Ni-P-based precipitates]
When the major axis of the Ni-P-based precipitate is a (nm) and the minor axis is b (nm), the precipitate with a before the final cold rolling of less than 20 nm undergoes rolling with a work strain η = 2 or more. Then, the precipitate is re-dissolved in copper, which lowers the conductivity, which is not preferable. On the other hand, a precipitate having a of 20 nm or more before the final cold rolling is not easily re-dissolved even in a rolling process having a working strain η = 2 or more, and exists as a precipitate having a thickness of 10 nm or more. Precipitates of 20 nm or more have little change in size before and after rolling. Particularly, precipitates with a major axis a before rolling exceeding 50 nm maintain a major axis exceeding 50 nm after rolling, but the dispersion interval of the precipitates in the alloy is large. Since it becomes too large, precipitation strengthening and work strengthening cannot be obtained.
The major axis a and the minor axis b are obtained by cutting the alloy strip before the final cold rolling in a direction perpendicular to the thickness parallel to the rolling direction, and measuring all the precipitates having a major axis a of 5 nm or more using an image analyzer. It is the average value of each major axis and minor axis of all the precipitates. Further, the processing strain eta, the plate thickness before rolling t 0, when the plate thickness after rolling was t, is expressed by η = ln (t 0 / t ).
From the above, the major axis “a” of the Ni—P-based precipitate before the final cold rolling of the alloy of the present invention is preferably 20 nm to 50 nm.
Moreover, when the aspect ratio of the precipitate is expressed by a / b, when a / b exceeds 5, when the rolling process is performed with η = 2 or more, the precipitate is re-dissolved in the copper, and the conductivity is reduced. It will decrease. Therefore, the aspect ratio a / b of the precipitate is preferably 1 to 5, more preferably 1 to 3.
In order to prevent a decrease in strength and electrical conductivity, a after the final cold rolling is preferably 10 nm to 50 nm and a / b is 1 to 5.

しかしながら、全ての析出物を上記a及びa/bの好ましい範囲内にすることは困難であるため、上記a及びa/bの範囲となる析出物の全析出物に対する割合が重要になる。そこで、合金中の全析出物の面積総和に対する、上記a及びa/bの好ましい範囲にある析出物の面積総和の割合を面積率Cとすると、本発明の面積率Cは好ましくは80%以上である。
面積率Cが80%未満の場合とは、aが50nmを超える析出物又は20nm未満の析出物が多く存在する場合である。例えば、aが50nmを超える析出物や溶解鋳造時に生じた晶出物が熱間圧延前の加熱や溶体化処理で固溶せずに残存した1000nm以上のNi−P粒子(晶出物)が多く存在する時には、強度向上に寄与する大きさ20から50nmの微細な析出物の分散間隔が大きいため、圧延加工での加工硬化によっての所望の強度は得られない。一方、aが20nm未満の析出物は、圧延加工によって再固溶してしまうため、導電率の低下が顕著になる。
However, since it is difficult to make all the precipitates within the preferable ranges of a and a / b, the ratio of the precipitates within the ranges of a and a / b to the total precipitates is important. Therefore, when the ratio of the total area of precipitates in the preferable range of a and a / b to the total area of all precipitates in the alloy is defined as area ratio C, the area ratio C of the present invention is preferably 80% or more. It is.
The case where the area ratio C is less than 80% is a case where there are many precipitates in which a exceeds 50 nm or precipitates less than 20 nm. For example, precipitates in which a exceeds 50 nm and crystallized products generated during melt casting remain 1000-nm or more Ni-P particles (crystallized products) that remain without being dissolved in the heating or solution treatment before hot rolling. When there are many, the dispersion interval of fine precipitates having a size of 20 to 50 nm that contributes to the strength improvement is large, so that the desired strength by work hardening in the rolling process cannot be obtained. On the other hand, since the precipitate with a of less than 20 nm is re-dissolved by rolling, the decrease in conductivity becomes remarkable.

