JPH0413686B2 - - Google Patents

Info

Publication number
JPH0413686B2
JPH0413686B2 JP60108438A JP10843885A JPH0413686B2 JP H0413686 B2 JPH0413686 B2 JP H0413686B2 JP 60108438 A JP60108438 A JP 60108438A JP 10843885 A JP10843885 A JP 10843885A JP H0413686 B2 JPH0413686 B2 JP H0413686B2
Authority
JP
Japan
Prior art keywords
illuminance distribution
lens
lenses
illuminance
light source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60108438A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61267722A (ja
Inventor
Kazuhiro Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60108438A priority Critical patent/JPS61267722A/ja
Publication of JPS61267722A publication Critical patent/JPS61267722A/ja
Priority to US07/326,439 priority patent/US4947030A/en
Publication of JPH0413686B2 publication Critical patent/JPH0413686B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microscoopes, Condenser (AREA)
  • Projection-Type Copiers In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60108438A 1985-05-22 1985-05-22 照明光学装置 Granted JPS61267722A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60108438A JPS61267722A (ja) 1985-05-22 1985-05-22 照明光学装置
US07/326,439 US4947030A (en) 1985-05-22 1989-03-22 Illuminating optical device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60108438A JPS61267722A (ja) 1985-05-22 1985-05-22 照明光学装置

Publications (2)

Publication Number Publication Date
JPS61267722A JPS61267722A (ja) 1986-11-27
JPH0413686B2 true JPH0413686B2 (enrdf_load_html_response) 1992-03-10

Family

ID=14484772

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60108438A Granted JPS61267722A (ja) 1985-05-22 1985-05-22 照明光学装置

Country Status (1)

Country Link
JP (1) JPS61267722A (enrdf_load_html_response)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4851882A (en) * 1985-12-06 1989-07-25 Canon Kabushiki Kaisha Illumination optical system
JPH0734056B2 (ja) * 1987-07-17 1995-04-12 大日本スクリ−ン製造株式会社 照明用レンズ
JPS6461716A (en) * 1987-08-31 1989-03-08 Canon Kk Illuminator
JP4765314B2 (ja) * 2004-12-27 2011-09-07 株式会社ニコン 照明光学装置

Also Published As

Publication number Publication date
JPS61267722A (ja) 1986-11-27

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term