JPH038581B2 - - Google Patents
Info
- Publication number
- JPH038581B2 JPH038581B2 JP57023880A JP2388082A JPH038581B2 JP H038581 B2 JPH038581 B2 JP H038581B2 JP 57023880 A JP57023880 A JP 57023880A JP 2388082 A JP2388082 A JP 2388082A JP H038581 B2 JPH038581 B2 JP H038581B2
- Authority
- JP
- Japan
- Prior art keywords
- polyimide
- silicon nitride
- nitride film
- electrode
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Local Oxidation Of Silicon (AREA)
- Drying Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57023880A JPS58140139A (ja) | 1982-02-16 | 1982-02-16 | 半導体装置およびその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57023880A JPS58140139A (ja) | 1982-02-16 | 1982-02-16 | 半導体装置およびその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58140139A JPS58140139A (ja) | 1983-08-19 |
| JPH038581B2 true JPH038581B2 (https=) | 1991-02-06 |
Family
ID=12122760
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57023880A Granted JPS58140139A (ja) | 1982-02-16 | 1982-02-16 | 半導体装置およびその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58140139A (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60165739A (ja) * | 1984-02-07 | 1985-08-28 | Nec Kansai Ltd | 半導体装置の製造方法 |
| JPS63104425A (ja) * | 1986-10-09 | 1988-05-09 | インタ−ナショナル・ビジネス・マシ−ンズ・コ−ポレ−ション | バイアの形成方法 |
| JPH02235359A (ja) * | 1989-03-09 | 1990-09-18 | Oki Electric Ind Co Ltd | 多層配線形成方法 |
| JPH02238627A (ja) * | 1989-03-10 | 1990-09-20 | Nec Corp | 半導体装置 |
| US9515135B2 (en) | 2003-01-15 | 2016-12-06 | Cree, Inc. | Edge termination structures for silicon carbide devices |
| US7026650B2 (en) | 2003-01-15 | 2006-04-11 | Cree, Inc. | Multiple floating guard ring edge termination for silicon carbide devices |
-
1982
- 1982-02-16 JP JP57023880A patent/JPS58140139A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58140139A (ja) | 1983-08-19 |
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