JPH0415613B2 - - Google Patents

Info

Publication number
JPH0415613B2
JPH0415613B2 JP56069868A JP6986881A JPH0415613B2 JP H0415613 B2 JPH0415613 B2 JP H0415613B2 JP 56069868 A JP56069868 A JP 56069868A JP 6986881 A JP6986881 A JP 6986881A JP H0415613 B2 JPH0415613 B2 JP H0415613B2
Authority
JP
Japan
Prior art keywords
sample
plasma
processing chamber
plasma processing
transport mechanism
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56069868A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57184224A (en
Inventor
Hiroshi Yano
Hideki Myaji
Mikio Fujii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP6986881A priority Critical patent/JPS57184224A/ja
Publication of JPS57184224A publication Critical patent/JPS57184224A/ja
Publication of JPH0415613B2 publication Critical patent/JPH0415613B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
JP6986881A 1981-05-08 1981-05-08 Microwave plasma treating method and its device Granted JPS57184224A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6986881A JPS57184224A (en) 1981-05-08 1981-05-08 Microwave plasma treating method and its device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6986881A JPS57184224A (en) 1981-05-08 1981-05-08 Microwave plasma treating method and its device

Publications (2)

Publication Number Publication Date
JPS57184224A JPS57184224A (en) 1982-11-12
JPH0415613B2 true JPH0415613B2 (enrdf_load_stackoverflow) 1992-03-18

Family

ID=13415196

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6986881A Granted JPS57184224A (en) 1981-05-08 1981-05-08 Microwave plasma treating method and its device

Country Status (1)

Country Link
JP (1) JPS57184224A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59169135A (ja) * 1983-03-16 1984-09-25 Fujitsu Ltd 半導体装置の製造方法
JPS612320A (ja) * 1984-06-15 1986-01-08 Toshiba Corp 試料処理装置
JPH05129235A (ja) * 1991-10-31 1993-05-25 Yuichi Sakamoto Ｅｃｒ型プラズマ処理装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52126177A (en) * 1976-04-15 1977-10-22 Hitachi Ltd Etching device
JPS536239A (en) * 1976-07-08 1978-01-20 Nippon Electric Co Plasma etching method
JPS5341076A (en) * 1976-09-27 1978-04-14 Toshiba Corp Process for treating bulb wastes containing mercury
JPS5424580A (en) * 1977-07-27 1979-02-23 Toshiba Corp Etching method
JPS5449073A (en) * 1977-09-26 1979-04-18 Mitsubishi Electric Corp Plasma processing unit
JPS596137B2 (ja) * 1978-08-25 1984-02-09 リズム時計工業株式会社 モ−タコイル巻線方法及び装置

Also Published As

Publication number Publication date
JPS57184224A (en) 1982-11-12

Similar Documents

Publication Publication Date Title
JP3485896B2 (ja) プラズマ処理装置
KR100960424B1 (ko) 마이크로파 플라즈마 처리 장치
KR100388584B1 (ko) 플라즈마 처리방법 및 플라즈마 처리실의 클리닝 방법
JP4504511B2 (ja) プラズマ処理装置
KR20020043446A (ko) 플라즈마 프로세스 장치
KR20170141117A (ko) 질화 규소막의 처리 방법 및 질화 규소막의 형성 방법
TW200810613A (en) Plasma treatment device, and plasma treatment method
JP3153768B2 (ja) プラズマ処理装置
USRE36224E (en) Microwave plasma processing process and apparatus
JP2003168681A (ja) マイクロ波プラズマ処理装置および処理方法
JPH0415613B2 (enrdf_load_stackoverflow)
US6189481B1 (en) Microwave plasma processing apparatus
JPH03191074A (ja) マイクロ波プラズマ処理装置
KR100782623B1 (ko) 플라즈마 처리 장치 및 유전체 부재
JPH11111620A (ja) プラズマ処理装置およびスパッタ装置
JPH02106925A (ja) ドライエッチング装置
JP3761474B2 (ja) プラズマ処理装置
JP3193575B2 (ja) マイクロ波プラズマ処理装置
KR100263902B1 (ko) 표면 파 플라즈마 식각장치
JP2001167900A (ja) プラズマ処理装置
JPS6360529A (ja) プラズマ処理方法
JP2001326216A (ja) プラズマ処理装置
JP3042347B2 (ja) プラズマ装置
JPH05251394A (ja) 半導体製造装置
JP3796265B2 (ja) プラズマ処理方法、プラズマ処理装置、半導体装置の製造方法及びマイクロ波分散板