JPH0358528B2 - - Google Patents
Info
- Publication number
- JPH0358528B2 JPH0358528B2 JP59036164A JP3616484A JPH0358528B2 JP H0358528 B2 JPH0358528 B2 JP H0358528B2 JP 59036164 A JP59036164 A JP 59036164A JP 3616484 A JP3616484 A JP 3616484A JP H0358528 B2 JPH0358528 B2 JP H0358528B2
- Authority
- JP
- Japan
- Prior art keywords
- mirror
- light
- drive source
- photoelectric detector
- signal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 claims description 25
- 238000001514 detection method Methods 0.000 claims description 4
- 235000012431 wafers Nutrition 0.000 description 12
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 10
- 238000010586 diagram Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59036164A JPS60181745A (ja) | 1984-02-29 | 1984-02-29 | 光学装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59036164A JPS60181745A (ja) | 1984-02-29 | 1984-02-29 | 光学装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60181745A JPS60181745A (ja) | 1985-09-17 |
| JPH0358528B2 true JPH0358528B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1991-09-05 |
Family
ID=12462122
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59036164A Granted JPS60181745A (ja) | 1984-02-29 | 1984-02-29 | 光学装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60181745A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
-
1984
- 1984-02-29 JP JP59036164A patent/JPS60181745A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60181745A (ja) | 1985-09-17 |