JPS6159821A - ラジカルビ−ムプロセス装置 - Google Patents

ラジカルビ−ムプロセス装置

Info

Publication number
JPS6159821A
JPS6159821A JP18039084A JP18039084A JPS6159821A JP S6159821 A JPS6159821 A JP S6159821A JP 18039084 A JP18039084 A JP 18039084A JP 18039084 A JP18039084 A JP 18039084A JP S6159821 A JPS6159821 A JP S6159821A
Authority
JP
Japan
Prior art keywords
discharge chamber
chamber
discharge
plasma
processing chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18039084A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0351291B2 (enExample
Inventor
Toshio Hayashi
俊雄 林
Masashi Kikuchi
正志 菊池
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP18039084A priority Critical patent/JPS6159821A/ja
Publication of JPS6159821A publication Critical patent/JPS6159821A/ja
Publication of JPH0351291B2 publication Critical patent/JPH0351291B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Recrystallisation Techniques (AREA)
  • Drying Of Semiconductors (AREA)
JP18039084A 1984-08-31 1984-08-31 ラジカルビ−ムプロセス装置 Granted JPS6159821A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18039084A JPS6159821A (ja) 1984-08-31 1984-08-31 ラジカルビ−ムプロセス装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18039084A JPS6159821A (ja) 1984-08-31 1984-08-31 ラジカルビ−ムプロセス装置

Publications (2)

Publication Number Publication Date
JPS6159821A true JPS6159821A (ja) 1986-03-27
JPH0351291B2 JPH0351291B2 (enExample) 1991-08-06

Family

ID=16082395

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18039084A Granted JPS6159821A (ja) 1984-08-31 1984-08-31 ラジカルビ−ムプロセス装置

Country Status (1)

Country Link
JP (1) JPS6159821A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02241034A (ja) * 1989-03-15 1990-09-25 Matsushita Electric Ind Co Ltd プラズマ処理装置
JPH03232224A (ja) * 1990-02-07 1991-10-16 Mitsubishi Electric Corp プラズマ処理装置
JPH06310464A (ja) * 1993-04-27 1994-11-04 Nec Corp 中性粒子ビームエッチング装置
US5574958A (en) * 1994-04-26 1996-11-12 Nec Corporation Hydrogen radical producing apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52143981A (en) * 1976-05-25 1977-11-30 Nec Corp Equipment for plasma depo sition

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52143981A (en) * 1976-05-25 1977-11-30 Nec Corp Equipment for plasma depo sition

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02241034A (ja) * 1989-03-15 1990-09-25 Matsushita Electric Ind Co Ltd プラズマ処理装置
JPH03232224A (ja) * 1990-02-07 1991-10-16 Mitsubishi Electric Corp プラズマ処理装置
JPH06310464A (ja) * 1993-04-27 1994-11-04 Nec Corp 中性粒子ビームエッチング装置
US5574958A (en) * 1994-04-26 1996-11-12 Nec Corporation Hydrogen radical producing apparatus

Also Published As

Publication number Publication date
JPH0351291B2 (enExample) 1991-08-06

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