JPH0336290B2 - - Google Patents

Info

Publication number
JPH0336290B2
JPH0336290B2 JP7345684A JP7345684A JPH0336290B2 JP H0336290 B2 JPH0336290 B2 JP H0336290B2 JP 7345684 A JP7345684 A JP 7345684A JP 7345684 A JP7345684 A JP 7345684A JP H0336290 B2 JPH0336290 B2 JP H0336290B2
Authority
JP
Japan
Prior art keywords
mask
pattern
wafer
key pattern
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP7345684A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60217629A (ja
Inventor
Takeshi Takanori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP59073456A priority Critical patent/JPS60217629A/ja
Publication of JPS60217629A publication Critical patent/JPS60217629A/ja
Publication of JPH0336290B2 publication Critical patent/JPH0336290B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59073456A 1984-04-12 1984-04-12 半導体装置の製造方法 Granted JPS60217629A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59073456A JPS60217629A (ja) 1984-04-12 1984-04-12 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59073456A JPS60217629A (ja) 1984-04-12 1984-04-12 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS60217629A JPS60217629A (ja) 1985-10-31
JPH0336290B2 true JPH0336290B2 (enrdf_load_html_response) 1991-05-31

Family

ID=13518759

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59073456A Granted JPS60217629A (ja) 1984-04-12 1984-04-12 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS60217629A (enrdf_load_html_response)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2595962B2 (ja) * 1987-04-21 1997-04-02 セイコーエプソン株式会社 半導体装置

Also Published As

Publication number Publication date
JPS60217629A (ja) 1985-10-31

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