JPH02132934U - - Google Patents
Info
- Publication number
- JPH02132934U JPH02132934U JP4341089U JP4341089U JPH02132934U JP H02132934 U JPH02132934 U JP H02132934U JP 4341089 U JP4341089 U JP 4341089U JP 4341089 U JP4341089 U JP 4341089U JP H02132934 U JPH02132934 U JP H02132934U
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor wafer
- photoresist
- semi
- developer
- developing device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920002120 photoresistant polymer Polymers 0.000 claims description 6
- 239000004065 semiconductor Substances 0.000 claims description 4
- 238000000059 patterning Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
Description
第１図は本考案の一実施例の構成を示す側面図
、第２図は本考案の一実施例により形成されたフ
オトレジストのパターニング形状を示す部分断面
図、第３図は従来の装置を用いた現像時における
フオトレジストのパターニング形状を示す部分断
面図である。
１……現像液供給バルブ、２……ウエハーチヤ
ツク、３……回転モータ、４……現像液、５……
半導体ウエハー、６……フオトレジスト、７……
フオトレジスト部分、８……現像液の流れ方向。
FIG. 1 is a side view showing the configuration of an embodiment of the present invention, FIG. 2 is a partial cross-sectional view showing the patterning shape of a photoresist formed by an embodiment of the present invention, and FIG. 3 is a diagram showing a conventional apparatus. FIG. 3 is a partial cross-sectional view showing the patterning shape of the photoresist used during development. 1... Developer supply valve, 2... Wafer chuck, 3... Rotating motor, 4... Developer, 5...
Semiconductor wafer, 6... Photoresist, 7...
Photoresist part, 8... Flow direction of developer.
Claims (1)
像液を滴下させこの現像液を保持したまま半導体
ウエハーを回転させてフオトレジストの現像を行
うセミデイツプ現像装置において、前記半導体ウ
エハーの回転を途中で反転可能とする手段を備え
たことを特徴とするセミデイツプ現像装置。 In a semi-deep developing device that develops a photoresist by dropping a developer onto a semiconductor wafer during a photoresist process and rotating the semiconductor wafer while holding the developer, the rotation of the semiconductor wafer can be reversed midway. A semi-deep developing device characterized by comprising means.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4341089U JPH02132934U (en) | 1989-04-12 | 1989-04-12 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4341089U JPH02132934U (en) | 1989-04-12 | 1989-04-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02132934U true JPH02132934U (en) | 1990-11-05 |
Family
ID=31555801
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4341089U Pending JPH02132934U (en) | 1989-04-12 | 1989-04-12 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02132934U (en) |
-
1989
- 1989-04-12 JP JP4341089U patent/JPH02132934U/ja active Pending