JPH03208321A - Manufacture of magnetic film - Google Patents
Manufacture of magnetic filmInfo
- Publication number
- JPH03208321A JPH03208321A JP435790A JP435790A JPH03208321A JP H03208321 A JPH03208321 A JP H03208321A JP 435790 A JP435790 A JP 435790A JP 435790 A JP435790 A JP 435790A JP H03208321 A JPH03208321 A JP H03208321A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- magnetic film
- film
- temperature
- heat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 229910005347 FeSi Inorganic materials 0.000 claims abstract description 14
- 238000010438 heat treatment Methods 0.000 claims abstract description 14
- 238000004544 sputter deposition Methods 0.000 claims abstract description 9
- 238000000034 method Methods 0.000 claims description 5
- 239000002245 particle Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 description 36
- 238000005260 corrosion Methods 0.000 description 8
- 230000007797 corrosion Effects 0.000 description 8
- 230000005415 magnetization Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000007789 gas Substances 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000000137 annealing Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 229910000702 sendust Inorganic materials 0.000 description 2
- 229910000859 α-Fe Inorganic materials 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 102100024452 DNA-directed RNA polymerase III subunit RPC1 Human genes 0.000 description 1
- 101000689002 Homo sapiens DNA-directed RNA polymerase III subunit RPC1 Proteins 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
- Physical Vapour Deposition (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野］
本発明は、ビデオテープレコーダやフレキシブルディス
ク装置に使用する磁気ヘッドに好適な磁性体膜の製造方
法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of manufacturing a magnetic film suitable for a magnetic head used in a video tape recorder or a flexible disk device.
ビデオテープレコーダやフレキシブルディスク装置に搭
載される磁気ヘッドは、磁気記録の高密度化に伴い、記
録媒体の保磁力が大きくなってきており、この記録媒体
に情報を記録するためには、飽和磁化が大きく、しかも
保磁力の小さな高透磁率の軟磁性体が要求される。また
、磁気ヘッドの信頬性の向上を図る上から、高耐食性、
高硬度の材料が要求されている。従来は、磁気ヘッド材
としてフェライト、パーマロイ、センダスト等の磁性材
が使用されている。In magnetic heads installed in video tape recorders and flexible disk drives, the coercive force of the recording medium is increasing as the density of magnetic recording increases, and in order to record information on this recording medium, saturation magnetization is required. A soft magnetic material with a high magnetic permeability and a large coercive force is required. In addition, in order to improve the reliability of the magnetic head, we also offer high corrosion resistance,
Materials with high hardness are required. Conventionally, magnetic materials such as ferrite, permalloy, and sendust have been used as magnetic head materials.
上記したように磁気ヘッド材は、磁気記録の高密度化に
伴い、高飽和磁化を有する優れた磁気特性を備えるとと
もに、高耐食性、高硬度のものが要求されている。しか
し、上記した磁気ヘッド材であるフェライトは、飽和磁
化（４πＭｌが５〜６ｋＧＬかなく、またセンダストに
しても、飽和磁化が１ｏｋＧ程度であり、高密度記録に
充分対応することができない。As described above, magnetic head materials are required to have excellent magnetic properties with high saturation magnetization, high corrosion resistance, and high hardness as magnetic recording becomes more dense. However, ferrite, which is the magnetic head material described above, has a saturation magnetization (4πMl of only 5 to 6 kGL), and even Sendust has a saturation magnetization of about 1 okG, which makes it incapable of adequately supporting high-density recording.
また、近年、Ｆｅを主成分とするＦｅＳ ｉ等の磁性体
薄膜をスパッタリングによって成膜した後、磁性体膜を
例えば６００℃に１時間以上保持し、アニール処理をし
て磁気特性の向上を図り、高耐食性、高硬度を有すると
ともに、高飽和磁化を有する磁気特性に優れた磁気ヘッ
ド材を得ることが試みられている。しかし、Ｆｅ５ｉｌ
ｌ１等は、上記の熱処理をしても保磁力が２０ｅ以上と
大きい。In addition, in recent years, after forming a magnetic thin film such as FeSi whose main component is Fe by sputtering, the magnetic film is held at 600°C for more than one hour and annealed to improve its magnetic properties. Attempts have been made to obtain magnetic head materials that have high corrosion resistance, high hardness, high saturation magnetization, and excellent magnetic properties. However, Fe5il
Even after the heat treatment described above, the coercive force of I1 and the like is as large as 20e or more.
本発明は、前記従来技術の欠点を解消するためになされ
たもので、磁性体膜の保磁力を低下させることができる
磁性体膜の製造方法を提供することを目的としている。The present invention has been made in order to eliminate the drawbacks of the prior art, and an object of the present invention is to provide a method for manufacturing a magnetic film that can reduce the coercive force of the magnetic film.
