JPH0352219B2 - - Google Patents
Info
- Publication number
- JPH0352219B2 JPH0352219B2 JP58146501A JP14650183A JPH0352219B2 JP H0352219 B2 JPH0352219 B2 JP H0352219B2 JP 58146501 A JP58146501 A JP 58146501A JP 14650183 A JP14650183 A JP 14650183A JP H0352219 B2 JPH0352219 B2 JP H0352219B2
- Authority
- JP
- Japan
- Prior art keywords
- calibration
- sensitivity
- standard
- sample
- standard sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000035945 sensitivity Effects 0.000 claims description 51
- 238000007689 inspection Methods 0.000 claims description 36
- 239000002245 particle Substances 0.000 claims description 33
- 238000005286 illumination Methods 0.000 claims description 27
- 238000000034 method Methods 0.000 claims description 26
- 238000001514 detection method Methods 0.000 claims description 21
- 238000012545 processing Methods 0.000 claims description 15
- 239000000126 substance Substances 0.000 claims description 13
- 230000001678 irradiating effect Effects 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 14
- 238000009826 distribution Methods 0.000 description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 238000005530 etching Methods 0.000 description 8
- 229910052710 silicon Inorganic materials 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- 239000011159 matrix material Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- 102100023185 Transcriptional repressor scratch 1 Human genes 0.000 description 2
- 101710171414 Transcriptional repressor scratch 1 Proteins 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000001015 X-ray lithography Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005314 correlation function Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 239000004816 latex Substances 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Length Measuring Devices By Optical Means (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58146501A JPS6038827A (ja) | 1983-08-12 | 1983-08-12 | 自動異物検査装置の感度校正方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58146501A JPS6038827A (ja) | 1983-08-12 | 1983-08-12 | 自動異物検査装置の感度校正方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6038827A JPS6038827A (ja) | 1985-02-28 |
| JPH0352219B2 true JPH0352219B2 (sv) | 1991-08-09 |
Family
ID=15409051
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58146501A Granted JPS6038827A (ja) | 1983-08-12 | 1983-08-12 | 自動異物検査装置の感度校正方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6038827A (sv) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0798738B2 (ja) * | 1985-06-04 | 1995-10-25 | ライオン株式会社 | 口腔用組成物 |
| US5036797A (en) * | 1986-03-26 | 1991-08-06 | Koozer Howard D | Animal husbandry housing and method |
| JPS63127147A (ja) * | 1986-11-17 | 1988-05-31 | Hitachi Electronics Eng Co Ltd | 面板欠陥検出装置の検出信号電圧制御方式 |
| JPH03183149A (ja) * | 1989-12-12 | 1991-08-09 | Hitachi Electron Eng Co Ltd | 異物検査装置の感度校正用の試料 |
| JP2671241B2 (ja) * | 1990-12-27 | 1997-10-29 | 日立電子エンジニアリング株式会社 | ガラス板の異物検出装置 |
| US5410400A (en) * | 1991-06-26 | 1995-04-25 | Hitachi, Ltd. | Foreign particle inspection apparatus |
| JP3314440B2 (ja) * | 1993-02-26 | 2002-08-12 | 株式会社日立製作所 | 欠陥検査装置およびその方法 |
| JP2007017395A (ja) * | 2005-07-11 | 2007-01-25 | Nikon Corp | 表面検査装置および表面検査方法 |
| JP2010008336A (ja) * | 2008-06-30 | 2010-01-14 | Shin Etsu Handotai Co Ltd | 画像検査装置の校正用サンプルウエーハ及び画像検査装置の校正方法 |
| JP5589888B2 (ja) * | 2011-02-18 | 2014-09-17 | Ｊｆｅスチール株式会社 | 表面検査装置の評価装置及び表面検査装置の評価方法 |
| JP2014199692A (ja) * | 2013-03-29 | 2014-10-23 | 株式会社日立ハイテクノロジーズ | ディスク表面検査装置およびディスク表面検査方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5998532A (ja) * | 1982-11-29 | 1984-06-06 | Toshiba Corp | 標準欠陥試料作製方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5973710U (ja) * | 1982-11-09 | 1984-05-18 | 日本電気株式会社 | 光学顕微鏡用除振台 |
-
1983
- 1983-08-12 JP JP58146501A patent/JPS6038827A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5998532A (ja) * | 1982-11-29 | 1984-06-06 | Toshiba Corp | 標準欠陥試料作製方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6038827A (ja) | 1985-02-28 |
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