JPH0351333Y2 - - Google Patents
Info
- Publication number
- JPH0351333Y2 JPH0351333Y2 JP16969683U JP16969683U JPH0351333Y2 JP H0351333 Y2 JPH0351333 Y2 JP H0351333Y2 JP 16969683 U JP16969683 U JP 16969683U JP 16969683 U JP16969683 U JP 16969683U JP H0351333 Y2 JPH0351333 Y2 JP H0351333Y2
- Authority
- JP
- Japan
- Prior art keywords
- heating element
- airtight container
- film forming
- mounting surface
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010438 heat treatment Methods 0.000 claims description 27
- 239000000758 substrate Substances 0.000 claims description 18
- 239000002470 thermal conductor Substances 0.000 claims description 5
- 239000004020 conductor Substances 0.000 claims description 3
- 239000011261 inert gas Substances 0.000 claims description 3
- 239000012528 membrane Substances 0.000 claims description 2
- 238000000151 deposition Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000009529 body temperature measurement Methods 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16969683U JPS6078870U (ja) | 1983-10-31 | 1983-10-31 | 成膜装置用加熱体 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16969683U JPS6078870U (ja) | 1983-10-31 | 1983-10-31 | 成膜装置用加熱体 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6078870U JPS6078870U (ja) | 1985-06-01 |
| JPH0351333Y2 true JPH0351333Y2 (en:Method) | 1991-11-01 |
Family
ID=30370665
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16969683U Granted JPS6078870U (ja) | 1983-10-31 | 1983-10-31 | 成膜装置用加熱体 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6078870U (en:Method) |
-
1983
- 1983-10-31 JP JP16969683U patent/JPS6078870U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6078870U (ja) | 1985-06-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20030231698A1 (en) | Apparatus and method for fabricating a semiconductor device and a heat treatment apparatus | |
| JP4009100B2 (ja) | 基板加熱装置および基板加熱方法 | |
| US20130133703A1 (en) | Vaporized material supply apparatus, substrate processing apparatus having same and vaporized material supply method | |
| KR100715054B1 (ko) | 진공 처리 장치 | |
| JPH0351333Y2 (en:Method) | ||
| EP4024018B1 (en) | Measurement device for measuring a temperature | |
| JPH07230956A (ja) | プラズマcvd装置 | |
| WO2025223385A1 (zh) | 一种片状加热装置的电子水烟 | |
| US6193803B1 (en) | Substrate holding apparatus for processing semiconductors | |
| JPH05223764A (ja) | 示差走査熱量計の炉体ユニット | |
| JPH11354526A (ja) | 板体加熱装置 | |
| JPS6025958Y2 (ja) | 真空製二重容器 | |
| JPS622698B2 (en:Method) | ||
| JP2889649B2 (ja) | 熱処理装置 | |
| JP3578258B2 (ja) | 熱処理装置 | |
| JP3325384B2 (ja) | 熱処理炉用温度測定装置 | |
| JPS58223009A (ja) | 水晶発振式膜厚モニタ | |
| JP4298899B2 (ja) | 縦型熱処理装置 | |
| JPH06326081A (ja) | 乾式薄膜加工装置用加熱装置 | |
| JPS5932908Y2 (ja) | 熱量計 | |
| JP2641463B2 (ja) | プラズマ処理装置 | |
| EP0406669A2 (en) | Thin film making method on semiconductor substrate and temperature controlling systems therefor | |
| CN208532918U (zh) | 一种加热装置及一种真空镀膜系统 | |
| JP2000314731A (ja) | ガスクロマトグラフ装置 | |
| JPH0421087Y2 (en:Method) |