JPH03626B2 - - Google Patents
Info
- Publication number
- JPH03626B2 JPH03626B2 JP57015877A JP1587782A JPH03626B2 JP H03626 B2 JPH03626 B2 JP H03626B2 JP 57015877 A JP57015877 A JP 57015877A JP 1587782 A JP1587782 A JP 1587782A JP H03626 B2 JPH03626 B2 JP H03626B2
- Authority
- JP
- Japan
- Prior art keywords
- amorphous silicon
- path
- substrate
- film forming
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H10P72/0448—
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
- G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Photoreceptors In Electrophotography (AREA)
- Chemical Vapour Deposition (AREA)
- Light Receiving Elements (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57015877A JPS58132756A (ja) | 1982-02-03 | 1982-02-03 | アモルフアス・シリコン感光体製造方法とその製造装置 |
| US06/457,231 US4501766A (en) | 1982-02-03 | 1983-01-11 | Film depositing apparatus and a film depositing method |
| GB08300948A GB2114160B (en) | 1982-02-03 | 1983-01-14 | Film depositing apparatus and method |
| DE3303435A DE3303435C2 (de) | 1982-02-03 | 1983-02-02 | Vorrichtung zur Abscheidung einer Schicht aus amorphem Silizium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57015877A JPS58132756A (ja) | 1982-02-03 | 1982-02-03 | アモルフアス・シリコン感光体製造方法とその製造装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58132756A JPS58132756A (ja) | 1983-08-08 |
| JPH03626B2 true JPH03626B2 (member.php) | 1991-01-08 |
Family
ID=11901016
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57015877A Granted JPS58132756A (ja) | 1982-02-03 | 1982-02-03 | アモルフアス・シリコン感光体製造方法とその製造装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58132756A (member.php) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6010618A (ja) * | 1983-06-30 | 1985-01-19 | Canon Inc | プラズマcvd装置 |
| ATE45392T1 (de) * | 1984-02-14 | 1989-08-15 | Energy Conversion Devices Inc | Verfahren und vorrichtung zur herstellung elektrophotographischer geraete. |
-
1982
- 1982-02-03 JP JP57015877A patent/JPS58132756A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58132756A (ja) | 1983-08-08 |
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