JPH0317343B2 - - Google Patents

Info

Publication number
JPH0317343B2
JPH0317343B2 JP59219431A JP21943184A JPH0317343B2 JP H0317343 B2 JPH0317343 B2 JP H0317343B2 JP 59219431 A JP59219431 A JP 59219431A JP 21943184 A JP21943184 A JP 21943184A JP H0317343 B2 JPH0317343 B2 JP H0317343B2
Authority
JP
Japan
Prior art keywords
electron beam
cathode
anode
deflection
beam generating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59219431A
Other languages
Japanese (ja)
Other versions
JPS6199255A (en
Inventor
Hirobumi Ooki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Denshi KK filed Critical Nihon Denshi KK
Priority to JP21943184A priority Critical patent/JPS6199255A/en
Publication of JPS6199255A publication Critical patent/JPS6199255A/en
Publication of JPH0317343B2 publication Critical patent/JPH0317343B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06Electron sources; Electron guns
    • H01J37/07Eliminating deleterious effects due to thermal effects or electric or magnetic fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、電子ビームアニーリング装置等に使
用して適当なライン状電子ビーム発生装置に関す
る。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a line-shaped electron beam generator suitable for use in an electron beam annealing device or the like.

[従来技術] 第4図は従来のライン状電子ビーム発生部を示
しており、図中1は細長い電子ビーム発生部2を
有した陰極である。該陰極1には、電源3から加
熱電流が供給され、その結果、該陰極から熱電子
が発生する。該熱電子は、該陰極1に接近して配
置された制御電極4によつて制御され、陽極5に
よつて加速されて被加熱材料(図示せず)に向け
照射される。
[Prior Art] FIG. 4 shows a conventional line-shaped electron beam generating section, in which reference numeral 1 is a cathode having an elongated electron beam generating section 2. A heating current is supplied to the cathode 1 from a power source 3, and as a result, thermoelectrons are generated from the cathode. The thermoelectrons are controlled by a control electrode 4 disposed close to the cathode 1, accelerated by the anode 5, and irradiated onto a material to be heated (not shown).

[発明が解決しようとする問題点] 上述した構成では、陰極1の電子ビーム発生部
2に電流iが流されるため、該陰極の近傍には、
紙面に垂直な方向に磁場Hが形成される。その結
果、該陰極1から発生した電子ビームは該磁場に
よつて偏向され、光軸Oからずれた方向に照射さ
れることになる。
[Problems to be Solved by the Invention] In the above-described configuration, since the current i is passed through the electron beam generating section 2 of the cathode 1, there is a
A magnetic field H is formed in a direction perpendicular to the plane of the paper. As a result, the electron beam generated from the cathode 1 is deflected by the magnetic field and is irradiated in a direction offset from the optical axis O.

本発明は上述した点に鑑みてなされたもので、
電子ビームを光軸方向に正確に照射することがで
きる電子ビーム発生装置を提供することを目的と
している。
The present invention has been made in view of the above points, and
It is an object of the present invention to provide an electron beam generator that can accurately irradiate an electron beam in the optical axis direction.

[問題点を解決するための手段] 本発明に基づくライン状電子ビーム発生装置
は、細長い電子ビーム発生部を有した陰極と、該
陰極に加熱電流を供給する手段と、該陰極から発
生する電子線ビームを制御する制御電極と、該電
子ビームを加速するための陰極とを備えた装置に
おいて、前記陰極に対し鏡筒外から光軸に対し垂
直な面上で前記陽極を移動させる手段を設けたこ
とを特徴としている。
[Means for Solving the Problems] A linear electron beam generating device based on the present invention includes a cathode having an elongated electron beam generating section, a means for supplying a heating current to the cathode, and an electron beam generator generated from the cathode. In an apparatus comprising a control electrode for controlling a line beam and a cathode for accelerating the electron beam, means is provided for moving the anode from outside the lens barrel with respect to the cathode on a plane perpendicular to the optical axis. It is characterized by

[実施例] 以下、本発明の実施例を添附図面に基づいて詳
述する。
[Example] Hereinafter, an example of the present invention will be described in detail based on the accompanying drawings.

第2図において、第1図と同一構成要素に対し
ては同一番号を付しその詳細な説明は省略する。
この実施例において、陽極5は光軸Oに対して垂
直なX、Y2方向に移動機構6によつて移動可能
に配置されている。第2図は陰極1の電子ビーム
発生部2と陽極5の開口5aとの関係を示してい
る。該開口5aの幅および流さは該発生部2のそ
れより長くされており、該陽極5は、X方向には
±a、Y方向には±b該移動機構6によつて移動
可能にされている。前述した如く、該陰極への電
流iの供給により、該陰極1下部には電子ビーム
を偏向する磁場が形成され、該陰極1より発生し
た電子ビームは該磁場によつて偏向されるもの
の、この実施例では、該陽極5の静電偏向作用に
よつて該磁場による電子ビームの偏向は補償され
る。すなわち、該陽極の位置が該電子ビームの偏
向の程度によつて移動され、該磁場による偏向の
向きと逆の向きに、該電子ビームは該陽極の静電
偏向場によつて偏向されることから、電子ビーム
は光軸Oに沿つて照射されることになる。
In FIG. 2, the same components as those in FIG. 1 are given the same numbers and detailed explanation thereof will be omitted.
In this embodiment, the anode 5 is arranged so as to be movable by a moving mechanism 6 in the X and Y2 directions perpendicular to the optical axis O. FIG. 2 shows the relationship between the electron beam generating section 2 of the cathode 1 and the aperture 5a of the anode 5. The width and flow of the opening 5a are made longer than those of the generation section 2, and the anode 5 is made movable by the moving mechanism 6 by ±a in the X direction and ±b in the Y direction. There is. As mentioned above, by supplying the current i to the cathode, a magnetic field is formed below the cathode 1 to deflect the electron beam, and although the electron beam generated from the cathode 1 is deflected by the magnetic field, this In the embodiment, the deflection of the electron beam by the magnetic field is compensated for by the electrostatic deflection action of the anode 5. That is, the position of the anode is moved depending on the degree of deflection of the electron beam, and the electron beam is deflected by the electrostatic deflection field of the anode in a direction opposite to the direction of deflection by the magnetic field. Therefore, the electron beam is irradiated along the optical axis O.

[効果] 以上詳述した如く、本発明においては、細長い
電子ビーム発生部に電流が長されることに伴う磁
場による電子ビームの偏向を補償することがで
き、ライン状の電子ビームを目的部分へ正確に照
射することが可能となる。又、本発明では、陰極
に対し陽極を移動させるメカ的機構により、陰極
への加熱電流の供給に基づいて発生する磁場によ
る電子ビームの偏向を補償しているので、制御電
極と陽極の間、若しくは陽極の直下に、偏向コイ
ル、偏向電極若しくは電磁石等の電気的機構を設
ける場合に比べ、種々のメリツトがある。即ち、
前記電気的機構は外部ノイズの影響を受けるが、
本発明のメカ的機構は該外部ノイズの影響を受け
ない。前記電気的機構は制御電極と陽極の間、若
しくは陽極の直下に補償機構を設ける為に余計に
空間を広げる必要があるが、本発明のメカ的機構
は鏡筒外から陽極を駆動出来るので、鏡筒外の駆
動機構と鏡筒内の陽極を接続する移動棒が鏡筒内
に設けられるだけなので、制御電極と陽極の間、
若しくは陽極の直下に特に広い空間を設ける必要
がない。
[Effect] As detailed above, in the present invention, it is possible to compensate for the deflection of the electron beam due to the magnetic field caused by the length of the current in the elongated electron beam generating section, and to direct the linear electron beam to the target area. It becomes possible to irradiate accurately. Furthermore, in the present invention, the deflection of the electron beam due to the magnetic field generated based on the supply of heating current to the cathode is compensated for by a mechanical mechanism that moves the anode relative to the cathode. Alternatively, there are various advantages over the case where an electric mechanism such as a deflection coil, a deflection electrode, or an electromagnet is provided directly under the anode. That is,
The electrical mechanism is affected by external noise,
The mechanical mechanism of the present invention is not affected by such external noise. The electrical mechanism described above requires extra space to provide a compensation mechanism between the control electrode and the anode or directly below the anode, but the mechanical mechanism of the present invention can drive the anode from outside the lens barrel. Since only a moving rod is provided inside the lens barrel that connects the drive mechanism outside the lens barrel and the anode inside the lens barrel, there is no space between the control electrode and the anode.
Alternatively, there is no need to provide a particularly large space directly under the anode.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例を示す図、第2図は
第1図の陽極と陰極の電子ビーム発生部との関係
を示す図、第3図は従来のライン状電子ビーム発
生装置を示す図である。 1……陰極、2……電子ビーム発生部、3……
電源、4……制御電極、5……陽極、6……移動
機構。
FIG. 1 is a diagram showing an embodiment of the present invention, FIG. 2 is a diagram showing the relationship between the anode and cathode electron beam generating parts of FIG. 1, and FIG. 3 is a diagram showing a conventional linear electron beam generator. FIG. 1... Cathode, 2... Electron beam generating section, 3...
Power source, 4...control electrode, 5...anode, 6...movement mechanism.

Claims (1)

【特許請求の範囲】[Claims] 1 細長い電子ビーム発生部を有した陰極と、該
陰極に加熱電流を供給する手段と、該陰極から発
生する電子ビームを制御する制御電極と、該電子
ビームを加速するための陽極とを備えたライン状
電子ビーム発生装置において、前記陰極に対し鏡
筒外から光軸に対し垂直な面上で前記陽極を移動
させる手段を設けたことを特徴とするライン状電
子ビーム発生装置。
1. Equipped with a cathode having an elongated electron beam generating section, means for supplying a heating current to the cathode, a control electrode for controlling the electron beam generated from the cathode, and an anode for accelerating the electron beam. 1. A line-shaped electron beam generating device, characterized in that a means for moving the anode from outside the lens barrel to the cathode on a plane perpendicular to the optical axis is provided.
JP21943184A 1984-10-19 1984-10-19 Line-form electron beam generator Granted JPS6199255A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21943184A JPS6199255A (en) 1984-10-19 1984-10-19 Line-form electron beam generator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21943184A JPS6199255A (en) 1984-10-19 1984-10-19 Line-form electron beam generator

Publications (2)

Publication Number Publication Date
JPS6199255A JPS6199255A (en) 1986-05-17
JPH0317343B2 true JPH0317343B2 (en) 1991-03-07

Family

ID=16735288

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21943184A Granted JPS6199255A (en) 1984-10-19 1984-10-19 Line-form electron beam generator

Country Status (1)

Country Link
JP (1) JPS6199255A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61139562U (en) * 1985-02-21 1986-08-29
JPH01204340A (en) * 1988-02-10 1989-08-16 Mitsubishi Heavy Ind Ltd Directly heated linear filament type electron gun
JPH01231250A (en) * 1988-03-10 1989-09-14 Mitsubishi Heavy Ind Ltd Indirectly-heated linear filament type electron gun
JPH02113257U (en) * 1988-05-24 1990-09-11

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56109442A (en) * 1980-02-05 1981-08-29 Nec Corp Electron beam generator

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56109442A (en) * 1980-02-05 1981-08-29 Nec Corp Electron beam generator

Also Published As

Publication number Publication date
JPS6199255A (en) 1986-05-17

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