JP4950734B2 - High strength and high conductivity copper alloy with excellent hot workability - Google Patents

High strength and high conductivity copper alloy with excellent hot workability Download PDF

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JP4950734B2
JP4950734B2 JP2007093467A JP2007093467A JP4950734B2 JP 4950734 B2 JP4950734 B2 JP 4950734B2 JP 2007093467 A JP2007093467 A JP 2007093467A JP 2007093467 A JP2007093467 A JP 2007093467A JP 4950734 B2 JP4950734 B2 JP 4950734B2
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phase particles
strength
alloy
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conductivity
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JP2008248351A (en
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雅俊 衛藤
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JX Nippon Mining and Metals Corp
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本発明は、高強度、高導電性の電子機器部品用銅合金に関するものであり、特に小型、高集積化された半導体機器リード用及び端子コネクタ用銅合金において、熱間加工性に優れ、曲げ加工性を損なうことなく特に強度、導電性、熱伝導性に優れた電子部品用銅合金に関する。   The present invention relates to a high-strength, high-conductivity copper alloy for electronic device parts, and particularly excellent in hot workability and bending in a small and highly integrated copper alloy for semiconductor device leads and terminal connectors. The present invention relates to a copper alloy for electronic parts that is particularly excellent in strength, conductivity and thermal conductivity without impairing workability.

銅及び銅合金は、コネクタ、リード端子等の電子部品及びフレキシブル回路基板用として多用途に渡って幅広く利用されている材料であり、急速に展開するIT化による情報機器の高機能化及び小型化・薄肉化に対応して更なる特性(強度、曲げ加工性、導電性)の向上を要求されている。
又、ICの高集積化に伴い、消費電力の高い半導体素子が多く使用されるようになり、半導体機器のリードフレーム材には、放熱性(導電性)の良いCu−Ni−Si系やCu−Fe−P、Cu−Cr−Sn、Cu−Ni−P等の析出型合金が使用されるようになった。
特許文献1では、Cu−Ni−P系合金中のNi、P、Mg成分量を調整し、強度及び導電性、耐応力緩和性を備えた合金が報告されている。
特開2000−273562号公報
Copper and copper alloys are materials widely used for electronic parts such as connectors and lead terminals and flexible circuit boards. High-functionality and miniaturization of information equipment due to the rapid development of IT.・ Further improvements in properties (strength, bending workability, conductivity) are required in response to thinning.
In addition, with the high integration of ICs, many semiconductor elements with high power consumption are used, and the lead frame material of semiconductor devices has a good heat dissipation (conductivity) such as Cu-Ni-Si or Cu. Precipitation alloys such as -Fe-P, Cu-Cr-Sn, and Cu-Ni-P have come to be used.
Patent Document 1 reports an alloy having strength, conductivity, and stress relaxation resistance by adjusting the amounts of Ni, P, and Mg components in a Cu-Ni-P alloy.
JP 2000-273562 A

一般に、銅合金の鋳造、例えば連続或いは半連続鋳造において、モールドにより急激に抜熱され、塊の表層の数mmを除いて内部は時間をかけて凝固する。このため、凝固時及び凝固後の冷却過程において、室温におけるCu母相への固溶限の限界を超えて含有された合金元素が、結晶粒界及び結晶粒内に晶出又は析出する。特にCu−Ni−P系合金の結晶粒界に晶出又は析出したNi−P化合物は母相のCuより融点が低いため、凝固中の不均一な歪等で発生する応力や外力により、Ni−P化合物の部分で破壊が生じる。また、熱間圧延の加熱時においても、Ni−P化合物が軟化又は液相化すると熱間圧延時に割れが生じる。このように、Cu−Ni−P系合金には鋳造時の割れや熱間加工時の割れが発生する問題があったが、特許文献1にはそのような問題は意識されていない。
本発明の目的は、鋳造工程中や、熱間加工工程における加熱中又は熱間加工中に発生する割れを防止し、熱間加工性が良好で曲げ加工性を損なうことなく高強度、高導電性及び高熱伝導性を発揮するCu−Ni−P系合金からなる電子部品用銅合金を提供しようとするものである。
Generally, in the casting of a copper alloy, for example, continuous or semi-continuous casting, heat is rapidly removed by a mold, and the inside solidifies over time except for a few mm of the surface layer of the lump. For this reason, in the cooling process during solidification and after solidification, alloy elements contained exceeding the limit of the solid solubility in the Cu matrix at room temperature are crystallized or precipitated in the crystal grain boundaries and crystal grains. In particular, since the Ni-P compound crystallized or precipitated at the crystal grain boundary of the Cu-Ni-P alloy has a lower melting point than that of the parent phase Cu, the Ni-P compound is caused by stress or external force generated due to uneven strain during solidification. Destruction occurs at the portion of the -P compound. Even during hot rolling, cracking occurs during hot rolling when the Ni-P compound is softened or liquidified. As described above, the Cu—Ni—P-based alloy has a problem that a crack at the time of casting or a crack at the time of hot working occurs, but Patent Document 1 is not aware of such a problem.
The object of the present invention is to prevent cracks that occur during the casting process or during heating or hot working in the hot working process, and have good hot workability and high strength and high conductivity without impairing bending workability. An object of the present invention is to provide a copper alloy for electronic parts made of a Cu-Ni-P-based alloy that exhibits high performance and high thermal conductivity.

