JPH0351291B2 - - Google Patents
Info
- Publication number
- JPH0351291B2 JPH0351291B2 JP59180390A JP18039084A JPH0351291B2 JP H0351291 B2 JPH0351291 B2 JP H0351291B2 JP 59180390 A JP59180390 A JP 59180390A JP 18039084 A JP18039084 A JP 18039084A JP H0351291 B2 JPH0351291 B2 JP H0351291B2
- Authority
- JP
- Japan
- Prior art keywords
- discharge chamber
- chamber
- discharge
- process chamber
- radicals
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Recrystallisation Techniques (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18039084A JPS6159821A (ja) | 1984-08-31 | 1984-08-31 | ラジカルビ−ムプロセス装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18039084A JPS6159821A (ja) | 1984-08-31 | 1984-08-31 | ラジカルビ−ムプロセス装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6159821A JPS6159821A (ja) | 1986-03-27 |
| JPH0351291B2 true JPH0351291B2 (enExample) | 1991-08-06 |
Family
ID=16082395
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18039084A Granted JPS6159821A (ja) | 1984-08-31 | 1984-08-31 | ラジカルビ−ムプロセス装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6159821A (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02241034A (ja) * | 1989-03-15 | 1990-09-25 | Matsushita Electric Ind Co Ltd | プラズマ処理装置 |
| JPH03232224A (ja) * | 1990-02-07 | 1991-10-16 | Mitsubishi Electric Corp | プラズマ処理装置 |
| JP2606551B2 (ja) * | 1993-04-27 | 1997-05-07 | 日本電気株式会社 | 中性粒子ビームエッチング装置 |
| JP2595894B2 (ja) * | 1994-04-26 | 1997-04-02 | 日本電気株式会社 | 水素ラジカル発生装置 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5857509B2 (ja) * | 1976-05-25 | 1983-12-20 | 日本電気株式会社 | プラズマデポジション装置 |
-
1984
- 1984-08-31 JP JP18039084A patent/JPS6159821A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6159821A (ja) | 1986-03-27 |
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