JPH0363806B2 - - Google Patents

Info

Publication number
JPH0363806B2
JPH0363806B2 JP58245227A JP24522783A JPH0363806B2 JP H0363806 B2 JPH0363806 B2 JP H0363806B2 JP 58245227 A JP58245227 A JP 58245227A JP 24522783 A JP24522783 A JP 24522783A JP H0363806 B2 JPH0363806 B2 JP H0363806B2
Authority
JP
Japan
Prior art keywords
side electrode
temperature
high frequency
frequency application
cooling water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58245227A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60140723A (ja
Inventor
Jun Kanamori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP24522783A priority Critical patent/JPS60140723A/ja
Publication of JPS60140723A publication Critical patent/JPS60140723A/ja
Publication of JPH0363806B2 publication Critical patent/JPH0363806B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP24522783A 1983-12-28 1983-12-28 ドライエッチング方法 Granted JPS60140723A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24522783A JPS60140723A (ja) 1983-12-28 1983-12-28 ドライエッチング方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24522783A JPS60140723A (ja) 1983-12-28 1983-12-28 ドライエッチング方法

Publications (2)

Publication Number Publication Date
JPS60140723A JPS60140723A (ja) 1985-07-25
JPH0363806B2 true JPH0363806B2 (enrdf_load_stackoverflow) 1991-10-02

Family

ID=17130537

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24522783A Granted JPS60140723A (ja) 1983-12-28 1983-12-28 ドライエッチング方法

Country Status (1)

Country Link
JP (1) JPS60140723A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6163030A (ja) * 1984-08-20 1986-04-01 Kokusai Electric Co Ltd プラズマエッチング装置の電極温度制御方法
JPH0834204B2 (ja) * 1986-07-02 1996-03-29 ソニー株式会社 ドライエツチング方法
JPS63284820A (ja) * 1987-05-15 1988-11-22 Fujitsu Ltd ドライエッチング装置
JPH04180222A (ja) * 1990-11-15 1992-06-26 Anelva Corp エッチング方法および装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS597212B2 (ja) * 1977-09-05 1984-02-17 富士通株式会社 プラズマ・エッチング方法
JPS5853833A (ja) * 1981-09-26 1983-03-30 Toshiba Corp プラズマエツチング装置
JPS58153332A (ja) * 1982-03-08 1983-09-12 Mitsubishi Electric Corp ドライエツチング装置

Also Published As

Publication number Publication date
JPS60140723A (ja) 1985-07-25

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term