本発明者らは上記の目的を達成すべく、研究を重ねた結果、下記構成を採用することにより曲げ加工性を損なうことなく優れた熱間加工性と優れた強度及び導電性を具備するCu−Ni−P系合金が得られることを見出した。
本発明は銅合金においてNi:0.50%〜1.00%(本明細書において、成分割合を表す%は質量%とする)、P:0.10%〜0.25%を含有し、NiとPの含有量比率Ni/P:4.0〜5.5で且つ、B:0.005%〜0.070%、O:0.0050%以下であり、Fe、Co、Mn、Ti、Zrのうち1種類以上の含有量が合計で0.05%以下、好ましくは0.03%以下で残部がCu及び不可避的不純物から成る銅合金において、第2相粒子の大きさについて、長径:a、短径:bとした時、a:20nm〜50nmで且つ第2相粒子のアスペクト比a/b:1〜5の第2相粒子が銅合金中に含まれる全第2相粒子の面積率で80%以上を占めることを特徴とする熱間加工性に優れた高強度高導電性銅合金である。
本発明の銅合金は、更にSn及びInのうち1種以上を合計で0.01%〜1.0%含むこともできる。
The present inventors have conducted research to achieve the above object, and as a result, by adopting the following configuration, Cu having excellent hot workability, excellent strength and conductivity without impairing bending workability. It has been found that a -Ni-P alloy can be obtained.
The present invention includes a copper alloy containing Ni: 0.50% to 1.00% (in the present specification,% representing the component ratio is mass%), P: 0.10% to 0.25%, Ni / P content ratio Ni / P: 4.0 to 5.5, B: 0.005% to 0.070%, O: 0.0050% or less, Fe, Co, Mn, Ti In the copper alloy in which the content of one or more of Zr is 0.05% or less in total, preferably 0.03% or less, and the balance is made of Cu and inevitable impurities, : A, minor axis: b, a: 20 nm to 50 nm and second phase particles having an aspect ratio of a / b: 1 to 5 of all second phase particles contained in the copper alloy It is a high-strength, high-conductivity copper alloy excellent in hot workability characterized by occupying 80% or more in area ratio.
The copper alloy of the present invention may further contain one or more of Sn and In in a total of 0.01% to 1.0%.

本発明では、Cu−Ni−P系合金へBを特定量添加することによって、Ni−P化合物の結晶粒界への晶出又は析出を抑制し、これによって粒界の高温脆性を改善して熱間加工性の向上を図ることができる。   In the present invention, by adding a specific amount of B to the Cu-Ni-P alloy, crystallization or precipitation of the Ni-P compound at the crystal grain boundary is suppressed, thereby improving the high temperature brittleness of the grain boundary. The hot workability can be improved.

次に、本発明において銅合金の成分組成の数値範囲を限定した理由をその作用と共に説明する。
[Ni量]
Niは合金中に固溶して強度、耐応力緩和特性及び耐熱性(高温での高強度維持)を確保する作用があると共に後述するPとの化合物を析出させ、合金の強度上昇に寄与する。しかし、その含有量が0.50%未満であると所望の強度が得られず、一方、1.00%を超えてNiを含有させると導電率が低下が顕著となり、引張強さ650MPa以上で且つ導電率45%IACS以上の高強度高導電性が得られなくなる。従って本発明の合金のNi含有量は0.50%〜1.00%である。
[P量]
Pは、Niとの化合物を析出して合金の強度及び耐熱性を向上させる。P含有量が0.10%未満であると化合物の析出が不充分であるため、所望の強度が得られない。一方、P含有量が0.25%を超えて含有させるとNiとPの含有バランスが崩れて合金中のPが過剰になり、固溶P量が増大して導電率の低下が顕著となる。従って本発明の合金のP含有量は0.10%〜0.25%である。
[Ni/P比]
NiとPの含有量が上記の限定範囲内にあってもNiとPの含有比率Ni/Pが第2相粒子の適切な化学量論的組成比から外れると、すなわち、4.0未満の場合にはPの固溶する量が増大し、5.5を超えた場合にはNiの固溶する量が増大してしまい、導電率の低下が顕著となり好ましくない。従って本発明の合金のNi/P比は4.0〜5.5、好ましくは4.5〜5.0である。
Next, the reason for limiting the numerical range of the component composition of the copper alloy in the present invention will be described together with its action.
[Ni content]
Ni dissolves in the alloy and has the effect of ensuring strength, stress relaxation resistance and heat resistance (maintaining high strength at high temperatures), and precipitates a compound with P described later, thereby contributing to an increase in strength of the alloy. . However, if the content is less than 0.50%, the desired strength cannot be obtained. On the other hand, if Ni is contained in excess of 1.00%, the electrical conductivity decreases significantly, and the tensile strength is 650 MPa or more. In addition, high strength and high conductivity with a conductivity of 45% IACS or higher cannot be obtained. Therefore, the Ni content of the alloy of the present invention is 0.50% to 1.00%.
[P amount]
P precipitates a compound with Ni to improve the strength and heat resistance of the alloy. If the P content is less than 0.10%, precipitation of the compound is insufficient, so that the desired strength cannot be obtained. On the other hand, if the P content exceeds 0.25%, the balance of Ni and P content is lost, P in the alloy becomes excessive, the amount of solute P increases, and the decrease in conductivity becomes significant. . Therefore, the P content of the alloy of the present invention is 0.10% to 0.25%.
[Ni / P ratio]
Even if the content of Ni and P is within the above-mentioned limited range, if the content ratio Ni / P of Ni and P deviates from the appropriate stoichiometric composition ratio of the second phase particles, that is, less than 4.0 In this case, the amount of solid solution of P is increased, and when the amount exceeds 5.5, the amount of solid solution of Ni is increased. Therefore, the Ni / P ratio of the alloy of the present invention is 4.0 to 5.5, preferably 4.5 to 5.0.