[Cr量]
一般にCu−Ni−P系合金の凝固時の冷却速度が遅い場合、例えば1100℃から950℃の冷却速度が30℃/分未満の時、Ni−P系化合物が結晶粒界に集約化、粗大化を伴って晶出するため好ましくない。
Crは、Cu−Ni−P系合金の凝固時や凝固後の冷却過程及び熱間加工の加熱時にNi−P系化合物の結晶粒界への晶出又は析出を抑制し、合金の熱間加工性を向上させる。しかし、その含有量が0.03%未満であると熱間加工性の改善効果が得られず、一方、0.45%を超えてCrを含有させるとNi−P−Cr、Cr−P等の化合物が溶解中又は凝固中に生じたり、Crの晶出物が生じてしまう。これらのCrを含む化合物及び晶出物は、溶体化処理でCu母相中に固溶せず、そのため時効処理で析出するNi−P系化合物が減少し、合金の強度低下を招く。更にNi−P−Cr、Cr−P等の化合物は、製品では長径5μm以上の介在物となって製品に残存し、製品の表面欠陥、曲げ加工時の割れの起点、めっき処理時の欠陥の起点になるため、好ましくない。従って、本発明の合金のCr含有量は、0.03%〜0.45%以下、好ましくは0.05%〜0.30%である。
上記長径が5μm以上のNi−P−Cr化合物、Cr−P化合物等の介在物が存在することは好ましくなく、好ましくは長径50μmを超える介在物の個数が1mm2当たり0個かつ長径5〜50μmの介在物の個数が1mm2当たり100個以下、更に好ましくは長径5〜50μmの介在物の個数が1mm2当たり50個以下である。尚、上記Ni−P−Cr化合物、Cr−P化合物の析出物の長径は、Ni−P系析出物の長径と同様に測定する。
[Cr content]
In general, when the cooling rate during solidification of a Cu—Ni—P alloy is slow, for example, when the cooling rate from 1100 ° C. to 950 ° C. is less than 30 ° C./min, the Ni—P compound is aggregated and coarsened at the grain boundaries. It is not preferable because it crystallizes with crystallization.
Cr suppresses crystallization or precipitation of the Ni-P compound at the grain boundary during the solidification of the Cu-Ni-P alloy, during the cooling process after solidification, and during the hot working heating, and hot working of the alloy Improve sexiness. However, if the content is less than 0.03%, the effect of improving hot workability cannot be obtained. On the other hand, if the Cr content exceeds 0.45%, Ni—P—Cr, Cr—P, etc. This compound is generated during dissolution or solidification, and a crystallized product of Cr is generated. These Cr-containing compounds and crystallized substances are not solid-dissolved in the Cu matrix by the solution treatment, so that the Ni—P-based compounds precipitated by the aging treatment are reduced, and the strength of the alloy is reduced. Further, compounds such as Ni—P—Cr and Cr—P remain in the product as inclusions having a major axis of 5 μm or more, and surface defects of the product, starting points of cracks during bending, and defects during plating processing. Since it becomes a starting point, it is not preferable. Therefore, the Cr content of the alloy of the present invention is 0.03% to 0.45% or less, preferably 0.05% to 0.30%.
It is not preferable that inclusions such as Ni—P—Cr compounds and Cr—P compounds having a major axis of 5 μm or more are present, preferably the number of inclusions exceeding 50 μm of major axis is 0 per 1 mm 2 and the major axis is 5 to 50 μm. The number of inclusions is 100 or less per 1 mm 2, more preferably, the number of inclusions having a major axis of 5 to 50 μm is 50 or less per 1 mm 2 . The major axis of the Ni—P—Cr compound and Cr—P compound precipitate is measured in the same manner as the major axis of the Ni—P-based precipitate.

[Sn、In量]
Sn及びIn量は、いずれも合金の導電性を大きく低下させずに主として固溶強化により強度を向上させる作用を有している。従って必要に応じてこれらの金属を1種類以上添加するが、その含有量が総量で0.01%未満であると固溶強化による強度向上の効果が得られず、一方、総量で1.0%以上を添加すると合金の導電率及び曲げ加工性低下が顕著になる。このため、単独添加又は2種類以上の複合添加されるSn及びIn量は、0.01%〜1.0%、好ましくは総量で0.05%〜0.8%である。なお、これらの元素は本発明においては、意図的に添加される元素であり、不可避的不純物とはみなさない。
[O量]
Oは、Crと合金中で反応しやすく、Oが合金中に酸化物の状態で存在するとCr添加効果が得られない。従って、本発明の合金のO含有量は、0.0050%以下、好ましくは0.0030%以下である。
[Sn, In amount]
Both the Sn and In contents have the effect of improving the strength mainly by solid solution strengthening without greatly reducing the conductivity of the alloy. Accordingly, if necessary, one or more of these metals are added. If the total content is less than 0.01%, the effect of improving the strength by solid solution strengthening cannot be obtained, while the total amount is 1.0. When adding more than%, the electrical conductivity and bending workability of the alloy are significantly reduced. For this reason, the amount of Sn and In added individually or in combination of two or more types is 0.01% to 1.0%, preferably 0.05% to 0.8% in total. In the present invention, these elements are intentionally added elements and are not regarded as inevitable impurities.
[O amount]
O easily reacts with Cr in the alloy, and if O exists in an oxide state in the alloy, the effect of adding Cr cannot be obtained. Therefore, the O content of the alloy of the present invention is 0.0050% or less, preferably 0.0030% or less.

