JPH033943B2 - - Google Patents
Info
- Publication number
- JPH033943B2 JPH033943B2 JP59009086A JP908684A JPH033943B2 JP H033943 B2 JPH033943 B2 JP H033943B2 JP 59009086 A JP59009086 A JP 59009086A JP 908684 A JP908684 A JP 908684A JP H033943 B2 JPH033943 B2 JP H033943B2
- Authority
- JP
- Japan
- Prior art keywords
- length
- gate
- mask
- diffusion region
- diffusion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000009792 diffusion process Methods 0.000 claims description 49
- 239000000463 material Substances 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 12
- 239000004065 semiconductor Substances 0.000 claims description 12
- 238000005259 measurement Methods 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 7
- 238000012360 testing method Methods 0.000 claims description 4
- 230000000873 masking effect Effects 0.000 claims 2
- 239000008186 active pharmaceutical agent Substances 0.000 description 10
- 238000000691 measurement method Methods 0.000 description 9
- 238000013461 design Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000012535 impurity Substances 0.000 description 4
- 238000007689 inspection Methods 0.000 description 4
- 238000005468 ion implantation Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59009086A JPS60153137A (ja) | 1984-01-20 | 1984-01-20 | 半導体装置の寸法測定方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59009086A JPS60153137A (ja) | 1984-01-20 | 1984-01-20 | 半導体装置の寸法測定方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60153137A JPS60153137A (ja) | 1985-08-12 |
| JPH033943B2 true JPH033943B2 (ko) | 1991-01-21 |
Family
ID=11710802
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59009086A Granted JPS60153137A (ja) | 1984-01-20 | 1984-01-20 | 半導体装置の寸法測定方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60153137A (ko) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100336792B1 (ko) * | 2000-05-25 | 2002-05-16 | 박종섭 | 실리사이드막 제조공정의 평가를 위한 시험 패턴의 구조 |
| KR100819558B1 (ko) | 2006-09-04 | 2008-04-07 | 삼성전자주식회사 | 반도체 저항소자들 및 그의 형성방법들 |
| US8151441B1 (en) * | 2008-03-27 | 2012-04-10 | Western Digital (Fremont), Llc | Method for providing and utilizing an electronic lapping guide in a magnetic recording transducer |
-
1984
- 1984-01-20 JP JP59009086A patent/JPS60153137A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60153137A (ja) | 1985-08-12 |
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