[B量]
Bは、Cu−Ni−P系合金の凝固時や凝固後の冷却過程及び熱間加工の加熱時にNi−P化合物の結晶粒界への晶出又は析出を抑制し、合金の熱間加工性を向上させる。しかし、その含有量が0.005%未満であると熱間加工性の改善効果が得られず、一方、0.070%を超えてBを含有させるとNi−P−B、B−P等の化合物が溶解中又は凝固中に生じてしまう。これらのBを含む化合物は、溶体化処理でCu母相中に固溶せず、そのため時効処理で析出するNi−P化合物が減少し、合金の強度低下を招く。更にNi−P−B、B−P等の化合物は、製品では大きさ5μmから50μmの介在物となって製品に残存し、製品の表面欠陥、曲げ加工時の割れの起点、めっき処理時の欠陥の起点になるため、好ましくない。従って、本発明の合金のB含有量は、0.005%〜0.070%以下、好ましくは0.007%〜0.060%である。
[B amount]
B suppresses the crystallization or precipitation of the Ni-P compound at the grain boundaries during solidification of the Cu-Ni-P alloy, during the cooling process after solidification, and during heating during hot working, and the hot workability of the alloy. To improve. However, if the content is less than 0.005%, the effect of improving hot workability cannot be obtained. On the other hand, if the content of B exceeds 0.070%, Ni-P-B, BP, etc. This compound occurs during dissolution or coagulation. These B-containing compounds are not solid-dissolved in the Cu matrix by the solution treatment, and therefore the Ni-P compounds precipitated by the aging treatment are reduced, leading to a reduction in the strength of the alloy. Further, compounds such as Ni-P-B and BP remain in the product as inclusions having a size of 5 μm to 50 μm in the product, surface defects of the product, starting points of cracks during bending, Since it becomes a starting point of a defect, it is not preferable. Therefore, the B content of the alloy of the present invention is 0.005% to 0.070% or less, preferably 0.007% to 0.060%.

[Fe、Co、Mn、Ti及びZr量]
Fe、Co、Mn、Ti及びZrは、いずれもPと化合物を生成しやすく、溶解や凝固中にFe−P、Co−P、Mn−P、Ti−P、Zr−P等の化合物が生じ、また、時効処理でこれらの化合物が析出するとNi−P系の析出物が減少し、合金の強度低下を招く。このため、Fe、Co、Mn、Ti及びZrの単独または2種類以上の含有量は0.05%以下、好ましくは総量で0.03%以下である。
[Fe, Co, Mn, Ti and Zr amounts]
Fe, Co, Mn, Ti and Zr all easily form compounds with P, and compounds such as Fe-P, Co-P, Mn-P, Ti-P, Zr-P are formed during dissolution and solidification. Further, when these compounds are precipitated by the aging treatment, Ni-P-based precipitates are reduced, and the strength of the alloy is reduced. Therefore, the content of Fe, Co, Mn, Ti and Zr alone or in combination of two or more is 0.05% or less, preferably 0.03% or less in total.

[O量]
OはP及びCuと合金中で反応しやすく、合金中に酸化物の状態(Cu−P−O)で存在するとNiとPの化合物の析出を阻害し、強度向上が低下すると共に曲げ加工性が劣化する。従って、本発明の合金のO含有量は、0.0050%以下、好ましくは0.0030%以下である。
[O amount]
O easily reacts with P and Cu in the alloy, and when present in the alloy in an oxide state (Cu—P—O), the precipitation of Ni and P compounds is hindered, the strength improvement is lowered, and bending workability is reduced. Deteriorates. Therefore, the O content of the alloy of the present invention is 0.0050% or less, preferably 0.0030% or less.

[Sn、In量]
Sn及びInは、いずれも合金の導電性を大きく低下させずに主として固溶強化により強度を向上させる作用を有している。従って必要に応じてこれらの金属を1種類以上添加するが、その含有量が総量で0.01%未満であると固溶強化による強度向上の効果が得られず、一方、総量で1.0%以上を添加すると合金の導電率及び曲げ加工性低下が顕著になる。このため、単独添加又は2種類以上の複合添加されるSn及びIn量は、0.01%〜1.0%、好ましくは総量で0.05%〜0.8%である。なお、これらの元素は本発明においては、意図的に添加される元素であり、不可避的不純物とはみなさない。
[Sn, In amount]
Both Sn and In have the effect of improving the strength mainly by solid solution strengthening without greatly reducing the conductivity of the alloy. Accordingly, if necessary, one or more of these metals are added. If the total content is less than 0.01%, the effect of improving the strength by solid solution strengthening cannot be obtained, while the total amount is 1.0. When adding more than%, the electrical conductivity and bending workability of the alloy are significantly reduced. For this reason, the amount of Sn and In added individually or in combination of two or more types is 0.01% to 1.0%, preferably 0.05% to 0.8% in total. In the present invention, these elements are intentionally added elements and are not regarded as inevitable impurities.

