JPH03254193A - Multilayer wiring board - Google Patents
Multilayer wiring boardInfo
- Publication number
- JPH03254193A JPH03254193A JP5215890A JP5215890A JPH03254193A JP H03254193 A JPH03254193 A JP H03254193A JP 5215890 A JP5215890 A JP 5215890A JP 5215890 A JP5215890 A JP 5215890A JP H03254193 A JPH03254193 A JP H03254193A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- layer
- laminate
- downside
- upside
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 claims abstract description 19
- 229920005989 resin Polymers 0.000 claims abstract description 15
- 239000011347 resin Substances 0.000 claims abstract description 15
- 239000008199 coating composition Substances 0.000 claims description 9
- 239000000203 mixture Substances 0.000 abstract description 5
- 230000017525 heat dissipation Effects 0.000 abstract description 4
- 239000007822 coupling agent Substances 0.000 abstract description 2
- 239000003960 organic solvent Substances 0.000 abstract description 2
- 229920001187 thermosetting polymer Polymers 0.000 abstract description 2
- 239000000413 hydrolysate Substances 0.000 abstract 2
- 239000010410 layer Substances 0.000 description 20
- 239000004744 fabric Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 239000012790 adhesive layer Substances 0.000 description 3
- -1 boria ξ toimide Polymers 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- 238000003475 lamination Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000004745 nonwoven fabric Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 239000012209 synthetic fiber Substances 0.000 description 2
- 229920002994 synthetic fiber Polymers 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N hydrochloric acid Substances Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920006380 polyphenylene oxide Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 238000009824 pressure lamination Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Production Of Multi-Layered Print Wiring Board (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は電子機器・電気機器、コンピューター、通信機
器等に用いられる多層配線基板に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a multilayer wiring board used in electronic/electrical equipment, computers, communication equipment, etc.
従来の多層配線基板は所要枚数の回路形成した内層材の
各上面及び又は下面に、樹脂層を配し最外側に外層材を
配設した積層体を一体化してなるものであるが、最近の
多層配線基板においては耐熱性、熱放散性等のように多
様なニーズが必要とされ、それに対応しきれないのが現
状である。Conventional multilayer wiring boards are made by integrating a laminated body in which a required number of circuit-formed inner layer materials are arranged, a resin layer is arranged on each upper and/or lower surface, and an outer layer material is arranged on the outermost side. Multilayer wiring boards require various needs such as heat resistance and heat dissipation, and the current situation is that they cannot fully meet these needs.
従来の技術で述べたように、従来の多層配線基板では多
様なニーズに対応しきれない。本発明は従来の技術にお
ける上述の問題点に鑑みてなされたもので、その目的と
するところは耐熱性、熱放散性に優れた電気用積層板を
提供することにある〔問題点を解決するための手段〕
本発明は所要枚数の回路形成した内層材の各上面及び又
は下面に樹脂層を配し最外側に無機質被覆組成物を介し
て外層材を配設した積層体を一体化してなることを特徴
とする多層配線基板のため、無機質被覆組成物により上
記目的を達成することができたもので、以下本発明の詳
細な説明する本発明に用いる内層材としては、フェノー
ル樹脂、クレゾール樹脂、エポキシ樹脂、不飽和ポリエ
ステル樹脂、メラミン樹脂、ポリイミド、ポリブタジェ
ン、ポリアミド、ボリアξトイミド、ポリスルフオン、
ポリフェニレンサルファイド、ポリフェニレンオキサイ
ド、ポリブチレンテレフタレート、ポリエチレンテレフ
タレート、弗化樹脂等の単独、変性物、混合物等の樹脂
と紙、ガラス布、ガラス不織布、合成繊維布、合成繊維
不織布、木綿等の基材と銅、アルミニウム、鉄、ニッケ
ル、亜鉛等の単独、合金、複合箔とからなる片面又は両
面金属箔張積層板に電気回路を形成したものであるが、
内層材の上面及び又は下面に配設される樹脂層としては
上記樹脂の塗布層、樹脂含浸基材層、樹脂シート層等の
単独、複合層が用いられるが好ましくは樹脂層厚を均一
化しやすい樹脂含浸基材を用いることが望ましい。無機
質被覆組成物としては熱硬化性を有し有機溶媒中にゾル
状に分散された状態のものを用いるもので、アルキルト
リアルコキシシランの部分加水分解物、メチルトリアル
コキシシランとフェニルトリアルコキシシランと部分加
水分解物、アルキルトリアルコキシシランとテトラアル
コキシシランの部分加水分解物、アルキルトリアルコキ
シシランの部分加水分解物、アルキルトリヒドロキシシ
ランとコロイダルシリカ、アルキルトリアルコキシシラ
ンとテトラアルコキシシランカップリング剤の部分加水
分解物等である。無機質被覆組成物には必要に応じて硬
化剤、硬化促進剤、レベリング剤、増粘剤、安定化剤、
着色剤等を添加することもできる。外層材としては片面
金属箔張積層板や金属箔を用いるもので積層一体化手段
としてはプレス、多段プレス、マルチロール、ダブルベ
ルト等による加圧下積層成形や無圧積層成形の各れでも
よく、特に限定するものではない。As mentioned in the section on conventional technology, conventional multilayer wiring boards cannot meet a variety of needs. The present invention has been made in view of the above-mentioned problems in the conventional technology, and its purpose is to provide an electrical laminate with excellent heat resistance and heat dissipation properties. [Means for achieving this] The present invention is formed by integrating a laminate in which a required number of circuit-formed inner layer materials are provided with a resin layer on each upper and/or lower surface, and an outer layer material is provided on the outermost side via an inorganic coating composition. This multilayer wiring board is characterized by the fact that the above object can be achieved by using an inorganic coating composition, and the inner layer material used in the present invention, which will be described in detail below, includes phenol resin, cresol resin, etc. , epoxy resin, unsaturated polyester resin, melamine resin, polyimide, polybutadiene, polyamide, boria ξ toimide, polysulfone,
Resins such as polyphenylene sulfide, polyphenylene oxide, polybutylene terephthalate, polyethylene terephthalate, fluorinated resins, etc. alone, modified products, and mixtures, and base materials such as paper, glass cloth, glass nonwoven fabric, synthetic fiber cloth, synthetic fiber nonwoven fabric, cotton, etc. An electric circuit is formed on a single-sided or double-sided metal foil-clad laminate made of single, alloy, or composite foil of copper, aluminum, iron, nickel, zinc, etc.
As the resin layer disposed on the upper surface and/or lower surface of the inner layer material, single or composite layers such as a coating layer of the above-mentioned resin, a resin-impregnated base material layer, a resin sheet layer, etc. are used, but preferably the resin layer thickness can be easily made uniform. It is desirable to use a resin-impregnated substrate. The inorganic coating composition used is one that has thermosetting properties and is dispersed in the form of a sol in an organic solvent. Partial hydrolyzate, partial hydrolyzate of alkyltrialkoxysilane and tetraalkoxysilane, partial hydrolyzate of alkyltrialkoxysilane, alkyltrihydroxysilane and colloidal silica, alkyltrialkoxysilane and tetraalkoxysilane coupling agent part Hydrolyzate etc. The inorganic coating composition may contain curing agents, curing accelerators, leveling agents, thickeners, stabilizers,
Coloring agents and the like may also be added. As the outer layer material, a single-sided metal foil clad laminate or metal foil is used, and the lamination integration method may be pressurized lamination molding or non-pressure lamination molding using a press, multi-stage press, multi-roll, double belt, etc. It is not particularly limited.
以下本発明を実施例にもとづいて説明する。The present invention will be explained below based on examples.
還流冷却器付の加水分解容器にイソプロピルアルコール
68重量部(以下単に部と記す)、テトラエトキシシラ
ン38部、メチルトリエトキシシラン72部、0.05
N塩酸36部をいれ5時間加熱反応してアルキルトリ
アルコキシシランとテトラアルコキシシランの部分加水
分解物(以下無機質被覆組成物Aと称する)を得た。別
に厚み0.8肋の両面銅張ガラス布基材エポキシ樹脂積
層板の両面に電気回路を形成して内層材とし、該内層材
の上下面に厚み0.1閣のエポキシ樹脂含浸ガラス布を
夫々2枚づつ重ねた最外側の樹脂含浸基材表面に、上記
無機質被覆組成物Aを硬化後の膜厚が10ミクロンにな
るようにスプレー塗布後、120″Cで10分間乾燥し
、更に160°Cで30分間加熱硬化してから接着剤層
付厚み35ミクロンの銅箔を、接着剤層が無機質被覆組
成物A層と対向するように上下面に配設した積層体を成
形圧力40kg/cd、 I 65°Cで90分間積層
成形して4層配線基板を得た。In a hydrolysis container equipped with a reflux condenser, add 68 parts by weight of isopropyl alcohol (hereinafter simply referred to as parts), 38 parts of tetraethoxysilane, 72 parts of methyltriethoxysilane, and 0.05 parts by weight.
36 parts of N-hydrochloric acid was added and the mixture was heated and reacted for 5 hours to obtain a partial hydrolyzate of alkyltrialkoxysilane and tetraalkoxysilane (hereinafter referred to as inorganic coating composition A). Separately, electric circuits are formed on both sides of a double-sided copper-clad glass cloth base epoxy resin laminate with a thickness of 0.8 ribs to serve as an inner layer material, and an epoxy resin-impregnated glass cloth with a thickness of 0.1 inch is placed on the upper and lower surfaces of the inner layer material. The above-mentioned inorganic coating composition A was spray applied to the surface of the outermost resin-impregnated base material of two stacked sheets each so that the film thickness after curing was 10 microns, and then dried at 120"C for 10 minutes, and then dried at 160"C for 10 minutes. After curing by heating at °C for 30 minutes, a laminate with a 35 micron thick copper foil with an adhesive layer placed on the upper and lower surfaces so that the adhesive layer faces the inorganic coating composition layer A was molded at a pressure of 40 kg/ cd, I Lamination molding was performed at 65°C for 90 minutes to obtain a four-layer wiring board.
比較例
実施例のエポキシ樹脂含浸ガラス布に、無機質被覆組成
物A層を存在させることなく接着剤層付厚み35ミクロ
ンの銅箔を配設した積層体を成形圧力40)cg/cJ
、165°Cで90分間積層威形して4層配線基板を得
た。Comparative Example A laminate in which the epoxy resin-impregnated glass cloth of Example was provided with a 35-micron-thick copper foil with an adhesive layer without the presence of the inorganic coating composition A layer was molded at a pressure of 40) cg/cJ.
, and laminated at 165° C. for 90 minutes to obtain a four-layer wiring board.
実施例及び比較例の多層配線基板の性能は第1表のよう
である。Table 1 shows the performance of the multilayer wiring boards of Examples and Comparative Examples.
第 1 表
注
*260°Cの溶融ハンダ上に10秒保持後の強度〔発
明の効果〕Table 1 Note: Strength after being held on molten solder at 260°C for 10 seconds [Effects of the invention]
Claims (1)
は下面に樹脂層を配し、最外側に無機質被覆組成物を介
して外層在を配設した積層体を一体化してなることを特
徴とする多層配線基板。(1) It is characterized by being formed by integrating a laminate in which a required number of circuit-formed inner layer materials are provided with a resin layer on each upper and/or lower surface, and an outer layer is provided on the outermost side via an inorganic coating composition. Multilayer wiring board.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5215890A JPH03254193A (en) | 1990-03-02 | 1990-03-02 | Multilayer wiring board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5215890A JPH03254193A (en) | 1990-03-02 | 1990-03-02 | Multilayer wiring board |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03254193A true JPH03254193A (en) | 1991-11-13 |
Family
ID=12907042
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5215890A Pending JPH03254193A (en) | 1990-03-02 | 1990-03-02 | Multilayer wiring board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03254193A (en) |
-
1990
- 1990-03-02 JP JP5215890A patent/JPH03254193A/en active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH03254193A (en) | Multilayer wiring board | |
JPH03254194A (en) | Multilayer wiring board | |
JPS6369106A (en) | Laminate plate for electricity and printed wiring board using the same | |
JPH03254195A (en) | Multilayer wiring board | |
JPH03254196A (en) | Multilayer wiring board | |
JPS63145341A (en) | Fluorocarbon resin prepreg and multilayer interconnection board prepared by using same | |
JPH03234080A (en) | Electric laminated board | |
JPH03234079A (en) | Electric laminated board | |
JPS6237996A (en) | Multilayer printed wiring board | |
JPH047901B2 (en) | ||
JPH03285383A (en) | Metallic base wiring board | |
JPS62285496A (en) | Multilayer printed interconnection board | |
JPH0315524A (en) | Multilayer printed wiring board | |
JPS6256133A (en) | Metallic foil and laminated board using said foil | |
JPH02130143A (en) | Electrical laminate | |
JPS6237997A (en) | Multilayer printed wiring board | |
JPS6237151A (en) | Resin-attached metallic foil and metallic-foil lined laminated board using said foil | |
JPH02130145A (en) | Electrical laminate | |
JPS62285497A (en) | Multilayer printed interconnection board | |
JPH03254174A (en) | Metal base wiring board | |
JPS6369637A (en) | Printed wiring substrate | |
JPS6369636A (en) | Electrical laminated board | |
JPS6218786A (en) | Metal base laminate board | |
JPH01202443A (en) | Laminate for electrical apparatus and printed-wiring board | |
JPS6220913B2 (en) |