JPH0361901A - λ／４シフト回折格子の製造方法 - Google Patents

λ／４シフト回折格子の製造方法

Info

Publication number
JPH0361901A
JPH0361901A JP1197803A JP19780389A JPH0361901A JP H0361901 A JPH0361901 A JP H0361901A JP 1197803 A JP1197803 A JP 1197803A JP 19780389 A JP19780389 A JP 19780389A JP H0361901 A JPH0361901 A JP H0361901A
Authority
JP
Japan
Prior art keywords
resist
pattern
substrate
reversal
diffraction grating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1197803A
Other languages
English (en)
Japanese (ja)
Inventor
Masatoshi Fujiwara
正敏 藤原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP1197803A priority Critical patent/JPH0361901A/ja
Priority to GB9006051A priority patent/GB2234364B/en
Priority to DE19904020319 priority patent/DE4020319A1/de
Publication of JPH0361901A publication Critical patent/JPH0361901A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP1197803A 1989-07-28 1989-07-28 λ／４シフト回折格子の製造方法 Pending JPH0361901A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP1197803A JPH0361901A (ja) 1989-07-28 1989-07-28 λ／４シフト回折格子の製造方法
GB9006051A GB2234364B (en) 1989-07-28 1990-03-16 Method of producing lambda/4-shifted diffraction grating
DE19904020319 DE4020319A1 (de) 1989-07-28 1990-06-26 Verfahren zur herstellung eines um (lambda)/4-phasenverschobenen beugungsgitters

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1197803A JPH0361901A (ja) 1989-07-28 1989-07-28 λ／４シフト回折格子の製造方法

Publications (1)

Publication Number Publication Date
JPH0361901A true JPH0361901A (ja) 1991-03-18

Family

ID=16380610

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1197803A Pending JPH0361901A (ja) 1989-07-28 1989-07-28 λ／４シフト回折格子の製造方法

Country Status (3)

Country Link
JP (1) JPH0361901A (enrdf_load_stackoverflow)
DE (1) DE4020319A1 (enrdf_load_stackoverflow)
GB (1) GB2234364B (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5551584A (en) * 1994-06-21 1996-09-03 Mitsubishi Denki Kabushiki Kaisha Method of producing lambda/4-shifted diffraction grating

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4322163A1 (de) * 1993-07-03 1995-01-12 Ant Nachrichtentech Auf DFB- oder DBR-Gitter basierendes optoelektronisches Bauelement mit quasi-kontinuierlich axial verteilbarer Brechungsindex-Variation, mit axial beliebig verteilbarer und variierbarer Phasenverschiebung, sowie mit axial quasi-kontinuierlich variierbarem Gitter-Kopplungskoeffizienten
DE4322164A1 (de) * 1993-07-03 1995-01-12 Ant Nachrichtentech Optoelektronisches Bauelement mit Rückkopplungsgitter, mit axial quasi-kontinuierlich und nahezu beliebig variierbarem Gitterkopplungs-Koeffizienten, mit quasi-kontinuierlich axial verteilbarer Brechungsindex-Variation, sowie mit axial nahezu beliebig verteilbarer und variierbarer Phasenverschiebung

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2855723C2 (de) * 1978-12-22 1985-11-28 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zum Herstellen eines Negativmusters einer Vorlage aus einem Positivlack
US4826291A (en) * 1985-07-16 1989-05-02 Kokusai Denshin Denwa Kabushiki Kaisha Method for manufacturing diffraction grating
DE3842489A1 (de) * 1988-12-16 1990-06-21 Siemens Ag Verfahren zur herstellung von gitterstrukturen mit um eine halbe gitterperiode gegeneinander versetzten abschnitten

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5551584A (en) * 1994-06-21 1996-09-03 Mitsubishi Denki Kabushiki Kaisha Method of producing lambda/4-shifted diffraction grating

Also Published As

Publication number Publication date
GB2234364B (en) 1993-03-31
GB9006051D0 (en) 1990-05-09
DE4020319C2 (enrdf_load_stackoverflow) 1992-07-02
GB2234364A (en) 1991-01-30
DE4020319A1 (de) 1991-02-07

Similar Documents

Publication Publication Date Title
US4885231A (en) Phase-shifted gratings by selective image reversal of photoresist
JPH0690504B2 (ja) ホトマスクの製造方法
JP3002961B2 (ja) 位相反転マスク及びその製造方法
JPH0361901A (ja) λ／４シフト回折格子の製造方法
US5236811A (en) Method of producing a λ/4-shifted diffraction grating
KR0137737B1 (ko) 반도체소자의 제조방법
JPH085812A (ja) λ／４シフト回折格子の製造方法
JPH0323884B2 (enrdf_load_stackoverflow)
JPH043485A (ja) λ／４シフト回折格子の製造方法
JP2730893B2 (ja) 回折格子製造方法
KR100213226B1 (ko) 마스크 및 이의 제조방법
JPS627001A (ja) 回折格子の製造方法
JPS61138202A (ja) 回折格子の製造方法
KR960000183B1 (ko) 크롬막이 부가된 위상반전마스크 및 그 제조 방법
KR100190115B1 (ko) 위상 시프트 마스크 및 그 제조방법
KR0152925B1 (ko) 부분 투과성을 갖는 하프톤 위상반전마스크 제조방법
JPH052201B2 (enrdf_load_stackoverflow)
JPH02193103A (ja) 回折格子の製造方法
JPS61292923A (ja) 位相反転型パタンの形成方法
JPH03216602A (ja) 回折格子の形成方法
JPS60196701A (ja) 回折格子の製造方法
JPS6370477A (ja) 位相シフト型回折格子の製造方法
KR960000185B1 (ko) 자동 배치형 위상반전마스크 제조 방법
JPS6370476A (ja) 位相シフト型回折格子の製造方法
JPH04333001A (ja) λ／４位相シフト回折格子の形成方法