JPH03765B2 - - Google Patents

Info

Publication number
JPH03765B2
JPH03765B2 JP57194111A JP19411182A JPH03765B2 JP H03765 B2 JPH03765 B2 JP H03765B2 JP 57194111 A JP57194111 A JP 57194111A JP 19411182 A JP19411182 A JP 19411182A JP H03765 B2 JPH03765 B2 JP H03765B2
Authority
JP
Japan
Prior art keywords
resist
radiation
pattern
layer
sensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57194111A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5984427A (ja
Inventor
Masaru Sasako
Kazuhiko Tsuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP57194111A priority Critical patent/JPS5984427A/ja
Publication of JPS5984427A publication Critical patent/JPS5984427A/ja
Publication of JPH03765B2 publication Critical patent/JPH03765B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP57194111A 1982-11-04 1982-11-04 パタ−ン形成方法 Granted JPS5984427A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57194111A JPS5984427A (ja) 1982-11-04 1982-11-04 パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57194111A JPS5984427A (ja) 1982-11-04 1982-11-04 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS5984427A JPS5984427A (ja) 1984-05-16
JPH03765B2 true JPH03765B2 (Sortimente) 1991-01-08

Family

ID=16319099

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57194111A Granted JPS5984427A (ja) 1982-11-04 1982-11-04 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS5984427A (Sortimente)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH079875B2 (ja) * 1985-09-19 1995-02-01 沖電気工業株式会社 半導体装置の製造方法
GB2442030A (en) * 2006-09-19 2008-03-26 Innos Ltd Resist exposure and patterning process

Also Published As

Publication number Publication date
JPS5984427A (ja) 1984-05-16

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