[引張強さ及び導電率]
本発明の銅合金は熱間加工性に優れ、更に優れた導電性、引張強さ、曲げ加工性を兼備する。本発明の銅合金の引張強さは、好ましくは700MPa以上、更に好ましくは750MPa以上であり、その上限は通常950MPa程度である。又、導電率は好ましくは40%IACS以上、更に好ましくは45%IACS以上であり、その上限は通常65%IACS程度である。
[Tensile strength and conductivity]
The copper alloy of the present invention is excellent in hot workability and further has excellent conductivity, tensile strength and bending workability. The tensile strength of the copper alloy of the present invention is preferably 700 MPa or more, more preferably 750 MPa or more, and the upper limit is usually about 950 MPa. The conductivity is preferably 40% IACS or more, more preferably 45% IACS or more, and the upper limit is usually about 65% IACS.

上記本発明の要件を満たすCu−Ni−P系合金は、通常当業者が製造において採用する、インゴット鋳造、熱間圧延、溶体化処理、中間冷間圧延、時効処理、最終冷間圧延、歪取り焼鈍等において、適宜加熱温度、時間、冷却速度、圧延加工度等を選択することにより製造することが出来る。   The Cu—Ni—P alloy satisfying the above-mentioned requirements of the present invention is generally used by those skilled in the art for ingot casting, hot rolling, solution treatment, intermediate cold rolling, aging treatment, final cold rolling, strain. In the annealing and the like, it can be manufactured by appropriately selecting the heating temperature, time, cooling rate, rolling degree, and the like.

試料の製造:
電気銅或いは無酸素銅を主原料とし、ニッケル(Ni)、15%P−Cu母合金(P)、10%Cr−Cu母合金(Cr)、錫(Sn)、インジウム(In)を副原料とし、高周波溶解炉にて真空中又はアルゴン雰囲気中で溶解し、鋳鉄製の鋳型を使用して45×45×90mmのインゴットに鋳造した。インゴットの熱間圧延試験を行い、熱間圧延で割れが発生しなかったインゴットは、熱間圧延及び溶体化処理、時効処理、中間冷間圧延、時効処理、最終冷間圧延、歪取り焼鈍の順に実施し、厚さ0.15mmの平板とした。得られた板材各種の試験片を採取して試験を行い、「強度」及び「導電率」の評価を行った。
Sample manufacture:
Electrical copper or oxygen-free copper as the main raw material, nickel (Ni), 15% P-Cu master alloy (P), 10% Cr-Cu master alloy (Cr), tin (Sn), indium (In) as auxiliary raw materials And melted in a high-frequency melting furnace in a vacuum or in an argon atmosphere, and cast into a 45 × 45 × 90 mm ingot using a cast iron mold. Ingots were subjected to a hot rolling test, and ingots that were not cracked by hot rolling were subjected to hot rolling and solution treatment, aging treatment, intermediate cold rolling, aging treatment, final cold rolling, and strain relief annealing. It implemented in order and was set as the flat plate of thickness 0.15mm. Various test pieces of the obtained plate material were collected and tested, and “strength” and “conductivity” were evaluated.

インゴットの熱間加工性評価:
「熱間加工性」は、熱間圧延によって評価した。即ち、インゴットを45×45×25mmに切断し、850℃に1時間加熱後、厚さ25mmから5mmまで3パスで熱間圧延試験を行った。熱間圧延後の試料の表面及びエッジについて目視により割れが認められた場合を、“割れ有り”、表面及びエッジに割れが無く、平滑な場合を、“割れなし”とした。
Ingot hot workability evaluation:
“Hot workability” was evaluated by hot rolling. That is, the ingot was cut into 45 × 45 × 25 mm, heated to 850 ° C. for 1 hour, and then subjected to a hot rolling test in three passes from a thickness of 25 mm to 5 mm. The case where cracks were visually observed on the surface and edge of the sample after hot rolling was defined as “cracked”, and the case where the surface and edge were not cracked and smooth was defined as “no crack”.

