JPH0348097B2 - - Google Patents

Info

Publication number
JPH0348097B2
JPH0348097B2 JP12218285A JP12218285A JPH0348097B2 JP H0348097 B2 JPH0348097 B2 JP H0348097B2 JP 12218285 A JP12218285 A JP 12218285A JP 12218285 A JP12218285 A JP 12218285A JP H0348097 B2 JPH0348097 B2 JP H0348097B2
Authority
JP
Japan
Prior art keywords
lid
cassette
mask
lower lid
fork
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP12218285A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61282229A (ja
Inventor
Shinji Tsutsui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60122182A priority Critical patent/JPS61282229A/ja
Priority to US06/750,282 priority patent/US4611967A/en
Publication of JPS61282229A publication Critical patent/JPS61282229A/ja
Publication of JPH0348097B2 publication Critical patent/JPH0348097B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Library & Information Science (AREA)
  • Packaging Frangible Articles (AREA)
  • Warehouses Or Storage Devices (AREA)
  • Sheets, Magazines, And Separation Thereof (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP60122182A 1984-07-06 1985-06-05 防塵カセツト Granted JPS61282229A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60122182A JPS61282229A (ja) 1985-06-05 1985-06-05 防塵カセツト
US06/750,282 US4611967A (en) 1984-07-06 1985-07-01 Cassette-type container for a sheet-like member

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60122182A JPS61282229A (ja) 1985-06-05 1985-06-05 防塵カセツト

Publications (2)

Publication Number Publication Date
JPS61282229A JPS61282229A (ja) 1986-12-12
JPH0348097B2 true JPH0348097B2 (fr) 1991-07-23

Family

ID=14829605

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60122182A Granted JPS61282229A (ja) 1984-07-06 1985-06-05 防塵カセツト

Country Status (1)

Country Link
JP (1) JPS61282229A (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2539447B2 (ja) * 1987-08-12 1996-10-02 株式会社日立製作所 枚葉キャリアによる生産方法
JP2789198B2 (ja) * 1988-09-06 1998-08-20 キヤノン株式会社 マスクローディング機構
JP2536623B2 (ja) * 1989-07-12 1996-09-18 日本電気株式会社 自動用紙幅合わせ機構
ES2101070T3 (es) * 1992-08-04 1997-07-01 Ibm Recipientes portatiles estancos a presion para almacenar una rebanada de semiconductor en un ambiente gaseoso protector.
US6619903B2 (en) * 2001-08-10 2003-09-16 Glenn M. Friedman System and method for reticle protection and transport

Also Published As

Publication number Publication date
JPS61282229A (ja) 1986-12-12

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term