JPH035644B2 - - Google Patents

Info

Publication number
JPH035644B2
JPH035644B2 JP58133031A JP13303183A JPH035644B2 JP H035644 B2 JPH035644 B2 JP H035644B2 JP 58133031 A JP58133031 A JP 58133031A JP 13303183 A JP13303183 A JP 13303183A JP H035644 B2 JPH035644 B2 JP H035644B2
Authority
JP
Japan
Prior art keywords
film
target
substrate
magnetic
phase
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58133031A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6025211A (ja
Inventor
Masahiko Naoe
Shozo Ishibashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP13303183A priority Critical patent/JPS6025211A/ja
Priority to US06/630,514 priority patent/US4690744A/en
Priority to DE8484304963T priority patent/DE3480039D1/de
Priority to EP84304963A priority patent/EP0132398B1/en
Publication of JPS6025211A publication Critical patent/JPS6025211A/ja
Publication of JPH035644B2 publication Critical patent/JPH035644B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Thin Magnetic Films (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
JP13303183A 1983-07-20 1983-07-20 窒化鉄膜の形成方法 Granted JPS6025211A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP13303183A JPS6025211A (ja) 1983-07-20 1983-07-20 窒化鉄膜の形成方法
US06/630,514 US4690744A (en) 1983-07-20 1984-07-13 Method of ion beam generation and an apparatus based on such method
DE8484304963T DE3480039D1 (en) 1983-07-20 1984-07-20 A method and apparatus for ion beam generation
EP84304963A EP0132398B1 (en) 1983-07-20 1984-07-20 A method and apparatus for ion beam generation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13303183A JPS6025211A (ja) 1983-07-20 1983-07-20 窒化鉄膜の形成方法

Publications (2)

Publication Number Publication Date
JPS6025211A JPS6025211A (ja) 1985-02-08
JPH035644B2 true JPH035644B2 (OSRAM) 1991-01-28

Family

ID=15095184

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13303183A Granted JPS6025211A (ja) 1983-07-20 1983-07-20 窒化鉄膜の形成方法

Country Status (1)

Country Link
JP (1) JPS6025211A (OSRAM)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62204504A (ja) * 1986-03-04 1987-09-09 Nippon Telegr & Teleph Corp <Ntt> アモルフアス軟磁性膜及びその製造方法
JPH04270017A (ja) * 1991-02-25 1992-09-25 Press Gijutsu Kenkyusho:Kk プレス送り装置のリリース装置
JP3606481B2 (ja) * 1995-10-31 2005-01-05 戸田工業株式会社 ＮｉＯ配向膜の製造法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57157511A (en) * 1981-03-24 1982-09-29 Teijin Ltd Opposite target type sputtering device
JPS5836908A (ja) * 1981-08-24 1983-03-04 Sumitomo Special Metals Co Ltd 窒化物薄膜軟質磁性体の製造法

Also Published As

Publication number Publication date
JPS6025211A (ja) 1985-02-08

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