試験片の物性評価:
「強度」については、JIS Z 2241に規定された引張試験により13号B試験片を用いて行い、引張強さを測定した。
「導電率」は4端子法を用いて試験片の電気抵抗を測定し、%IACSで表示した。
「曲げ加工性」は90度W曲げ試験で評価した。試験はCES−M0002−6に準拠し、R−0.1mmの治具を使用して50kNの荷重で90度曲げ加工を行った。曲げ部の評価は、中央部山表面の状況を光学顕微鏡で観察して割れが発生したものを×、シワが発生したものを△、良好なものを○とした。曲げ軸は圧延方向に対して直角(Good way)とした。
Physical property evaluation of test piece:
About "strength", it carried out using the No. 13 B test piece by the tension test prescribed | regulated to JISZ2241, and measured the tensile strength.
“Conductivity” was measured by measuring the electrical resistance of a test piece using a four-terminal method and expressed in% IACS.
“Bending workability” was evaluated by a 90 ° W bending test. The test was performed in accordance with CES-M0002-6, and bending was performed 90 degrees with a load of 50 kN using an R-0.1 mm jig. In the evaluation of the bent portion, the state of the surface of the central mountain was observed with an optical microscope. The bending axis was set at right angles to the rolling direction (Good way).

Ni−P系析出物の評価:
最終冷間圧延前の合金条を圧延方向に平行に厚み直角に切断し、走査型電子顕微鏡及び透過型電子顕微鏡を使用して、断面の析出物を10視野観察した。析出物の大きさが5〜50nmの場合は50万倍〜70万倍の視野(約1.4×1010〜2.0×1010nm2)、100〜2000nmの場合は5万倍〜10万倍の視野(約1.0×1013〜2.0×1013nm2)で撮影を行った。撮影した写真の画像を画像解析装置(株式会社ニレコ製、商品名ルーゼックス)を用いて長径aが5nm以上の析出物のすべてについて個々に長径a、短径b、及び面積を測定した。これら析出物からランダムに100個選び、全析出物の長径の平均ataと短径の平均bta及びこれらから求めた平均のアスペクト比ata/btaを得て、それぞれ長径a、短径b及びアスペクト比a/bとした。長径aが5μm以上の全ての析出物の面積の総和を全析出物の総面積とした。その全析出物の総面積に対して、長径aが10nm〜50nm、アスペクト比a/bが1〜5である析出物の面積総和の割合を面積率C(%)とした。
尚、最終冷間圧延(通常は加工歪η=2以上)により、長径20nm以下のNi−P系析出物又は長径20nmを超えているがアスペクト比が3を超える析出物は固溶してしまうが、20nm以上かつアスペクト比が1〜3の析出物は最終冷間圧延後もその長径、短径及びアスペクト比を保つことを確認した。又、析出物の面積率Cも、200nmを超える析出物は固溶しないため最終冷間圧延後もほとんど変化しなかった。
Evaluation of Ni-P-based precipitates:
The alloy strips before the final cold rolling were cut parallel to the rolling direction at a right angle to the thickness, and using a scanning electron microscope and a transmission electron microscope, 10 precipitates of the cross section were observed. When the size of the precipitate is 5 to 50 nm, the field of view is about 500,000 to 700,000 times (about 1.4 × 10 10 to 2.0 × 10 10 nm 2 ), and when the size is 100 to 2000 nm, the field is 50,000 times to Photographing was performed with a 100,000 × field of view (approximately 1.0 × 10 13 to 2.0 × 10 13 nm 2 ). Using the image of the photographed photograph, the major axis a, the minor axis b, and the area of each of the precipitates having a major axis a of 5 nm or more were measured using an image analyzer (manufactured by Nireco Corporation, trade name Luzex). Select 100 randomly from these deposits, with the average of the aspect ratio a ta / b ta the major axis determined from the mean a ta and and average b ta of minor all these precipitates, respectively major axis a, the minor axis b and aspect ratio a / b. The total area of all precipitates having a major axis a of 5 μm or more was taken as the total area of all precipitates. The ratio of the total area of the precipitates having a major axis a of 10 nm to 50 nm and an aspect ratio a / b of 1 to 5 was defined as an area ratio C (%) with respect to the total area of all the precipitates.
In addition, by the final cold rolling (usually processing strain η = 2 or more), Ni—P-based precipitates having a major axis of 20 nm or less or precipitates having a major axis exceeding 20 nm but having an aspect ratio exceeding 3 are dissolved. However, it was confirmed that a precipitate having an aspect ratio of 1 to 3 at 20 nm or more maintained its major axis, minor axis and aspect ratio even after the final cold rolling. Also, the area ratio C of the precipitates hardly changed even after the final cold rolling because the precipitates exceeding 200 nm were not dissolved.

