JPH0356456B2 - - Google Patents
Info
- Publication number
- JPH0356456B2 JPH0356456B2 JP57064889A JP6488982A JPH0356456B2 JP H0356456 B2 JPH0356456 B2 JP H0356456B2 JP 57064889 A JP57064889 A JP 57064889A JP 6488982 A JP6488982 A JP 6488982A JP H0356456 B2 JPH0356456 B2 JP H0356456B2
- Authority
- JP
- Japan
- Prior art keywords
- mim
- metal
- liquid crystal
- film
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000002184 metal Substances 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 13
- 238000007743 anodising Methods 0.000 claims description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 19
- 238000000034 method Methods 0.000 description 8
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- 238000001259 photo etching Methods 0.000 description 5
- 239000003990 capacitor Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 2
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 2
- 229910001120 nichrome Inorganic materials 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- 239000004988 Nematic liquid crystal Substances 0.000 description 1
- 239000010407 anodic oxide Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/1365—Active matrix addressed cells in which the switching element is a two-electrode device
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Liquid Crystal (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57064889A JPS58181023A (ja) | 1982-04-19 | 1982-04-19 | 電気光学装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57064889A JPS58181023A (ja) | 1982-04-19 | 1982-04-19 | 電気光学装置の製造方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15508992A Division JP2590670B2 (ja) | 1992-06-15 | 1992-06-15 | 電気光学装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58181023A JPS58181023A (ja) | 1983-10-22 |
| JPH0356456B2 true JPH0356456B2 (de) | 1991-08-28 |
Family
ID=13271102
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57064889A Granted JPS58181023A (ja) | 1982-04-19 | 1982-04-19 | 電気光学装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58181023A (de) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60149025A (ja) * | 1984-01-13 | 1985-08-06 | Seiko Epson Corp | 液晶表示装置 |
| JPS61164279A (ja) * | 1985-01-16 | 1986-07-24 | Seiko Epson Corp | Ｍｉｍ液晶表示体製造方法 |
-
1982
- 1982-04-19 JP JP57064889A patent/JPS58181023A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58181023A (ja) | 1983-10-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4534623A (en) | Horizontally-stacked metal-insulator-metal element for electro-optical device and method for manufacture | |
| US5485294A (en) | Process for producing MIM elements by electrolytic polymerization | |
| US4861141A (en) | Electro optical device and method for manufacturing same | |
| JPS599635A (ja) | 電気光学装置 | |
| JPH0356456B2 (de) | ||
| JP2590670B2 (ja) | 電気光学装置の製造方法 | |
| JPH0326367B2 (de) | ||
| JPH0446412B2 (de) | ||
| JPS5852680A (ja) | 液晶パネル基板の製造方法 | |
| JPS58178320A (ja) | 電気光学装置 | |
| JPH0331823A (ja) | 液晶表示装置及び電極基板の製造方法 | |
| JP2647115B2 (ja) | マトリックスアレイ基板の製造方法 | |
| JPH0731329B2 (ja) | 液晶表示用基板の製造方法 | |
| JPH0519302A (ja) | マトリツクスアレイ基板の製造方法 | |
| JPS59105615A (ja) | 液晶表示装置 | |
| JP2585465B2 (ja) | マトリックスアレイ基板 | |
| JPS5840527A (ja) | 液晶パネル基板の製造方法 | |
| JPS587125A (ja) | 液晶表示装置の製造方法 | |
| JPH051443B2 (de) | ||
| JPS58127985A (ja) | 液晶表示装置 | |
| JPS60192917A (ja) | マトリツクス型液晶表示装置及びその製造方法 | |
| JPS58123517A (ja) | 液晶表示パネルの製造方法 | |
| JPH0342629A (ja) | 非線形抵抗素子及びこれを用いた液晶素子 | |
| JPS5879281A (ja) | マトリクス型液晶表示装置 | |
| JPH0352277A (ja) | 非線形素子の製造方法 |