[第2相粒子の大きさと面積率]
本発明の第2相粒子には、析出物、晶出物、介在物等が含まれる。本発明の組成範囲内では通常、Ni−P系析出物以外の析出物は析出せず、Ni−P系析出物は、溶体化処理に加えて時効処理で特定の大きさに制御できる。その他の第2相粒子として、本発明では溶解及び鋳造中に生じる「晶出物」(Ni−P、Ni−P−Bなど)や「介在物」(Cu−O、Cu−Ni−P−O、Cu−Ni−P−O−B、Cu−Sなどの酸化物や硫化物)が存在し得るが、これらが存在する場合、その大きさは100nmから1μmを超え、溶体化処理及び時効処理によっても本発明の範囲内の大きさに制御できない。そのため、晶出物や介在物を合金中に残存させないよう溶体化処理を充分に行い、介在物の生成を抑制するためP、Bなどの添加量を規定し、酸化物(介在物)の生成を抑制するため、O含有量を低く規定する。晶出物や介在物を充分に低減できなかった試料中の全第2相粒子の面積率Cは80%未満になり、本発明の範囲外となる。
[Size and area ratio of second phase particles]
The second phase particles of the present invention include precipitates, crystallization products, inclusions and the like. Within the composition range of the present invention, precipitates other than Ni-P-based precipitates usually do not precipitate, and Ni-P-based precipitates can be controlled to a specific size by aging treatment in addition to solution treatment. As other second phase particles, in the present invention, "crystallized substances" (Ni-P, Ni-P-B, etc.) and "inclusions" (Cu-O, Cu-Ni-P-) generated during melting and casting are used. O, Cu—Ni—P—O—B, Cu—S, and the like) may be present, but if they are present, the size of the oxide may exceed 100 nm to 1 μm, and solution treatment and aging may occur. The size within the range of the present invention cannot be controlled even by processing. Therefore, solution treatment is sufficiently performed so that crystallized substances and inclusions do not remain in the alloy, and the addition amount of P, B, etc. is specified to suppress the formation of inclusions, and oxide (inclusion) is generated. In order to suppress this, the O content is specified low. The area ratio C of all second phase particles in the sample in which the crystallized substances and inclusions could not be sufficiently reduced is less than 80%, which is outside the scope of the present invention.

第2相粒子の長径をa(nm)、短径をb(nm)とすると、最終冷間圧延前のaが20nm未満の第2相粒子は、加工歪η=2以上の圧延加工を行うと、第2相粒子が銅中に再固溶し、導電率を低下させてしまい好ましくない。ここで、加工歪ηは、圧延前の板厚をt0、圧延後の板厚をtとした場合、η=ln(t0/t)で表される。一方、最終冷間圧延前のaが20nm以上の第2相粒子は、加工歪η=2以上の圧延加工でも再固溶しにくく、10nm以上の第2相粒子として存在する。上記20nm以上の第2相粒子は圧延前後で大きさの変化が少なく、特に圧延前の長径aが50nmを超える第2相粒子は圧延後の50nmを超える長径を保つが、合金中の第2相粒子の分散間隔が大きくなりすぎるため析出強化及び加工強化が得られなくなる。
尚、上記長径a及び短径bは最終冷間圧延前の合金条を圧延方向に平行に厚み直角に切断し、断面画像を画像解析装置を用いて長径aが5nm以上の第2相粒子のすべてについて測定した全第2相粒子の長径及び短径それぞれの平均値である。
上記より、本発明の合金の最終冷間圧延前の第2相粒子の好ましい大きさは、長径aが20nm〜50nmである。
When the major axis of the second phase particle is a (nm) and the minor axis is b (nm), the second phase particle having a before the final cold rolling of less than 20 nm undergoes a rolling process with a working strain η = 2 or more. Then, the second phase particles are re-dissolved in copper, which lowers the conductivity, which is not preferable. Here, the processing strain η is represented by η = ln (t 0 / t), where t 0 is the thickness before rolling and t is the thickness after rolling. On the other hand, the second phase particles having an a of 20 nm or more before the final cold rolling are not easily re-dissolved even in a rolling process having a working strain η = 2 or more, and are present as second phase particles having a thickness of 10 nm or more. The second phase particles of 20 nm or more have little change in size before and after rolling. Particularly, the second phase particles having a major axis a before rolling exceeding 50 nm maintain a major axis exceeding 50 nm after rolling. Since the dispersion interval of the phase particles becomes too large, precipitation strengthening and work strengthening cannot be obtained.
The major axis a and the minor axis b are obtained by cutting the alloy strip before the final cold rolling in a direction perpendicular to the thickness parallel to the rolling direction, and using the image analysis apparatus to analyze the cross-sectional image of the second phase particles having the major axis a of 5 nm or more. It is the average value of each major axis and minor axis of all second phase particles measured for all.
From the above, the preferred size of the second phase particles before the final cold rolling of the alloy of the present invention is that the major axis a is 20 nm to 50 nm.

又、第2相粒子のアスペクト比をa/bで表すと、a/bが5を超える場合には、η=2以上の圧延加工を行うと第2相粒子が銅中に再固溶してしまい導電率を低下させてしまう。従って最終冷間圧延前の第2相粒子のアスペクト比a/bは、好ましくは1〜5、更に好ましくは1〜3である。   In addition, when the aspect ratio of the second phase particles is represented by a / b, when a / b exceeds 5, the second phase particles are re-dissolved in copper when rolling is performed with η = 2 or more. As a result, the conductivity is lowered. Therefore, the aspect ratio a / b of the second phase particles before the final cold rolling is preferably 1 to 5, more preferably 1 to 3.

