JPH0362010B2 - - Google Patents
Info
- Publication number
- JPH0362010B2 JPH0362010B2 JP3533284A JP3533284A JPH0362010B2 JP H0362010 B2 JPH0362010 B2 JP H0362010B2 JP 3533284 A JP3533284 A JP 3533284A JP 3533284 A JP3533284 A JP 3533284A JP H0362010 B2 JPH0362010 B2 JP H0362010B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- pattern
- area
- alignment marks
- alignment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 42
- 238000000034 method Methods 0.000 claims description 16
- 239000000470 constituent Substances 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 230000000295 complement effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59035332A JPS60180120A (ja) | 1984-02-28 | 1984-02-28 | アライメント方法 |
| US07/186,773 US4883359A (en) | 1984-02-28 | 1988-04-25 | Alignment method and pattern forming method using the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59035332A JPS60180120A (ja) | 1984-02-28 | 1984-02-28 | アライメント方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60180120A JPS60180120A (ja) | 1985-09-13 |
| JPH0362010B2 true JPH0362010B2 (fr) | 1991-09-24 |
Family
ID=12438874
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59035332A Granted JPS60180120A (ja) | 1984-02-28 | 1984-02-28 | アライメント方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60180120A (fr) |
-
1984
- 1984-02-28 JP JP59035332A patent/JPS60180120A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60180120A (ja) | 1985-09-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4883359A (en) | Alignment method and pattern forming method using the same | |
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| JPH0362010B2 (fr) | ||
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| JPH0144009B2 (fr) | ||
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| JPH06273947A (ja) | 露光装置及び露光工程におけるアライメント方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |