JPH0377656B2 - - Google Patents

Info

Publication number
JPH0377656B2
JPH0377656B2 JP58138564A JP13856483A JPH0377656B2 JP H0377656 B2 JPH0377656 B2 JP H0377656B2 JP 58138564 A JP58138564 A JP 58138564A JP 13856483 A JP13856483 A JP 13856483A JP H0377656 B2 JPH0377656 B2 JP H0377656B2
Authority
JP
Japan
Prior art keywords
electrode
grid
grid electrode
electrodes
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58138564A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6030123A (ja
Inventor
Osamu Nabeta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Corporate Research and Development Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Corporate Research and Development Ltd filed Critical Fuji Electric Corporate Research and Development Ltd
Priority to JP58138564A priority Critical patent/JPS6030123A/ja
Publication of JPS6030123A publication Critical patent/JPS6030123A/ja
Publication of JPH0377656B2 publication Critical patent/JPH0377656B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02524—Group 14 semiconducting materials
    • H01L21/02532—Silicon, silicon germanium, germanium
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/548—Amorphous silicon PV cells

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Light Receiving Elements (AREA)
  • Photovoltaic Devices (AREA)
JP58138564A 1983-07-28 1983-07-28 薄膜半導体生成装置 Granted JPS6030123A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58138564A JPS6030123A (ja) 1983-07-28 1983-07-28 薄膜半導体生成装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58138564A JPS6030123A (ja) 1983-07-28 1983-07-28 薄膜半導体生成装置

Publications (2)

Publication Number Publication Date
JPS6030123A JPS6030123A (ja) 1985-02-15
JPH0377656B2 true JPH0377656B2 (cs) 1991-12-11

Family

ID=15225086

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58138564A Granted JPS6030123A (ja) 1983-07-28 1983-07-28 薄膜半導体生成装置

Country Status (1)

Country Link
JP (1) JPS6030123A (cs)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63246814A (ja) * 1987-04-02 1988-10-13 Matsushita Electric Ind Co Ltd 薄膜形成装置
JP5965289B2 (ja) * 2012-10-25 2016-08-03 東レエンジニアリング株式会社 リモートプラズマｃｖｄ装置

Also Published As

Publication number Publication date
JPS6030123A (ja) 1985-02-15

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