強度及び導電率の低下を防ぐために好ましくは、本発明の合金の最終冷間圧延後の第2相粒子のaは10nm〜50nmかつa/bは1〜5である。しかしながら、全ての第2相粒子を上記a及びa/bの好ましい範囲内にすることは困難であるため、上記a及びa/bの範囲となる第2相粒子の全第2相粒子に対する割合が重要になる。尚、「全第2相粒子」とは、長径aが5nm以上の第2相粒子全てを言う。そこで、時効処理後で最終冷間圧延前の合金中の全第2相粒子の面積総和に対する、上記a及びa/bの好ましい範囲にある第2相粒子の面積総和の割合を面積率Cとすると、本発明の面積率Cは80%以上である。
面積率Cが80%未満の場合とは、aが50nmを超える第2相粒子又は20nm未満の第2相粒子が多く存在する場合である。例えば、aが50nmを超える第2相粒子や溶解鋳造時に生じた晶出物が熱間圧延前の加熱や溶体化処理で固溶せずに残存した1000nm以上のNi−P粒子(晶出物)が多く存在する時には、強度向上に寄与する大きさ20から50nmの微細な第2相粒子の分散間隔が大きいため、圧延加工での加工硬化によっての所望の強度は得られない。一方、aが20nm未満の第2相粒子は、圧延加工によって再固溶してしまうため、導電率の低下が顕著になる。
In order to prevent a decrease in strength and electrical conductivity, the a of the second phase particles after the final cold rolling of the alloy of the present invention is preferably 10 nm to 50 nm and a / b is 1 to 5. However, since it is difficult to make all the second phase particles within the preferable ranges of a and a / b, the ratio of the second phase particles in the range of a and a / b to the total second phase particles. Becomes important. “All second phase particles” refers to all second phase particles having a major axis a of 5 nm or more. Therefore, the ratio of the total area of the second phase particles in the preferable range of a and a / b to the total area of all the second phase particles in the alloy after the aging treatment and before the final cold rolling is expressed as an area ratio C. Then, the area ratio C of the present invention is 80% or more.
The case where the area ratio C is less than 80% is a case where there are many second phase particles in which a exceeds 50 nm or second phase particles less than 20 nm. For example, second-phase particles with a exceeding 50 nm or crystallized products generated during melt casting remain 1000-nm or more Ni-P particles (crystallized products) remaining without being dissolved in the heating or solution treatment before hot rolling. ) Is present in large amounts, the dispersion interval of fine second phase particles having a size of 20 to 50 nm that contributes to the strength improvement is large, so that the desired strength by work hardening in the rolling process cannot be obtained. On the other hand, since the second phase particles having a of less than 20 nm are re-dissolved by rolling, the decrease in conductivity becomes remarkable.

上記本発明の要件を満たすCu−Ni−P系合金は、通常当業者が製造において採用する、インゴット鋳造、熱間圧延、溶体化処理、中間冷間圧延、時効処理、最終冷間圧延、歪取り焼鈍等において、適宜加熱温度、時間、冷却速度、圧延率等を選択することにより製造することが出来る。例えば、(1)溶解・鋳造、(2)熱間圧延、(3)酸化スケール除去、(4)冷間圧延(厚さ調整)、(5)溶体化処理、(6)冷間圧延、(7)時効処理、(8)表面清浄処理(研磨や酸洗)、(9)冷間圧延(最終)、(10)歪み取り焼鈍の順で一部の工程を繰り返したり省略したりして製造する。
好ましくは時効処理の際の温度及び時間を適宜調整し、最終冷間圧延の加工歪η=0〜1.4程度とすると良い。
The Cu—Ni—P alloy satisfying the above-mentioned requirements of the present invention is generally used by those skilled in the art for ingot casting, hot rolling, solution treatment, intermediate cold rolling, aging treatment, final cold rolling, strain. In the annealing and the like, it can be produced by appropriately selecting the heating temperature, time, cooling rate, rolling rate and the like. For example, (1) melting and casting, (2) hot rolling, (3) oxide scale removal, (4) cold rolling (thickness adjustment), (5) solution treatment, (6) cold rolling, ( 7) Manufactured by repeating or omitting some steps in the order of aging treatment, (8) surface cleaning treatment (polishing and pickling), (9) cold rolling (final), and (10) strain relief annealing. To do.
Preferably, the temperature and time during the aging treatment are appropriately adjusted so that the work strain η = 0 to about 1.4 in the final cold rolling.

