JPH033380B2 - - Google Patents

Info

Publication number
JPH033380B2
JPH033380B2 JP63017092A JP1709288A JPH033380B2 JP H033380 B2 JPH033380 B2 JP H033380B2 JP 63017092 A JP63017092 A JP 63017092A JP 1709288 A JP1709288 A JP 1709288A JP H033380 B2 JPH033380 B2 JP H033380B2
Authority
JP
Japan
Prior art keywords
substrate
plasma
discharge
ions
potential
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP63017092A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63211630A (ja
Inventor
Takashi Tsuchimoto
Yoshimichi Hirobe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP63017092A priority Critical patent/JPS63211630A/ja
Publication of JPS63211630A publication Critical patent/JPS63211630A/ja
Publication of JPH033380B2 publication Critical patent/JPH033380B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP63017092A 1988-01-29 1988-01-29 プラズマ処理装置 Granted JPS63211630A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63017092A JPS63211630A (ja) 1988-01-29 1988-01-29 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63017092A JPS63211630A (ja) 1988-01-29 1988-01-29 プラズマ処理装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP10916179A Division JPS5633839A (en) 1979-08-29 1979-08-29 Plasma treatment and device therefor

Publications (2)

Publication Number Publication Date
JPS63211630A JPS63211630A (ja) 1988-09-02
JPH033380B2 true JPH033380B2 (enExample) 1991-01-18

Family

ID=11934347

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63017092A Granted JPS63211630A (ja) 1988-01-29 1988-01-29 プラズマ処理装置

Country Status (1)

Country Link
JP (1) JPS63211630A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3708717A1 (de) * 1987-03-18 1988-09-29 Hans Prof Dr Rer Nat Oechsner Verfahren und vorrichtung zur bearbeitung von festkoerperoberflaechen durch teilchenbeschuss
DE102011105645A1 (de) * 2011-06-07 2012-12-13 Oerlikon Trading Ag, Trübbach Entschichtungsverfahren für harte Kohlenstoffschichten

Also Published As

Publication number Publication date
JPS63211630A (ja) 1988-09-02

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