JPH0324772B2 - - Google Patents

Info

Publication number
JPH0324772B2
JPH0324772B2 JP58070650A JP7065083A JPH0324772B2 JP H0324772 B2 JPH0324772 B2 JP H0324772B2 JP 58070650 A JP58070650 A JP 58070650A JP 7065083 A JP7065083 A JP 7065083A JP H0324772 B2 JPH0324772 B2 JP H0324772B2
Authority
JP
Japan
Prior art keywords
exposure
charged particle
area
signal
particle beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58070650A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59195825A (ja
Inventor
Toyoki Kitayama
Shigeru Morya
Kazuhiko Komatsu
Teruaki Okino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP58070650A priority Critical patent/JPS59195825A/ja
Publication of JPS59195825A publication Critical patent/JPS59195825A/ja
Publication of JPH0324772B2 publication Critical patent/JPH0324772B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP58070650A 1983-04-21 1983-04-21 荷電粒子線露光装置 Granted JPS59195825A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58070650A JPS59195825A (ja) 1983-04-21 1983-04-21 荷電粒子線露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58070650A JPS59195825A (ja) 1983-04-21 1983-04-21 荷電粒子線露光装置

Publications (2)

Publication Number Publication Date
JPS59195825A JPS59195825A (ja) 1984-11-07
JPH0324772B2 true JPH0324772B2 (enExample) 1991-04-04

Family

ID=13437733

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58070650A Granted JPS59195825A (ja) 1983-04-21 1983-04-21 荷電粒子線露光装置

Country Status (1)

Country Link
JP (1) JPS59195825A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8427919B2 (en) 2010-04-14 2013-04-23 Nuflare Technology, Inc. Pattern writing system and method and abnormality diagnosing method
KR101499660B1 (ko) * 2012-12-05 2015-03-06 한라비스테온공조 주식회사 차량용 공조장치 및 그 제어방법

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8427919B2 (en) 2010-04-14 2013-04-23 Nuflare Technology, Inc. Pattern writing system and method and abnormality diagnosing method
KR101499660B1 (ko) * 2012-12-05 2015-03-06 한라비스테온공조 주식회사 차량용 공조장치 및 그 제어방법

Also Published As

Publication number Publication date
JPS59195825A (ja) 1984-11-07

Similar Documents

Publication Publication Date Title
TWI397096B (zh) 試料表面檢查方法及檢查裝置
US10727026B2 (en) Charged particle beam inspection method
EP0298495B1 (en) Method and apparatus for correcting defects of x-ray mask
JP7094782B2 (ja) 電子ビーム検査装置及び電子ビーム検査方法
JPS61287122A (ja) マスク検査方法
JP6966319B2 (ja) マルチビーム画像取得装置及びマルチビーム画像取得方法
US10043634B2 (en) Inspection apparatus and inspection method
JPH0244137B2 (enExample)
JP2018181407A (ja) マルチ荷電粒子ビーム検査装置及びマルチ荷電粒子ビーム検査方法
JP7409988B2 (ja) パターン検査装置及び輪郭線同士のアライメント量取得方法
US11004193B2 (en) Inspection method and inspection apparatus
JPH0732111B2 (ja) 荷電ビ−ム投影露光装置
JPH1073424A (ja) 欠陥検査装置
JPH0324772B2 (enExample)
JP7030566B2 (ja) パターン検査方法及びパターン検査装置
JP3986260B2 (ja) 欠陥検査装置及びそれを用いたデバイス製造方法
JP7344725B2 (ja) アライメントマーク位置の検出方法及びアライメントマーク位置の検出装置
KR20170107898A (ko) 블랭킹 플레이트의 검사 방법
JPS62149127A (ja) 荷電ビ−ム露光装置
JPH1062149A (ja) 欠陥検査装置
JP3242122B2 (ja) パターン形成方法および半導体装置の製造方法
JP3673625B2 (ja) 微細パターンの形成方法
JP2898726B2 (ja) 荷電粒子ビーム露光方法
JPS6041456B2 (ja) 電子線を用いたパタ−ン検査装置
JPS6232613B2 (enExample)