試料の製造
電気銅或いは無酸素銅を主原料とし、ニッケル(Ni)、15%P−Cu母合金、2%B−Cu(B)、錫(Sn)、インジウム(In)、10%Fe−Cu(Fe)、10%Co−Cu(Co)、25%Mn−Cu(Mn)、スポンジチタン(Ti)及びスポンジジルコニウム(Zr)を副原料とし、高周波溶解炉にて真空中又はアルゴン雰囲気中で溶解し、45×45×90mmのインゴットに鋳造した。インゴットの熱間圧延試験を行い、熱間圧延で割れが発生しなかったインゴットは、熱間圧延及び溶体化処理、時効処理、中間冷間圧延、時効処理、最終冷間圧延、歪取り焼鈍の順に実施し、厚さ0.15mmの平板とした。得られた板材各種の試験片を採取して試験を行い、「強度」及び「導電率」の評価を行った。
Manufacture of samples Mainly made of electrolytic copper or oxygen-free copper, nickel (Ni), 15% P—Cu master alloy, 2% B—Cu (B), tin (Sn), indium (In), 10% Fe— Cu (Fe), 10% Co—Cu (Co), 25% Mn—Cu (Mn), sponge titanium (Ti) and sponge zirconium (Zr) are used as auxiliary materials in a high frequency melting furnace in a vacuum or argon atmosphere. And was cast into a 45 × 45 × 90 mm ingot. Ingots were subjected to a hot rolling test, and ingots that were not cracked by hot rolling were subjected to hot rolling and solution treatment, aging treatment, intermediate cold rolling, aging treatment, final cold rolling, and strain relief annealing. It implemented in order and was set as the flat plate of thickness 0.15mm. Various test pieces of the obtained plate material were collected and tested, and “strength” and “conductivity” were evaluated.

インゴットの熱間加工性評価
「熱間加工性」は、熱間圧延によって評価した。即ち、インゴットを45×45×25mmに切断し、850℃に1時間加熱後、厚さ25mmから5mmまで3パスで熱間圧延試験を行った。熱間圧延後の試料の表面及びエッジについて目視により割れが認められた場合を、“割れ有り”、表面及びエッジに割れが無く、平滑な場合を、“割れなし”とした。
本発明では、熱間加工性に優れたとは、上記評価で「割れなし」であることをいう。
試験片の物性評価
「強度」については、JIS Z 2241に規定された引張試験により13号B試験片を用いて行い、引張強さを測定した。
本発明では、高強度とは上記評価で引張強さ650MPa以上であることをいう。
「導電率」は4端子法を用いて試験片の電気抵抗を測定し、%IACSで表示した。
本発明では、高導電性とは上記評価で導電率45%IACS以上であることをいう。
「曲げ加工性」は90度W曲げ試験で評価した。試験はCES−M0002−6に準拠し、R−0.1mmの治具を使用して50kNの荷重で90度曲げ加工を行った。曲げ部の評価は、中央部山表面の状況を光学顕微鏡で観察して割れが発生したものを×、シワが発生したものを△、良好なものを○とした。曲げ軸は圧延方向に対して直角(Good way)とした。
Evaluation of hot workability of the ingot “hot workability” was evaluated by hot rolling. That is, the ingot was cut into 45 × 45 × 25 mm, heated to 850 ° C. for 1 hour, and then subjected to a hot rolling test in three passes from a thickness of 25 mm to 5 mm. The case where cracks were visually observed on the surface and edge of the sample after hot rolling was defined as “cracked”, and the case where the surface and edge were not cracked and smooth was defined as “no crack”.
In the present invention, “excellent in hot workability” means “no crack” in the above evaluation.
About physical property evaluation "strength" of a test piece, it carried out using the No. 13 B test piece by the tensile test prescribed | regulated to JISZ2241, and measured the tensile strength.
In the present invention, high strength means that the tensile strength is 650 MPa or more in the above evaluation.
“Conductivity” was measured by measuring the electrical resistance of a test piece using a four-terminal method and expressed in% IACS.
In the present invention, high conductivity means that the conductivity is 45% IACS or more in the above evaluation.
“Bending workability” was evaluated by a 90 ° W bending test. The test was performed in accordance with CES-M0002-6, and bending was performed 90 degrees with a load of 50 kN using an R-0.1 mm jig. In the evaluation of the bent portion, the state of the surface of the central mountain was observed with an optical microscope. The bending axis was set at right angles to the rolling direction (Good way).