本発明に係る熱間加工性に優れた高強度高導電性銅合金の実施例を、表1に示す成分組成の銅合金について、比較例とともに説明する。本発明の合金実施例1〜9は、熱間圧延時に割れが発生することなく、優れた強度及び導電率を具備していた。一方、比較例10〜22までの結果を検討すると、比較例10〜13については、Crの添加がない又は規定量未満となっているために、熱間圧延で割れが生じた。比較例14は、Pの添加量が0.50%を超えるため、比較例15は、SnとInの添加量の合計が1.0%を超えるため、比較例16は、Snの添加量の合計が1.0%を超えるため、それぞれ熱間圧延時に割れが発生した。比較例17は、Ni添加量、比較例18はPの添加量が本発明の規定する範囲から低く外れるため、強度が低い。比較例19は、Ni/P比が高く外れるために、Niの固溶する量が増大して導電率の低下が生じ、析出物の量が少ないため、強度も低い。比較例20は、Ni/P比が適切な組成比から低く外れるために、Pの固溶する量が増大して導電率の低下が生じた。比較例21は、Niの添加量が2.0%を超え、Pの添加量が0.50%を超えるため、熱間圧延時に割れが発生した。比較例22は、Cr添加量が0.45%を超えるため、Ni−P−Cr、Cr−P等の化合物やCrが凝固時に晶出又は析出したことにより、Ni−P系の析出物量が減少し、強度と導電率が低く、曲げ加工性が劣る。   Examples of the high-strength, high-conductivity copper alloy excellent in hot workability according to the present invention will be described with reference to the copper alloys having the component compositions shown in Table 1 together with comparative examples. Alloy Examples 1 to 9 of the present invention had excellent strength and electrical conductivity without cracking during hot rolling. On the other hand, when the results up to Comparative Examples 10 to 22 were examined, in Comparative Examples 10 to 13 there was no addition of Cr or less than the specified amount, so cracking occurred during hot rolling. Since Comparative Example 14 has an addition amount of P exceeding 0.50%, Comparative Example 15 has a total addition amount of Sn and In exceeding 1.0%. Since the total exceeded 1.0%, cracks occurred during hot rolling. Comparative Example 17 has a low strength because Ni addition amount and Comparative Example 18 has a low addition amount of P from the range defined by the present invention. In Comparative Example 19, since the Ni / P ratio deviates high, the amount of Ni dissolved increases and the conductivity decreases, and the amount of precipitates is small, so the strength is low. In Comparative Example 20, since the Ni / P ratio deviated from an appropriate composition ratio, the amount of dissolved P increased and the conductivity decreased. In Comparative Example 21, since the addition amount of Ni exceeded 2.0% and the addition amount of P exceeded 0.50%, cracks occurred during hot rolling. In Comparative Example 22, since the Cr addition amount exceeds 0.45%, a compound such as Ni-P-Cr, Cr-P, or Cr crystallizes or precipitates during solidification, so that the amount of Ni-P-based precipitate is increased. Decrease, strength and conductivity are low, bending workability is poor.

Figure 0004750602
Figure 0004750602

Claims (1)

質量割合にて、Ni:1.0%〜2.0%、P:0.10%〜0.50%を含有し、NiとPの含有量比率Ni/P:4.0〜6.5で且つ、Cr:0.03%〜0.45%であり、残部がCu及び不可避的不純物から成ることを特徴とする熱間加工性に優れた銅合金 Ni: 1.0% to 2.0%, P: 0.10% to 0.50% in terms of mass ratio, Ni / P content ratio Ni / P: 4.0 to 6.5 And Cr: 0.03% to 0.45%, the balance being made of Cu and inevitable impurities, a copper alloy having excellent hot workability .
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JPS60145344A (en) * 1984-01-05 1985-07-31 Furukawa Electric Co Ltd:The Copper alloy for material of lead of semiconductor apparatus
JPS634034A (en) * 1986-06-19 1988-01-09 豊山金属工業株式会社 Production of copper alloy and copper alloy plate for electric and electronic parts
JPH04231445A (en) * 1990-12-27 1992-08-20 Nikko Kyodo Co Ltd Production of electrifying material
JPH04231433A (en) * 1990-12-27 1992-08-20 Nikko Kyodo Co Ltd Electrifying material
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JPS60145344A (en) * 1984-01-05 1985-07-31 Furukawa Electric Co Ltd:The Copper alloy for material of lead of semiconductor apparatus
JPS634034A (en) * 1986-06-19 1988-01-09 豊山金属工業株式会社 Production of copper alloy and copper alloy plate for electric and electronic parts
JPH04231445A (en) * 1990-12-27 1992-08-20 Nikko Kyodo Co Ltd Production of electrifying material
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