JPH0395633U - - Google Patents
Info
- Publication number
- JPH0395633U JPH0395633U JP93890U JP93890U JPH0395633U JP H0395633 U JPH0395633 U JP H0395633U JP 93890 U JP93890 U JP 93890U JP 93890 U JP93890 U JP 93890U JP H0395633 U JPH0395633 U JP H0395633U
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor substrates
- cleaning
- rotor
- drying
- drying apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims description 10
- 238000004140 cleaning Methods 0.000 claims description 7
- 238000001035 drying Methods 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims 5
- 238000010586 diagram Methods 0.000 description 1
Description
第１図は本考案の実施例を示す半導体ウエハの
洗浄乾燥装置の断面図、第２図はその半導体ウエ
ハの洗浄乾燥装置の内部平面図、第３図は従来の
半導体ウエハの洗浄乾燥装置の断面図、第４図は
その半導体ウエハの洗浄乾燥装置の内部平面図で
ある。
１１，１５……円筒形容器、１２……ウエハ収
納用カセツト、１３……半導体ウエハ、１４……
ロータ、１６，１７……蓋、１８……モータ、１
９……回転軸。
FIG. 1 is a sectional view of a semiconductor wafer cleaning and drying apparatus showing an embodiment of the present invention, FIG. 2 is an internal plan view of the semiconductor wafer cleaning and drying apparatus, and FIG. 3 is a diagram of a conventional semiconductor wafer cleaning and drying apparatus. The sectional view and FIG. 4 are internal plan views of the semiconductor wafer cleaning and drying apparatus. 11, 15...Cylindrical container, 12...Wafer storage cassette, 13...Semiconductor wafer, 14...
Rotor, 16, 17...Lid, 18...Motor, 1
9...Rotation axis.
Claims (1)
体用基板の洗浄乾燥装置において、 (a) 半導体用基板を収納したカセツトを固定す
るロータと、 (b) 該ロータに設けられる蓋付きの容器とを具
備することを特徴とする半導体用基板の洗浄乾燥
装置。[Scope of Claim for Utility Model Registration] A cleaning and drying device for semiconductor substrates that dries cleaned semiconductor substrates, which includes: (a) a rotor for fixing a cassette containing semiconductor substrates; and (b) a rotor provided on the rotor. 1. A cleaning and drying apparatus for semiconductor substrates, comprising: a container with a lid for cleaning and drying semiconductor substrates;
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP93890U JPH0395633U (en) | 1990-01-11 | 1990-01-11 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP93890U JPH0395633U (en) | 1990-01-11 | 1990-01-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0395633U true JPH0395633U (en) | 1991-09-30 |
Family
ID=31504872
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP93890U Pending JPH0395633U (en) | 1990-01-11 | 1990-01-11 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0395633U (en) |
-
1990
- 1990-01-11 JP JP93890U patent/JPH0395633U/ja active Pending
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