JPH0419301B2 - - Google Patents

Info

Publication number
JPH0419301B2
JPH0419301B2 JP60294415A JP29441585A JPH0419301B2 JP H0419301 B2 JPH0419301 B2 JP H0419301B2 JP 60294415 A JP60294415 A JP 60294415A JP 29441585 A JP29441585 A JP 29441585A JP H0419301 B2 JPH0419301 B2 JP H0419301B2
Authority
JP
Japan
Prior art keywords
vacuum chamber
thin film
vacuum
film forming
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60294415A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62151562A (ja
Inventor
Yoshihiro Hoshiko
Yasunari Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP29441585A priority Critical patent/JPS62151562A/ja
Publication of JPS62151562A publication Critical patent/JPS62151562A/ja
Publication of JPH0419301B2 publication Critical patent/JPH0419301B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
JP29441585A 1985-12-26 1985-12-26 薄膜形成装置 Granted JPS62151562A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29441585A JPS62151562A (ja) 1985-12-26 1985-12-26 薄膜形成装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29441585A JPS62151562A (ja) 1985-12-26 1985-12-26 薄膜形成装置

Publications (2)

Publication Number Publication Date
JPS62151562A JPS62151562A (ja) 1987-07-06
JPH0419301B2 true JPH0419301B2 (enrdf_load_stackoverflow) 1992-03-30

Family

ID=17807455

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29441585A Granted JPS62151562A (ja) 1985-12-26 1985-12-26 薄膜形成装置

Country Status (1)

Country Link
JP (1) JPS62151562A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0841626A (ja) * 1994-07-28 1996-02-13 Vacuum Metallurgical Co Ltd 金属部分膜の形成装置およびその形成方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100257903B1 (ko) * 1997-12-30 2000-08-01 윤종용 인시튜 모니터링가능한 플라즈마 식각장치, 그 인시튜 모니터링방법, 플라즈마 식각챔버내의 잔류물 제거를 위한 인시튜 세정방법
JP4387573B2 (ja) 1999-10-26 2009-12-16 東京エレクトロン株式会社 プロセス排気ガスモニタ装置及び方法、半導体製造装置、及び半導体製造装置管理システム及び方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5246920A (en) * 1975-10-08 1977-04-14 Suwa Seikosha Kk Paper feeder
JPS5931550A (ja) * 1982-08-16 1984-02-20 Ulvac Corp プラズマエツチング中のラジカルおよび励起分子測定装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0841626A (ja) * 1994-07-28 1996-02-13 Vacuum Metallurgical Co Ltd 金属部分膜の形成装置およびその形成方法

Also Published As

Publication number Publication date
JPS62151562A (ja) 1987-07-06

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