JPH0419301B2 - - Google Patents
Info
- Publication number
- JPH0419301B2 JPH0419301B2 JP60294415A JP29441585A JPH0419301B2 JP H0419301 B2 JPH0419301 B2 JP H0419301B2 JP 60294415 A JP60294415 A JP 60294415A JP 29441585 A JP29441585 A JP 29441585A JP H0419301 B2 JPH0419301 B2 JP H0419301B2
- Authority
- JP
- Japan
- Prior art keywords
- vacuum chamber
- thin film
- vacuum
- film forming
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29441585A JPS62151562A (ja) | 1985-12-26 | 1985-12-26 | 薄膜形成装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29441585A JPS62151562A (ja) | 1985-12-26 | 1985-12-26 | 薄膜形成装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62151562A JPS62151562A (ja) | 1987-07-06 |
| JPH0419301B2 true JPH0419301B2 (enrdf_load_stackoverflow) | 1992-03-30 |
Family
ID=17807455
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29441585A Granted JPS62151562A (ja) | 1985-12-26 | 1985-12-26 | 薄膜形成装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62151562A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0841626A (ja) * | 1994-07-28 | 1996-02-13 | Vacuum Metallurgical Co Ltd | 金属部分膜の形成装置およびその形成方法 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100257903B1 (ko) * | 1997-12-30 | 2000-08-01 | 윤종용 | 인시튜 모니터링가능한 플라즈마 식각장치, 그 인시튜 모니터링방법, 플라즈마 식각챔버내의 잔류물 제거를 위한 인시튜 세정방법 |
| JP4387573B2 (ja) * | 1999-10-26 | 2009-12-16 | 東京エレクトロン株式会社 | プロセス排気ガスモニタ装置及び方法、半導体製造装置、及び半導体製造装置管理システム及び方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5246920A (en) * | 1975-10-08 | 1977-04-14 | Suwa Seikosha Kk | Paper feeder |
| JPS5931550A (ja) * | 1982-08-16 | 1984-02-20 | Ulvac Corp | プラズマエツチング中のラジカルおよび励起分子測定装置 |
-
1985
- 1985-12-26 JP JP29441585A patent/JPS62151562A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0841626A (ja) * | 1994-07-28 | 1996-02-13 | Vacuum Metallurgical Co Ltd | 金属部分膜の形成装置およびその形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62151562A (ja) | 1987-07-06 |
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