JPH0336212B2 - - Google Patents

Info

Publication number
JPH0336212B2
JPH0336212B2 JP58076282A JP7628283A JPH0336212B2 JP H0336212 B2 JPH0336212 B2 JP H0336212B2 JP 58076282 A JP58076282 A JP 58076282A JP 7628283 A JP7628283 A JP 7628283A JP H0336212 B2 JPH0336212 B2 JP H0336212B2
Authority
JP
Japan
Prior art keywords
group
groups
weight
acid
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58076282A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59202458A (ja
Inventor
Yoichi Mori
Masaharu Hatsutori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP7628283A priority Critical patent/JPS59202458A/ja
Publication of JPS59202458A publication Critical patent/JPS59202458A/ja
Publication of JPH0336212B2 publication Critical patent/JPH0336212B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
JP7628283A 1983-05-02 1983-05-02 感光性組成物 Granted JPS59202458A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7628283A JPS59202458A (ja) 1983-05-02 1983-05-02 感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7628283A JPS59202458A (ja) 1983-05-02 1983-05-02 感光性組成物

Publications (2)

Publication Number Publication Date
JPS59202458A JPS59202458A (ja) 1984-11-16
JPH0336212B2 true JPH0336212B2 (enrdf_load_stackoverflow) 1991-05-30

Family

ID=13600930

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7628283A Granted JPS59202458A (ja) 1983-05-02 1983-05-02 感光性組成物

Country Status (1)

Country Link
JP (1) JPS59202458A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000154208A (ja) * 1998-11-18 2000-06-06 Taiyo Ink Mfg Ltd 光硬化性組成物

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5018913A (enrdf_load_stackoverflow) * 1973-06-13 1975-02-27
JPS53109703A (en) * 1977-03-08 1978-09-25 Teijin Ltd Improved supporting plate
JPS5699210A (en) * 1980-01-14 1981-08-10 Asahi Chem Ind Co Ltd Photosensitive resin composition

Also Published As

Publication number Publication date
JPS59202458A (ja) 1984-11-16

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