JPH0344145B2 - - Google Patents
Info
- Publication number
- JPH0344145B2 JPH0344145B2 JP23992383A JP23992383A JPH0344145B2 JP H0344145 B2 JPH0344145 B2 JP H0344145B2 JP 23992383 A JP23992383 A JP 23992383A JP 23992383 A JP23992383 A JP 23992383A JP H0344145 B2 JPH0344145 B2 JP H0344145B2
- Authority
- JP
- Japan
- Prior art keywords
- pressure
- tellurium
- sintering
- powder
- target plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000843 powder Substances 0.000 claims description 12
- 238000004544 sputter deposition Methods 0.000 claims description 10
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims description 9
- 229910052714 tellurium Inorganic materials 0.000 claims description 7
- 229910001215 Te alloy Inorganic materials 0.000 claims description 6
- 238000005245 sintering Methods 0.000 description 13
- 238000000034 method Methods 0.000 description 11
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 238000005452 bending Methods 0.000 description 6
- 239000007789 gas Substances 0.000 description 4
- 238000000465 moulding Methods 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 238000000748 compression moulding Methods 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 238000005266 casting Methods 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 238000001272 pressureless sintering Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000005477 sputtering target Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23992383A JPS60131963A (ja) | 1983-12-21 | 1983-12-21 | スパツタリング用タ−ゲツト板 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23992383A JPS60131963A (ja) | 1983-12-21 | 1983-12-21 | スパツタリング用タ−ゲツト板 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60131963A JPS60131963A (ja) | 1985-07-13 |
| JPH0344145B2 true JPH0344145B2 (ko) | 1991-07-05 |
Family
ID=17051853
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23992383A Granted JPS60131963A (ja) | 1983-12-21 | 1983-12-21 | スパツタリング用タ−ゲツト板 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60131963A (ko) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6213569A (ja) * | 1985-07-10 | 1987-01-22 | Mitsubishi Metal Corp | ＴｅまたはＴｅ合金製スパツタリング用焼結タ−ゲツト |
| JPS62148362A (ja) * | 1985-12-24 | 1987-07-02 | 三菱マテリアル株式会社 | スパツタリング用タ−ゲツト材の製造法 |
| JPH0752527B2 (ja) * | 1986-08-18 | 1995-06-05 | 松下電器産業株式会社 | 光学情報記録再生デイスクの製造方法 |
| JPS63143258A (ja) * | 1986-12-05 | 1988-06-15 | Mitsubishi Metal Corp | スパツタリング用タ−ゲツト |
| JP2725331B2 (ja) * | 1988-12-23 | 1998-03-11 | 三菱マテリアル株式会社 | ターゲット材の製造方法 |
-
1983
- 1983-12-21 JP JP23992383A patent/JPS60131963A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60131963A (ja) | 1985-07-13 |
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