JPS52143981A - Equipment for plasma depo sition - Google Patents

Equipment for plasma depo sition

Info

Publication number
JPS52143981A
JPS52143981A JP6025076A JP6025076A JPS52143981A JP S52143981 A JPS52143981 A JP S52143981A JP 6025076 A JP6025076 A JP 6025076A JP 6025076 A JP6025076 A JP 6025076A JP S52143981 A JPS52143981 A JP S52143981A
Authority
JP
Japan
Prior art keywords
plasma
equipment
membrane
depo sition
grown
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6025076A
Other languages
Japanese (ja)
Other versions
JPS5857509B2 (en
Inventor
Masahiko Nakamae
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP6025076A priority Critical patent/JPS5857509B2/en
Publication of JPS52143981A publication Critical patent/JPS52143981A/en
Publication of JPS5857509B2 publication Critical patent/JPS5857509B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/507—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using external electrodes, e.g. in tunnel type reactors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To obtain the grown membrane of stable characteristics without receiving the damage of the sample and the grown membrane due to the irradiation, by arranging the screening plate for electric field consisting of perforated plate or net made of electroconductive material between the plasma generating area and the substrate on which the prescribed membrane shoud be coated.
JP6025076A 1976-05-25 1976-05-25 plasma deposition equipment Expired JPS5857509B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6025076A JPS5857509B2 (en) 1976-05-25 1976-05-25 plasma deposition equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6025076A JPS5857509B2 (en) 1976-05-25 1976-05-25 plasma deposition equipment

Publications (2)

Publication Number Publication Date
JPS52143981A true JPS52143981A (en) 1977-11-30
JPS5857509B2 JPS5857509B2 (en) 1983-12-20

Family

ID=13136731

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6025076A Expired JPS5857509B2 (en) 1976-05-25 1976-05-25 plasma deposition equipment

Country Status (1)

Country Link
JP (1) JPS5857509B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59119828A (en) * 1982-12-27 1984-07-11 Semiconductor Energy Lab Co Ltd Method for plasmic vapor phase reaction
JPS6159821A (en) * 1984-08-31 1986-03-27 Ulvac Corp Radial-beam processor

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59119828A (en) * 1982-12-27 1984-07-11 Semiconductor Energy Lab Co Ltd Method for plasmic vapor phase reaction
JPH0544179B2 (en) * 1982-12-27 1993-07-05 Handotai Energy Kenkyusho
JPS6159821A (en) * 1984-08-31 1986-03-27 Ulvac Corp Radial-beam processor
JPH0351291B2 (en) * 1984-08-31 1991-08-06 Ulvac Corp

Also Published As

Publication number Publication date
JPS5857509B2 (en) 1983-12-20

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