JPH0415832U - - Google Patents

Info

Publication number
JPH0415832U
JPH0415832U JP5695490U JP5695490U JPH0415832U JP H0415832 U JPH0415832 U JP H0415832U JP 5695490 U JP5695490 U JP 5695490U JP 5695490 U JP5695490 U JP 5695490U JP H0415832 U JPH0415832 U JP H0415832U
Authority
JP
Japan
Prior art keywords
connecting portion
electrode
substrate
plate
film forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5695490U
Other languages
English (en)
Other versions
JPH075628Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP5695490U priority Critical patent/JPH075628Y2/ja
Publication of JPH0415832U publication Critical patent/JPH0415832U/ja
Application granted granted Critical
Publication of JPH075628Y2 publication Critical patent/JPH075628Y2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【図面の簡単な説明】
第１図は本考案の一実施例によるプラズマＣＶ
Ｄ装置を示す第２図のＩ−Ｉ線一部切欠き断面図
、第２図は前記実施例装置の一部切欠き断面図、
第３図は従来装置の第１図に相当する図、第４図
はその−断面略図である。 ２０……チヤンバ、２１……導入部、２３……
ガス導入部、２４……ＲＦ導入部、４０……電極
ユニツト、５２……ガス導入板、５４……電極板
、５８……連結部、６０……基板。

Claims (1)

  1. 【実用新案登録請求の範囲】 電極板と基板との間でグロー放電を起こさせ基
    板上に薄膜を形成する真空成膜装置において、 ガス導入のためのガス導入板と前記電極板とを
    含む電極ユニツトと、 前記電極ユニツトの端部一部に設けられた連結
    部と、 前記連結部に係脱自在に設けられ、前記連結部
    に対してガス導入及び電圧印加を行う導入部と、
    を備えた真空成膜装置。
JP5695490U 1990-05-30 1990-05-30 真空成膜装置 Expired - Fee Related JPH075628Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5695490U JPH075628Y2 (ja) 1990-05-30 1990-05-30 真空成膜装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5695490U JPH075628Y2 (ja) 1990-05-30 1990-05-30 真空成膜装置

Publications (2)

Publication Number Publication Date
JPH0415832U true JPH0415832U (ja) 1992-02-07
JPH075628Y2 JPH075628Y2 (ja) 1995-02-08

Family

ID=31581239

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5695490U Expired - Fee Related JPH075628Y2 (ja) 1990-05-30 1990-05-30 真空成膜装置

Country Status (1)

Country Link
JP (1) JPH075628Y2 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004508682A (ja) * 2000-09-06 2004-03-18 アクセンタス　パブリック　リミテッド　カンパニー プラズマ助長ガス反応装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004508682A (ja) * 2000-09-06 2004-03-18 アクセンタス　パブリック　リミテッド　カンパニー プラズマ助長ガス反応装置

Also Published As

Publication number Publication date
JPH075628Y2 (ja) 1995-02-08

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees