JPH0317343B2 - - Google Patents

Info

Publication number
JPH0317343B2
JPH0317343B2 JP59219431A JP21943184A JPH0317343B2 JP H0317343 B2 JPH0317343 B2 JP H0317343B2 JP 59219431 A JP59219431 A JP 59219431A JP 21943184 A JP21943184 A JP 21943184A JP H0317343 B2 JPH0317343 B2 JP H0317343B2
Authority
JP
Japan
Prior art keywords
electron beam
cathode
anode
deflection
beam generating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59219431A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6199255A (ja
Inventor
Hirobumi Ooki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Denshi KK filed Critical Nihon Denshi KK
Priority to JP21943184A priority Critical patent/JPS6199255A/ja
Publication of JPS6199255A publication Critical patent/JPS6199255A/ja
Publication of JPH0317343B2 publication Critical patent/JPH0317343B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/07—Eliminating deleterious effects due to thermal effects or electric or magnetic fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
JP21943184A 1984-10-19 1984-10-19 ライン状電子ビ−ム発生装置 Granted JPS6199255A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21943184A JPS6199255A (ja) 1984-10-19 1984-10-19 ライン状電子ビ−ム発生装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21943184A JPS6199255A (ja) 1984-10-19 1984-10-19 ライン状電子ビ−ム発生装置

Publications (2)

Publication Number Publication Date
JPS6199255A JPS6199255A (ja) 1986-05-17
JPH0317343B2 true JPH0317343B2 (ru) 1991-03-07

Family

ID=16735288

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21943184A Granted JPS6199255A (ja) 1984-10-19 1984-10-19 ライン状電子ビ−ム発生装置

Country Status (1)

Country Link
JP (1) JPS6199255A (ru)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61139562U (ru) * 1985-02-21 1986-08-29
JPH01204340A (ja) * 1988-02-10 1989-08-16 Mitsubishi Heavy Ind Ltd 直熱式リニアフィラメント型電子銃
JPH01231250A (ja) * 1988-03-10 1989-09-14 Mitsubishi Heavy Ind Ltd 傍熱式リニアフィラメント型電子銃
JPH02113257U (ru) * 1988-05-24 1990-09-11

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56109442A (en) * 1980-02-05 1981-08-29 Nec Corp Electron beam generator

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56109442A (en) * 1980-02-05 1981-08-29 Nec Corp Electron beam generator

Also Published As

Publication number Publication date
JPS6199255A (ja) 1986-05-17

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