GB2234364B - Method of producing lambda/4-shifted diffraction grating - Google Patents

Method of producing lambda/4-shifted diffraction grating

Info

Publication number
GB2234364B
GB2234364B GB9006051A GB9006051A GB2234364B GB 2234364 B GB2234364 B GB 2234364B GB 9006051 A GB9006051 A GB 9006051A GB 9006051 A GB9006051 A GB 9006051A GB 2234364 B GB2234364 B GB 2234364B
Authority
GB
United Kingdom
Prior art keywords
diffraction grating
shifted diffraction
lambda
producing
producing lambda
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB9006051A
Other languages
English (en)
Other versions
GB9006051D0 (en
GB2234364A (en
Inventor
Masatoshi Fujiwara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Publication of GB9006051D0 publication Critical patent/GB9006051D0/en
Publication of GB2234364A publication Critical patent/GB2234364A/en
Application granted granted Critical
Publication of GB2234364B publication Critical patent/GB2234364B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1847Manufacturing methods
    • G02B5/1857Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001Phase modulating patterns, e.g. refractive index patterns

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
GB9006051A 1989-07-28 1990-03-16 Method of producing lambda/4-shifted diffraction grating Expired - Fee Related GB2234364B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1197803A JPH0361901A (ja) 1989-07-28 1989-07-28 λ/4シフト回折格子の製造方法

Publications (3)

Publication Number Publication Date
GB9006051D0 GB9006051D0 (en) 1990-05-09
GB2234364A GB2234364A (en) 1991-01-30
GB2234364B true GB2234364B (en) 1993-03-31

Family

ID=16380610

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9006051A Expired - Fee Related GB2234364B (en) 1989-07-28 1990-03-16 Method of producing lambda/4-shifted diffraction grating

Country Status (3)

Country Link
JP (1) JPH0361901A (enrdf_load_stackoverflow)
DE (1) DE4020319A1 (enrdf_load_stackoverflow)
GB (1) GB2234364B (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4322163A1 (de) * 1993-07-03 1995-01-12 Ant Nachrichtentech Auf DFB- oder DBR-Gitter basierendes optoelektronisches Bauelement mit quasi-kontinuierlich axial verteilbarer Brechungsindex-Variation, mit axial beliebig verteilbarer und variierbarer Phasenverschiebung, sowie mit axial quasi-kontinuierlich variierbarem Gitter-Kopplungskoeffizienten
DE4322164A1 (de) * 1993-07-03 1995-01-12 Ant Nachrichtentech Optoelektronisches Bauelement mit Rückkopplungsgitter, mit axial quasi-kontinuierlich und nahezu beliebig variierbarem Gitterkopplungs-Koeffizienten, mit quasi-kontinuierlich axial verteilbarer Brechungsindex-Variation, sowie mit axial nahezu beliebig verteilbarer und variierbarer Phasenverschiebung
JP3366441B2 (ja) * 1994-06-21 2003-01-14 三菱電機株式会社 λ/4シフト回折格子の製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2178192A (en) * 1985-07-16 1987-02-04 Kokusai Denshin Denwa Co Ltd Method for manufacturing diffraction gratings

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2855723C2 (de) * 1978-12-22 1985-11-28 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zum Herstellen eines Negativmusters einer Vorlage aus einem Positivlack
DE3842489A1 (de) * 1988-12-16 1990-06-21 Siemens Ag Verfahren zur herstellung von gitterstrukturen mit um eine halbe gitterperiode gegeneinander versetzten abschnitten

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2178192A (en) * 1985-07-16 1987-02-04 Kokusai Denshin Denwa Co Ltd Method for manufacturing diffraction gratings

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Electronics letters, Nov 1984, Vol 20, No 24, pp 1008-9, K Utake et al. *

Also Published As

Publication number Publication date
GB9006051D0 (en) 1990-05-09
DE4020319C2 (enrdf_load_stackoverflow) 1992-07-02
GB2234364A (en) 1991-01-30
DE4020319A1 (de) 1991-02-07
JPH0361901A (ja) 1991-03-18

Similar Documents

Publication Publication Date Title
DE3570765D1 (en) A method for the formation of a diffraction grating
HUT51674A (en) Process for producing transgenic plants
EP0323238A3 (en) Diffraction grating and manufacturing method thereof
HUT57265A (en) Process for producing plants of diminished infection-sensitivity
IL88482A (en) Method for fabrication of low efficiency diffraction gratings and product obtained thereby
GB8801736D0 (en) Method of making patterns
HUT54409A (en) Process for producing new somatotropin-analogues
CS567989A2 (en) Method of substituted 1,3,5-triazintriones production
HUT52103A (en) Process for producing n-acylaminomethyl phosphonates
GB2178192B (en) Method for manufacturing diffraction grating
GB2234364B (en) Method of producing lambda/4-shifted diffraction grating
EP0424547A4 (en) Method of producing ferrocenoyl derivative
EP0365757A3 (en) Method of producing cams from a casting material
EP0428390A3 (en) Manufacturing method of optical diffraction grating element
EP0435149A3 (en) Method of producing 3-dibutyl-amino-6-methyl-7-anilinofluoran
GB2220946B (en) Method of producing free epsilon-polylysine
RO102743B1 (en) Sodium-bichromate producing method
EP0424545A4 (en) Method of producing sake
AU2354797A (en) Diffraction grating and method of manufacture
CS521588A1 (en) Method of dl-phenylglycine production
SU1592281A1 (ru) Cпocoб пoлучehия гипcoboгo bяжущeгo из фocфoгипca
GB8810323D0 (en) Process for production of potentiometer
GB9003595D0 (en) Method of producing holographic recordings
RO103685B1 (en) Production method of stabilized alexin
PL251003A1 (en) Method of producing decorative patterns on walls

Legal Events

Date Code Title Description
746 Register noted 'licences of right' (sect. 46/1977)

Effective date: 19951107

PCNP Patent ceased through non-payment of renewal fee

Effective date: 20050316