第2相粒子の評価
最終冷間圧延前の合金条を圧延方向に平行に厚み直角に切断し、走査型電子顕微鏡及び透過型電子顕微鏡を使用して、断面の第2相粒子を10視野観察した。第2相粒子の大きさが5〜50nmの場合は50万倍〜70万倍の視野(約1.4×1010〜2.0×1010nm2)、100〜2000nmの場合は5万倍〜10万倍の視野(約1.0×1013〜2.0×1013nm2)で撮影を行った。撮影した写真の画像を画像解析装置(株式会社ニレコ製、商品名ルーゼックス)を用いて長径aが5nm以上の第2相粒子のすべてについて個々に長径a、短径b、及び面積を測定した。これら第2相粒子からランダムに100個選び、全第2相粒子の長径の平均ataと短径の平均bta及びこれらから求めた平均のアスペクト比ata/btaを得て、それぞれ長径a、短径b及びアスペクト比a/bとした。長径aが5μm以上の全ての第2相粒子の面積の総和を全第2相粒子の総面積とした。その全第2相粒子の総面積に対して、長径aが10nm〜50nm、アスペクト比a/bが1〜5である第2相粒子の面積総和の割合を面積率C(%)とした。
尚、最終冷間圧延(通常は加工歪η=2以上)により、長径20nm以下の第2相粒子又は長径20nmを超えているがアスペクト比が3を超える第2相粒子は固溶してしまうが、20nm以上かつアスペクト比が1〜3の第2相粒子は最終冷間圧延後もその長径、短径及びアスペクト比を保つことを確認した。又、第2相粒子の面積率Cも、200nmを超える第2相粒子は固溶しないため最終冷間圧延後もほとんど変化しなかった。
Evaluation of Second Phase Particles The alloy strip before the final cold rolling is cut at a right angle to the thickness parallel to the rolling direction, and the second phase particles in the cross section are observed in 10 fields using a scanning electron microscope and a transmission electron microscope. did. When the size of the second phase particles is 5 to 50 nm, the field of view is about 500,000 to 700,000 times (approximately 1.4 × 10 10 to 2.0 × 10 10 nm 2 ), and when the size is 100 to 2000 nm, 50,000 Images were taken with a field of view of about 100,000 to 100,000 times (approximately 1.0 × 10 13 to 2.0 × 10 13 nm 2 ). Using the image of the photographed photograph, the major axis a, the minor axis b, and the area of each of the second phase particles having a major axis a of 5 nm or more were measured using an image analyzer (trade name Luzex, manufactured by Nireco Corporation). Randomly select 100 particles from these second phase particles to obtain the average major axis a ta and the minor axis average b ta of all the second phase particles and the average aspect ratio a ta / b ta determined from them. a, minor axis b, and aspect ratio a / b. The total area of all the second phase particles having a major axis “a” of 5 μm or more was defined as the total area of all the second phase particles. The ratio of the total area of the second phase particles having a major axis a of 10 nm to 50 nm and an aspect ratio a / b of 1 to 5 was defined as an area ratio C (%) with respect to the total area of all the second phase particles.
In addition, by the final cold rolling (usually processing strain η = 2 or more), the second phase particles having a major axis of 20 nm or less or the second phase particles having a major axis of more than 20 nm but an aspect ratio exceeding 3 are dissolved. However, it was confirmed that the second phase particles having an aspect ratio of 1 to 3 of 20 nm or more maintain their major axis, minor axis and aspect ratio even after the final cold rolling. Further, the area ratio C of the second phase particles hardly changed even after the final cold rolling because the second phase particles exceeding 200 nm were not dissolved.

本発明に係る熱間加工性に優れた高強度高導電性銅合金の実施例を、表1に示す成分組成の銅合金について、比較例とともに説明する。本発明の合金実施例1〜9は、熱間圧延時に割れが発生することなく、優れた強度及び導電率を具備していた。
一方、比較例10〜27までの結果を検討すると、比較例10〜13については、Bの添加がない又は規定量未満となっているために、熱間圧延で割れが生じた。比較例14は、SnとInの添加量の合計が1.0%を超えるため、比較例15は、Snの添加量の合計が1.0%を超えるため、導電率の低下が生じた。比較例16は、Ni/P比が高く外れるために、Niの固溶する量が増大して導電率の低下が生じ、第2相粒子の量が少ないため、強度も低い。比較例17は、Ni/P比が適切な組成比から低く外れるために、Pの固溶する量が増大して導電率の低下が生じた。比較例18は、Ni及びPの添加量が本発明の規定する範囲から低く外れるため、強度が低い。比較例19は、Ni量が、比較例20はP量が本発明の規定する範囲から高く外れるため、導電率の低下が生じた。比較例21は、Oの含有量が0.050%を超えるため、Cu−P−Oの酸化物が溶解時に生成し、第2相粒子量が減少し、強度が低く、曲げ加工性が劣る。比較例22は、Bの含有量が本発明の規定する範囲から高く外れるため、Ni−P−BやB−P等が溶解・鋳造時に生成、晶出したことにより、第2相粒子量が減少し、強度と導電率が低く、曲げ加工性も劣る。比較例23及び24は、Fe、Co、Mn、Ti及びZrの含有量が本発明の規定する範囲から高く外れるため、これらの元素とPが化合物を生成したことにより、第2相粒子量が減少し、強度が低い。比較例25は、第2相粒子の平均長径が本発明の規定する範囲から高く外れるため、冷間圧延による強度上昇が得られず、強度が低い。比較例26と27は、第2相粒子の平均長径が本発明の規定する範囲から低く外れ、比較例27はアスペクト比も外れたため、冷間圧延で第2相粒子が固溶し、導電率が低い。
Examples of the high-strength, high-conductivity copper alloy excellent in hot workability according to the present invention will be described with reference to the copper alloys having the component compositions shown in Table 1 together with comparative examples. Alloy Examples 1 to 9 of the present invention had excellent strength and electrical conductivity without cracking during hot rolling.
On the other hand, when the results up to Comparative Examples 10 to 27 were examined, in Comparative Examples 10 to 13 there was no addition of B or less than the specified amount, so cracking occurred during hot rolling. In Comparative Example 14, the total addition amount of Sn and In exceeded 1.0%, and in Comparative Example 15, the total addition amount of Sn exceeded 1.0%, resulting in a decrease in conductivity. In Comparative Example 16, since the Ni / P ratio deviates high, the amount of Ni dissolved increases and the conductivity decreases, and the amount of second phase particles is small, so the strength is low. In Comparative Example 17, since the Ni / P ratio deviated from an appropriate composition ratio, the amount of dissolved P increased and the conductivity decreased. Comparative Example 18 has low strength because the addition amounts of Ni and P deviate from the range defined by the present invention. In Comparative Example 19, the amount of Ni was different, and in Comparative Example 20, the amount of P was outside the range defined by the present invention, resulting in a decrease in conductivity. In Comparative Example 21, since the O content exceeds 0.050%, an oxide of Cu-PO is generated when dissolved, the amount of second phase particles is reduced, the strength is low, and the bending workability is inferior. . In Comparative Example 22, since the content of B deviates from the range defined by the present invention, Ni-P-B, BP, and the like are generated and crystallized during melting and casting, so that the amount of second phase particles is increased. Decrease, strength and conductivity are low, and bending workability is also poor. In Comparative Examples 23 and 24, since the contents of Fe, Co, Mn, Ti and Zr deviate from the range defined by the present invention, the amount of the second phase particles was reduced by the formation of compounds by these elements and P. Decrease and strength is low. In Comparative Example 25, since the average major axis of the second phase particles deviates from the range defined by the present invention, the strength increase due to cold rolling cannot be obtained, and the strength is low. In Comparative Examples 26 and 27, the average major axis of the second phase particles deviated from the range defined by the present invention, and in Comparative Example 27, the aspect ratio also deviated. Is low.

