JPH0358529B2 - - Google Patents
Info
- Publication number
- JPH0358529B2 JPH0358529B2 JP59075843A JP7584384A JPH0358529B2 JP H0358529 B2 JPH0358529 B2 JP H0358529B2 JP 59075843 A JP59075843 A JP 59075843A JP 7584384 A JP7584384 A JP 7584384A JP H0358529 B2 JPH0358529 B2 JP H0358529B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- mirror
- light receiving
- wafer
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 claims description 16
- 235000012431 wafers Nutrition 0.000 description 31
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 13
- 238000001514 detection method Methods 0.000 description 9
- 238000010586 diagram Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59075843A JPS60220348A (ja) | 1984-04-17 | 1984-04-17 | 位置合せ装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59075843A JPS60220348A (ja) | 1984-04-17 | 1984-04-17 | 位置合せ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60220348A JPS60220348A (ja) | 1985-11-05 |
| JPH0358529B2 true JPH0358529B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1991-09-05 |
Family
ID=13587887
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59075843A Granted JPS60220348A (ja) | 1984-04-17 | 1984-04-17 | 位置合せ装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60220348A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS636840A (ja) * | 1986-06-26 | 1988-01-12 | Nikon Corp | アライメント装置 |
| US5477057A (en) * | 1994-08-17 | 1995-12-19 | Svg Lithography Systems, Inc. | Off axis alignment system for scanning photolithography |
-
1984
- 1984-04-17 JP JP59075843A patent/JPS60220348A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60220348A (ja) | 1985-11-05 |