〔課題を解決するための手段および作用〕上記の目的を
達成するために、本発明に係る磁性体膜の製造方法は、
スパッタリングにより成膜した磁性体膜を、真空中また
は還元雰囲気中において温度を段階的に順次上昇させ、
複数の異なった温度において連続して熱処理を行うこと
を特徴としている。[Means and effects for solving the problem] In order to achieve the above object, the method for manufacturing a magnetic film according to the present invention includes the following steps:
The temperature of the magnetic film formed by sputtering is gradually increased in a vacuum or in a reducing atmosphere.
It is characterized by continuous heat treatment at multiple different temperatures.
上記の如（構成した未発明は、−度に高温に昇温して熱
処理をするのと異なり、結晶粒が微細状態に保たれ、保
磁力を小さくするこができ、磁気特性が向上する。Unlike heat treatment performed by raising the temperature to a high temperature of -0.0 degrees, the invention configured as described above maintains the crystal grains in a fine state, makes it possible to reduce the coercive force, and improves the magnetic properties.
上記の熱処理をする磁性体膜には、磁気特性に優れ、硬
度も大きなＦｅ５ｔ膜が好適であるが、Ｓｉに代えてＡ
ｌ、Ｇｅ、Ｇａ等を用いたものでモヨイ。ＦｅＳｉ膜は
、通常のマグネトロンスパッタリングや対句ターゲット
スパンタリング等によって成膜することができる。As the magnetic film to be subjected to the above heat treatment, Fe5t film, which has excellent magnetic properties and high hardness, is suitable;
It is complicated because it uses L, Ge, Ga, etc. The FeSi film can be formed by ordinary magnetron sputtering, couplet target sputtering, or the like.
また、ＦｅＳｉ膜と５ｉｆｔ膜とを対向スパッタリング
によって交互に積層すると、耐食性と硬度とを一層高め
ることができる。積層するＦｅ５ｊ膜の厚さは、充分な
磁気特性が得られる０、１μｍ以上であって、熱処理を
しても結晶粒の微細な状態を保持できる１、０μｍ以下
がよい。そして、ＳｉＯ□嗅の厚さは、磁性体膜の硬度
、耐食性の向上が図れる０、０１１Ｊｍ以上であって、
膜全体の４πＭｓなどの磁気特性を低下させない０゜０
５μｍ以下にすることが望ましい。Moreover, if FeSi films and 5ift films are alternately laminated by facing sputtering, corrosion resistance and hardness can be further improved. The thickness of the Fe5j film to be laminated is preferably 0.1 μm or more so that sufficient magnetic properties can be obtained, and 1.0 μm or less so that the fine state of crystal grains can be maintained even after heat treatment. The thickness of the SiO film is 0.011 Jm or more, which can improve the hardness and corrosion resistance of the magnetic film.
0°0 that does not reduce the magnetic properties such as 4πMs of the entire film
It is desirable that the thickness be 5 μm or less.
ＦｅＳｉ膜中のＳｉは、６〜１０ａＬ％が望ましい。The content of Si in the FeSi film is preferably 6 to 10 aL%.
熱処理温度は、３００’Ｃ以上、７００’Ｃ以下がよく
、例えば３００’Ｃにおいて１〜３時間保持した後、温
度を４００’Ｃ１６００’Ｃ，７００℃と段階的に順次
上昇させ、これらの各温度において１５分〜３時間程度
保持してアニール処理をする。このアニール処理は、真
空中であっても°、窒素ガス等の還元ガスや希ガスの雰
囲気中であってもよい。The heat treatment temperature is preferably 300'C or more and 700'C or less. For example, after holding at 300'C for 1 to 3 hours, the temperature is raised stepwise to 400'C, 1600'C, and 700°C, and each of these Annealing treatment is carried out by maintaining the temperature at about 15 minutes to 3 hours. This annealing treatment may be performed in a vacuum or in an atmosphere of a reducing gas such as nitrogen gas or a rare gas.
３００℃よりも低い温度で熱処理をしても、歪みの除去
や磁気特性の向上への寄与が小さい。Even if heat treatment is performed at a temperature lower than 300° C., the contribution to removing distortion and improving magnetic properties is small.
また、７００℃より高い温度において熱処理を行うと、
磁気特性が低下するおそれがある。なお、昇温時間は、
室温から３００℃までが３０分以上、また３００’Ｃか
ら４００″′Ｃ１４００’Ｃから６００’Ｃ１６００℃
がら７ｏｏ′ｃへが１５分以上であることが望ましい。In addition, when heat treatment is performed at a temperature higher than 700°C,
Magnetic properties may deteriorate. In addition, the heating time is
From room temperature to 300℃ for 30 minutes or more, and from 300'C to 400''C from 1400'C to 600'C 1600℃
It is desirable that the time from 7 o'clock to 7 o'clock is 15 minutes or more.
