JPH0360798B2 - - Google Patents
Info
- Publication number
- JPH0360798B2 JPH0360798B2 JP58005182A JP518283A JPH0360798B2 JP H0360798 B2 JPH0360798 B2 JP H0360798B2 JP 58005182 A JP58005182 A JP 58005182A JP 518283 A JP518283 A JP 518283A JP H0360798 B2 JPH0360798 B2 JP H0360798B2
- Authority
- JP
- Japan
- Prior art keywords
- crystal
- heater member
- crucible
- magnetic field
- heater
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/14—Heating of the melt or the crystallised materials
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP518283A JPS59131593A (ja) | 1983-01-18 | 1983-01-18 | 化合物半導体単結晶の製造装置 |
US06/571,194 US4606037A (en) | 1983-01-18 | 1984-01-16 | Apparatus for manufacturing semiconductor single crystal |
GB08401195A GB2136310B (en) | 1983-01-18 | 1984-01-17 | Apparatus for manufacturing semiconductor single crystal |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP518283A JPS59131593A (ja) | 1983-01-18 | 1983-01-18 | 化合物半導体単結晶の製造装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59131593A JPS59131593A (ja) | 1984-07-28 |
JPH0360798B2 true JPH0360798B2 (enrdf_load_stackoverflow) | 1991-09-17 |
Family
ID=11604088
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP518283A Granted JPS59131593A (ja) | 1983-01-18 | 1983-01-18 | 化合物半導体単結晶の製造装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59131593A (enrdf_load_stackoverflow) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2651481B2 (ja) * | 1987-09-21 | 1997-09-10 | 株式会社 半導体エネルギー研究所 | 超伝導材料の作製方法 |
US5186784A (en) * | 1989-06-20 | 1993-02-16 | Texas Instruments Incorporated | Process for improved doping of semiconductor crystals |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5850953B2 (ja) * | 1980-01-28 | 1983-11-14 | ソニー株式会社 | 結晶成長法 |
-
1983
- 1983-01-18 JP JP518283A patent/JPS59131593A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59131593A (ja) | 1984-07-28 |
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