JPH033381B2 - - Google Patents

Info

Publication number
JPH033381B2
JPH033381B2 JP63017093A JP1709388A JPH033381B2 JP H033381 B2 JPH033381 B2 JP H033381B2 JP 63017093 A JP63017093 A JP 63017093A JP 1709388 A JP1709388 A JP 1709388A JP H033381 B2 JPH033381 B2 JP H033381B2
Authority
JP
Japan
Prior art keywords
substrate
plasma
potential
ions
energy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP63017093A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63211631A (ja
Inventor
Takashi Tsuchimoto
Yoshimichi Hirobe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP63017093A priority Critical patent/JPS63211631A/ja
Publication of JPS63211631A publication Critical patent/JPS63211631A/ja
Publication of JPH033381B2 publication Critical patent/JPH033381B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
JP63017093A 1988-01-29 1988-01-29 プラズマ処理装置 Granted JPS63211631A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63017093A JPS63211631A (ja) 1988-01-29 1988-01-29 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63017093A JPS63211631A (ja) 1988-01-29 1988-01-29 プラズマ処理装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP10916179A Division JPS5633839A (en) 1979-08-29 1979-08-29 Plasma treatment and device therefor

Publications (2)

Publication Number Publication Date
JPS63211631A JPS63211631A (ja) 1988-09-02
JPH033381B2 true JPH033381B2 (enExample) 1991-01-18

Family

ID=11934376

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63017093A Granted JPS63211631A (ja) 1988-01-29 1988-01-29 プラズマ処理装置

Country Status (1)

Country Link
JP (1) JPS63211631A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5007438B2 (ja) * 2005-03-30 2012-08-22 地方独立行政法人山口県産業技術センター ＳｉＮｘＯｙＣｚ膜及びその製造方法

Also Published As

Publication number Publication date
JPS63211631A (ja) 1988-09-02

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