［実施例］
以下、本発明に係る磁性体膜の製造方法の好ましい実施
例を詳説する。[Example] Hereinafter, a preferred example of the method for manufacturing a magnetic film according to the present invention will be described in detail.
上面にＳｉチップを固定した厚さ２．．５ｍｍ、幅５０
ｍｍ、長さ１５０ｍｍのＦｅターゲットとＳ ｉ Ｏ２
膜用の厚さ５ｍｍ、ＩＯｃｍＸｌｏｃｍ（７）ＳｉＯ□
ターゲットを真空容器内に配置し、真空容器内を排気し
てｌＸｌ０−’Ｔｏｒｒ以下にした後、真空容器内にア
ルゴンガスを導入し、２×１０−’Ｔｏｒｒのアルゴン
ガス雰囲気にした。その後、Ｆｅターゲットに２５０Ｗ
の電力を投入して、対向スパッタリングにより基板上に
ＦｅＳｉ膜を０．８μｍ成膜した。次に、ＳｉＯ□ター
ゲ・ントに５００Ｗの電力を投入し、対向スパッタリン
グによってＦｅＳｉ膜の上にＳｉＯ□膜を０゜０１ｔＩ
ｍ形成した。さらに、このＳｉｎ、膜上に前記と同様に
してＦｅＳｉ膜とＳ ｉ Ｏを膜とを交互に積層し、厚
さが約５ｐｍの磁性体膜を得た。Thickness with Si chip fixed on top surface 2. ．． 5mm, width 50
mm, length 150 mm Fe target and S i O2
Thickness 5mm for membrane, IOcmXlocm(7)SiO□
The target was placed in a vacuum chamber, and after the vacuum chamber was evacuated to a pressure of 1X10-' Torr or less, argon gas was introduced into the vacuum chamber to create an argon gas atmosphere of 2 x 10-' Torr. After that, 250W was applied to the Fe target.
A FeSi film was formed to a thickness of 0.8 μm on the substrate by facing sputtering. Next, a power of 500 W was applied to the SiO□ target, and a SiO□ film was deposited on the FeSi film at 0°01tI by facing sputtering.
m was formed. Further, FeSi films and SiO films were alternately laminated on this Sin film in the same manner as described above to obtain a magnetic film with a thickness of about 5 pm.
上記の如くして得た積層した磁性体膜をｌＸｌ０−５Ｔ
ｏ ｒ ｒ−ｘ １０−’Ｔｏ ｒ ｒの真空中に配置
し、約１時間かけて室温から３００℃に昇温し、３００
’ Ｃにおいて３時間保持した。その後、約３０分かけ
て４００”Ｃに昇温し、４００℃において２時間保持、
次に３０分かけて６００℃に昇温しで６００℃において
１時間保持、さらに３０分かけてＩＤＯ′Ｃに昇温しで
７００’Ｃにおいて３０分保持するアニール処理を施し
たのち、放冷した。The laminated magnetic film obtained as described above was
Placed in a vacuum at 10-'Torr, heated from room temperature to 300°C over about 1 hour, and heated to 300°C.
'C for 3 hours. After that, the temperature was raised to 400"C over about 30 minutes, and kept at 400℃ for 2 hours.
Next, the temperature was raised to 600°C over 30 minutes, held at 600°C for 1 hour, and then annealed by raising the temperature to IDO'C over 30 minutes and held at 700'C for 30 minutes, and then allowed to cool. did.
このようにして温度を段階的に順次上げ、異なる温度で
連続的にアニール処理をしたＦｅＳ ｉ膜とＳｉＯ□膜
とからなる磁性体膜の磁気特性を測定したところ、４π
Ｍ、≧１８ｋＧ、保磁力Ｈ６＜ｌ０ｅＯ高磁気特性を有
していた。しかも、実施例による磁性体膜は、耐食性に
も優れていた。When we measured the magnetic properties of a magnetic film consisting of a FeSi film and a SiO
M, ≧18kG, coercive force H6<10eO, and had high magnetic properties. Moreover, the magnetic film according to the example had excellent corrosion resistance.
なお、実施例と同様にしてＦｅＳｉ膜とＳｉＯ２膜とを
積層したものを、６００’Ｃにおいて２時間アニール処
理をしたところ、保磁力が２０分程度と、実施例のもの
よりも保磁力が大きかった。When a FeSi film and a SiO2 film were stacked in the same manner as in the example and annealed at 600'C for 2 hours, the coercive force was about 20 minutes, which was larger than that of the example. Ta.
前記実施例においては、３ｏｏ′ｃ、４００゜Ｃ１６０
０℃１７００℃において熱処理を行った場合について説
明したが、処理温度は３００℃〜７００℃の範囲であれ
ばこれらに限定されず、例えば３００＠Ｃ１４５０℃１
６００’Ｃ，７００″′Ｃの各温度でアニールしてもよ
く、３００℃〜７００＠Ｃまで１００″Ｃごとに１〜３
時間保持してアニールをしてもよい。In the above example, 3oo'c, 400°C160
Although the case where the heat treatment is performed at 0°C and 1700°C has been described, the processing temperature is not limited to these as long as it is in the range of 300°C to 700°C, for example, 300 @ C1450°C 1
It may be annealed at each temperature of 600'C, 700''C, 1 to 3 times every 100'C from 300°C to 700@C.
Annealing may be performed by holding for a certain period of time.
〔発明の効果］
以上に説明したように、本発明によれば、スパッタリン
グによって形成した磁性体膜を、真空中または還元ガス
雰囲気中で温度を順次段階的に上昇させ、異なった温度
において連続的に熱処理をしたことにより、保磁力を小
さくするこができ、磁気特性が向上する。[Effects of the Invention] As explained above, according to the present invention, a magnetic film formed by sputtering is continuously heated at different temperatures by increasing the temperature in steps in a vacuum or in a reducing gas atmosphere. By applying heat treatment to the material, the coercive force can be reduced and the magnetic properties can be improved.
熱処理温度を、３００℃〜７００℃の範囲にすると、効
率よく歪みの除去や磁気特性の向上が図れる。そして、
磁性体膜がＦｅＳｉ膜であると、高飽和磁化、高透磁率
の磁気特性に優れた磁性体膜が得られる。また、ＦｅＳ
ｉ膜をＳｉｎ。When the heat treatment temperature is in the range of 300°C to 700°C, distortion can be efficiently removed and magnetic properties can be improved. and,
When the magnetic film is a FeSi film, a magnetic film with excellent magnetic properties such as high saturation magnetization and high magnetic permeability can be obtained. Also, FeS
Sin the i membrane.
嗅と交互に積層すると、耐食性、硬度を一層高めること
ができる。そして、積層するＦｅＳｉ膜の厚さを０．Ｉ
〜１．０μｍにすると、充分な磁気特性が得られる。ま
た、ＳｉＯ□膜の厚さを０゜Ｏ１〜０．０５μｍにする
と、磁気特性を低下させることなく耐食性、硬度を向上
できる。By layering layers alternately, corrosion resistance and hardness can be further increased. Then, the thickness of the FeSi film to be laminated was set to 0. I
When the thickness is set to 1.0 μm, sufficient magnetic properties can be obtained. Further, when the thickness of the SiO□ film is set to 0°O1 to 0.05 μm, corrosion resistance and hardness can be improved without deteriorating magnetic properties.
Claims (4)
中または還元雰囲気中において温度を段階的に順次上昇
させ、複数の異なった温度において連続して熱処理を行
うことを特徴とする磁性体膜の製造方法。(1) A magnetic film formed by sputtering is heat-treated at a plurality of different temperatures by increasing the temperature stepwise in a vacuum or in a reducing atmosphere. Production method.
する請求項１に記載の磁性体膜の製造方法。(2) The method for manufacturing a magnetic film according to claim 1, wherein the magnetic film is a FeSi film.
するＦｅＳｉ膜を、０．０１〜０．０５μｍの厚さを有
するＳｉＯ＿２膜と交互に積層したことを特徴とする請
求項２に記載の磁性体膜の製造方法。(3) The magnetic film is characterized in that FeSi films having a thickness of 0.1 to 1.0 μm are alternately laminated with SiO_2 films having a thickness of 0.01 to 0.05 μm. Item 2. A method for producing a magnetic film according to item 2.
あることを特徴とする請求項１ないし３のいずれか１に
記載の磁性体膜の製造方法。(4) The method for manufacturing a magnetic film according to any one of claims 1 to 3, wherein the temperature range of the heat treatment is 300°C to 700°C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP435790A JPH03208321A (en) | 1990-01-10 | 1990-01-10 | Manufacture of magnetic film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP435790A JPH03208321A (en) | 1990-01-10 | 1990-01-10 | Manufacture of magnetic film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03208321A true JPH03208321A (en) | 1991-09-11 |
Family
ID=11582144
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP435790A Pending JPH03208321A (en) | 1990-01-10 | 1990-01-10 | Manufacture of magnetic film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03208321A (en) |
-
1990
- 1990-01-10 JP JP435790A patent/JPH03208321A/en active Pending
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