Figure 0004950734
Figure 0004950734

Claims (2)

質量割合にて、Ni:0.61%〜0.93%、P:0.15%〜0.19%を含有し、NiとPの含有量比率Ni/P:4.0〜5.5で且つ、B:0.021%〜0.041%、O:0.0012%〜0.0030%であり、Fe、Co、Mn、Ti、Zrのうち1種類以上の含有量が合計で0.05%以下で残部がCu及び不可避的不純物から成る銅合金において、第2相粒子の大きさについて、長径:a、短径:bとした時、a:20nm〜50nmで且つ第2相粒子のアスペクト比a/b:1〜5の第2相粒子が銅合金中に含まれる全第2相粒子の面積率で80%以上を占めることを特徴とする熱間加工性に優れた高強度高導電性銅合金。 In mass ratio, Ni: 0. 61 % to 0.93 %, P: 0.15 % to 0.19 %, Ni / P content ratio Ni / P: 4.0 to 5.5, and B: 0.021 % ~ 0.041 %, O: 0.0012% to 0.0030% , and the total content of one or more of Fe, Co, Mn, Ti and Zr is 0.05% or less with the balance being Cu and In the copper alloy composed of inevitable impurities, the size of the second phase particles is a: 20 nm to 50 nm when the major axis: a and minor axis: b, and the second phase particle aspect ratio a / b: 1 A high-strength, high-conductivity copper alloy excellent in hot workability, wherein the second phase particles 5 occupy 80% or more in the area ratio of all second-phase particles contained in the copper alloy. Sn及びInのうち1種以上を合計で0.21%〜0.5%含むことを特徴とする請求項1に記載された熱間加工性に優れた高強度高導電性銅合金。 The high-strength, high-conductivity copper alloy excellent in hot workability according to claim 1, comprising one or more of Sn and In in a total amount of 0.21 % to 0.5 %.
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CN101784684B (en) * 2007-09-27 2012-05-23 Jx日矿日石金属株式会社 High-strength high-electroconductivity copper alloy possessing excellent hot workability
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EP2386666B1 (en) * 2009-01-09 2015-06-10 Mitsubishi Shindoh Co., Ltd. High-strength high-conductivity copper alloy rolled sheet and method for producing same
KR20140010088A (en) * 2011-03-31 2014-01-23 고쿠리츠다이가쿠호진 도호쿠다이가쿠 Copper alloy and method for producing copper alloy
JP6493047B2 (en) * 2015-07-13 2019-04-03 日立金属株式会社 Copper alloy material and method for producing the same
CN105603253B (en) * 2016-01-15 2017-10-17 宁波博威合金材料股份有限公司 A kind of nickeliferous phosphorus, the Cu alloy material of nickel boron phase and its manufacture method
CN111575531B (en) * 2020-06-28 2021-01-05 杭州铜信科技有限公司 High-conductivity copper alloy plate and manufacturing method thereof
CN113106288A (en) * 2021-04-07 2021-07-13 太原晋西春雷铜业有限公司 Method for preparing KFC (KFC) special-shaped strip blank with excellent softening resistance
CN113862511B (en) * 2021-10-09 2022-07-12 浙江惟精新材料股份有限公司 Cu-Ni-Mn-P alloy and preparation method thereof
CN115852170A (en) * 2022-11-25 2023-03-28 西部超导材料科技股份有限公司 Smelting method of low-oxygen-content pure titanium ingot

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58104148A (en) * 1981-12-14 1983-06-21 Furukawa Electric Co Ltd:The Copper alloy for lead material of semiconductor apparatus
JPS596346A (en) * 1982-07-05 1984-01-13 Furukawa Electric Co Ltd:The Copper alloy for lead material of semiconductor instrument
JPH0219433A (en) * 1988-07-05 1990-01-23 Mitsubishi Electric Corp Copper alloy for electronic equipment
JPH0499838A (en) * 1990-08-14 1992-03-31 Nikko Kyodo Co Ltd Conductive material
JPH04231444A (en) * 1990-12-27 1992-08-20 Nikko Kyodo Co Ltd Production of electrifying material
JP3465108B2 (en) * 2000-05-25 2003-11-10 株式会社神戸製鋼所 Copper alloy for electric and electronic parts
JP4020881B2 (en) * 2004-04-13 2007-12-12 日鉱金属株式会社 Cu-Ni-Si-Mg copper alloy strip
JP4493083B2 (en) * 2004-12-01 2010-06-30 日鉱金属株式会社 High-performance copper alloy for electronic equipment with excellent strength and conductivity and method for producing the same
JP3871064B2 (en) * 2005-06-08 2007-01-24 株式会社神戸製鋼所 Copper alloy plate for electrical connection parts

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