JPH0322015B2 - - Google Patents
Info
- Publication number
- JPH0322015B2 JPH0322015B2 JP59178869A JP17886984A JPH0322015B2 JP H0322015 B2 JPH0322015 B2 JP H0322015B2 JP 59178869 A JP59178869 A JP 59178869A JP 17886984 A JP17886984 A JP 17886984A JP H0322015 B2 JPH0322015 B2 JP H0322015B2
- Authority
- JP
- Japan
- Prior art keywords
- icp
- contact
- nozzle
- mass spectrometer
- inductively coupled
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/10—Ion sources; Ion guns
- H01J49/12—Ion sources; Ion guns using an arc discharge, e.g. of the duoplasmatron type
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Electron Tubes For Measurement (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59178869A JPS6155848A (ja) | 1984-08-28 | 1984-08-28 | 誘導結合プラズマをイオン源とした質量分析装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59178869A JPS6155848A (ja) | 1984-08-28 | 1984-08-28 | 誘導結合プラズマをイオン源とした質量分析装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6155848A JPS6155848A (ja) | 1986-03-20 |
| JPH0322015B2 true JPH0322015B2 (enExample) | 1991-03-26 |
Family
ID=16056107
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59178869A Granted JPS6155848A (ja) | 1984-08-28 | 1984-08-28 | 誘導結合プラズマをイオン源とした質量分析装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6155848A (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6489256A (en) * | 1987-09-30 | 1989-04-03 | Yokogawa Electric Corp | High-frequency inductive coupling plasma mass spectrometer |
| GB8901975D0 (en) * | 1989-01-30 | 1989-03-22 | Vg Instr Group | Plasma mass spectrometer |
| JP2591822B2 (ja) * | 1989-05-26 | 1997-03-19 | 日本電子株式会社 | 高周波誘導結合プラズマ質量分析装置 |
| CN105355534B (zh) * | 2015-11-23 | 2017-01-25 | 中国科学院地质与地球物理研究所 | 一种实现电感耦合等离子体离子源工作在惰性气体环境的方法及装置 |
-
1984
- 1984-08-28 JP JP59178869A patent/JPS6155848A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6155848A (ja) | 1986-03-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6899054B1 (en) | Device for hybrid plasma processing | |
| US7274015B2 (en) | Capacitive discharge plasma ion source | |
| EP3062331B1 (en) | Ambient desorption, ionization, and excitation for spectrometry | |
| KR102093534B1 (ko) | 전자 결합 변압기 | |
| US5334834A (en) | Inductively coupled plasma mass spectrometry device | |
| US4806829A (en) | Apparatus utilizing charged particles | |
| JPS6132508B2 (enExample) | ||
| GB2296369A (en) | Radio frequency ion source | |
| JPH0160920B2 (enExample) | ||
| US4376692A (en) | Dry etching device comprising a member for bringing a specimen into electrical contact with a grounded electrode | |
| KR100871887B1 (ko) | 유도결합 플라즈마 처리장치 | |
| JPH0322015B2 (enExample) | ||
| US2969480A (en) | Ion sources | |
| JPH07142453A (ja) | プラズマエッチング装置 | |
| JP2603722B2 (ja) | 高周波誘導結合プラズマ質量分析装置 | |
| GB2490214A (en) | System and method to eliminate radio frequency coupling between components in mass spectrometer field | |
| JPH0521245Y2 (enExample) | ||
| JPS62202450A (ja) | 高周波誘導結合プラズマ・質量分析計 | |
| JPH0215553A (ja) | 高周波誘導結合プラズマ質量分析装置 | |
| JP2591822B2 (ja) | 高周波誘導結合プラズマ質量分析装置 | |
| JPH05182597A (ja) | 高周波電源 | |
| US20240387151A1 (en) | Inductively coupled plasma apparatus with novel faraday shield | |
| JPH0521246Y2 (enExample) | ||
| JPH07211702A (ja) | 半導体製造装置 | |
| JP3123654B2 (ja) | 高周波誘導結合プラズマ質量分析計 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |