JPH06176723A - Electron beam generating device - Google Patents
Electron beam generating deviceInfo
- Publication number
- JPH06176723A JPH06176723A JP32641792A JP32641792A JPH06176723A JP H06176723 A JPH06176723 A JP H06176723A JP 32641792 A JP32641792 A JP 32641792A JP 32641792 A JP32641792 A JP 32641792A JP H06176723 A JPH06176723 A JP H06176723A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- photocathode
- generating device
- electron
- irradiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Sources, Ion Sources (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、工業用の電子線発生装
置に係り、特に、金属材料加工等の任意断面形状の電子
線が必要な電子線発生施設に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an industrial electron beam generator, and more particularly to an electron beam generating facility which requires an electron beam having an arbitrary cross section such as metal material processing.
【０００２】[0002]
【従来の技術】電子線による金属材料及びその化合物、
特に高融点金属，酸化物等に溶解，精製または溶接等の
加工を施す際に、任意断面形状の強力な電子線発生装置
が必要となる。従来は熱陰極から発生する電子線の通路
にスリットを設ける、又は、一つの電子銃中に複数個の
陰極を配置し、それぞれ独立にオン・オフして所要の断
面形状を有する電子線を形成させていた。従来例は、特
願昭38−10100 号明細書に記載されている。2. Description of the Related Art Metallic materials by electron beams and their compounds,
In particular, when melting, refining, or welding a refractory metal or oxide, a powerful electron beam generator with an arbitrary cross-sectional shape is required. Conventionally, a slit is provided in the passage of the electron beam generated from the hot cathode, or a plurality of cathodes are arranged in one electron gun, and they are turned on and off independently to form an electron beam having a required cross-sectional shape. I was letting it. A conventional example is described in Japanese Patent Application No. 38-10100.
【０００３】[0003]
【発明が解決しようとする課題】スリットを用いる電子
線発生装置では電子線の断面形状を変更するためにスリ
ットの形状を変更しなければならない。また、複数個の
陰極を用いる電子線発生装置でも陰極の個数および配置
と各陰極の形状によって電子線の断面形状の自由度は制
限される。In the electron beam generator using the slit, the shape of the slit must be changed in order to change the sectional shape of the electron beam. Further, even in the electron beam generator using a plurality of cathodes, the degree of freedom of the electron beam cross-sectional shape is limited by the number and arrangement of the cathodes and the shape of each cathode.
【０００４】本発明の目的は、装置の変更無しに任意の
断面形状の電子線を生成することができる電子線発生装
置を提供することにある。It is an object of the present invention to provide an electron beam generator which can generate an electron beam having an arbitrary cross-sectional shape without changing the device.
【０００５】[0005]
【課題を解決するための手段】本発明の特徴は、光陰極
が光照射を受けた部分のみ電子を放出することを利用
し、所望の断面形状の電子線が得られるようにレーザ光
の光陰極上の照射位置変更および照射形状の制御を行う
ことによって、装置の変更無しに任意の断面形状の電子
線を生成することができる電子線発生装置が提供され
る。The feature of the present invention is that the photocathode emits electrons only in the portion irradiated with light, and the photocathode of the laser beam is generated so that an electron beam having a desired cross-sectional shape can be obtained. Provided is an electron beam generator capable of generating an electron beam having an arbitrary cross-sectional shape without changing the apparatus by changing the irradiation position of the finest and controlling the irradiation shape.
【０００６】[0006]
【作用】本発明の電子線発生装置を用いれば、装置を全
く変更せずレーザ光の制御だけで電子線断面形状、及
び、電子線のオン・オフを制御できるので、金属材料等
の加工作業の効率を著しく向上させることができる。When the electron beam generator of the present invention is used, the electron beam cross-sectional shape and the on / off of the electron beam can be controlled only by controlling the laser beam without changing the device at all. The efficiency of can be significantly improved.
【０００７】[0007]
【実施例】以下、本発明の実施例を図面に基づいて説明
する。図１は本発明の電子線発生装置の一実施例を上か
ら見た断面図であり、光陰極１，レーザ光発生装置２，
陽極３１から構成される。この光陰極を用いる電子線発
生装置では、レーザ光発生装置２から光陰極１に照射さ
れるレーザ光２１によって発生した電子群が陽・陰極間
にかけられた高電圧によって引き出されて電子線４とな
る。図２は本発明の電子線発生装置の陰極１を電子線射
出方向から見た説明図であり、陰極面上のレーザ光照射
部２２も併せて示してある。本発明の電子線発生装置で
は、レーザ光２の位置、又は、断面形状を制御して任意
形状のレーザ光照射部２２を陰極面上に形成することに
よって任意断面形状の電子線を得ることができる。Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a cross-sectional view of an embodiment of the electron beam generator of the present invention seen from above, which includes a photocathode 1, a laser light generator 2,
It is composed of the anode 31. In the electron beam generator using this photocathode, the electron group generated by the laser beam 21 applied to the photocathode 1 from the laser beam generator 2 is extracted by the high voltage applied between the positive and negative electrodes and the electron beam 4 is emitted. Become. FIG. 2 is an explanatory view of the cathode 1 of the electron beam generator of the present invention seen from the electron beam emission direction, and also shows the laser beam irradiation section 22 on the cathode surface. In the electron beam generator of the present invention, an electron beam having an arbitrary cross-sectional shape can be obtained by controlling the position of the laser light 2 or the cross-sectional shape to form the laser light irradiation part 22 having an arbitrary shape on the cathode surface. it can.
【０００８】図３は、複数台のレーザ光発生装置によっ
て電子線を発生させる本発明の実施例である。FIG. 3 shows an embodiment of the present invention in which an electron beam is generated by a plurality of laser light generators.
【０００９】図４は、図１の陽極３１の代わりに高周波
空胴３２中の電界によって電子線４を引き出す本発明の
電子線発生装置の実施例である。FIG. 4 shows an embodiment of the electron beam generator of the present invention in which the electron beam 4 is extracted by the electric field in the high frequency cavity 32 instead of the anode 31 of FIG.
【００１０】[0010]
【発明の効果】本発明によれば、装置を全く変更せずレ
ーザ光の制御だけで電子線断面形状、及び、電子線のオ
ン・オフを制御でき、金属材料等の加工作業の効率を著
しく向上させることができる。According to the present invention, the electron beam cross-sectional shape and the on / off of the electron beam can be controlled only by controlling the laser light without changing the apparatus at all, and the efficiency of the working operation of metal materials and the like can be significantly improved. Can be improved.
【図１】本発明の電子線発生装置の一実施例の断面図。FIG. 1 is a sectional view of an embodiment of an electron beam generator of the present invention.
【図２】本発明の電子線発生装置の光陰極面上のレーザ
光照射部の説明図。FIG. 2 is an explanatory diagram of a laser beam irradiation section on the photocathode surface of the electron beam generator of the present invention.
【図３】本発明の電子線発生装置の第二の実施例の断面
図。FIG. 3 is a sectional view of a second embodiment of the electron beam generator of the present invention.
【図４】本発明の電子線発生装置の第三の実施例の断面
図。FIG. 4 is a sectional view of a third embodiment of the electron beam generator of the present invention.
１…光陰極、２…レーザ光発生装置、４…電子線、２１
…レーザ光、２２…陰極面上のレーザ光照射部、３１…
陽極、３２…高周波空洞。1 ... Photocathode, 2 ... Laser light generator, 4 ... Electron beam, 21
... laser light, 22 ... laser light irradiation part on cathode surface, 31 ...
Anode, 32 ... High frequency cavity.
Claims (2)
子線取り出し口を有する陽極、及びレーザ光発生装置か
ら構成される電子線発生装置において、レーザ光の光陰
極上の照射位置、及び、照射形状が制御可能であること
を特徴とする電子線発生装置。1. An electron beam generator comprising a photocathode for generating electrons by light irradiation, an anode having an electron beam outlet, and a laser light generator, and a laser beam irradiation position on the photocathode and irradiation. An electron beam generator having a controllable shape.
周波空洞、及びレーザ光発生装置から構成される電子線
発生装置において、レーザ光の光陰極上の照射位置、及
び、照射形状が制御可能であることを特徴とする電子線
発生装置。2. An electron beam generator comprising a photocathode that generates electrons by light irradiation, a high-frequency cavity, and a laser light generator, and the irradiation position of laser light on the photocathode and the irradiation shape can be controlled. An electron beam generator characterized by being present.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32641792A JPH06176723A (en) | 1992-12-07 | 1992-12-07 | Electron beam generating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32641792A JPH06176723A (en) | 1992-12-07 | 1992-12-07 | Electron beam generating device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH06176723A true JPH06176723A (en) | 1994-06-24 |
Family
ID=18187563
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32641792A Pending JPH06176723A (en) | 1992-12-07 | 1992-12-07 | Electron beam generating device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06176723A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012506122A (en) * | 2009-08-21 | 2012-03-08 | ポステック アカデミー−インダストリー ファウンデーション | Electron beam generator |
| WO2012043475A1 (en) | 2010-09-27 | 2012-04-05 | 大学共同利用機関法人高エネルギー加速器研究機構 | Photo-cathode high-frequency electron-gun cavity apparatus |
| WO2017071878A1 (en) * | 2015-10-30 | 2017-05-04 | Asml Netherlands B.V. | Electron source, with photocathode illuminated off-axis |
-
1992
- 1992-12-07 JP JP32641792A patent/JPH06176723A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012506122A (en) * | 2009-08-21 | 2012-03-08 | ポステック アカデミー−インダストリー ファウンデーション | Electron beam generator |
| US8736169B2 (en) | 2009-08-21 | 2014-05-27 | Postech Academy-Industry Foundation | Electron beam generating apparatus |
| WO2012043475A1 (en) | 2010-09-27 | 2012-04-05 | 大学共同利用機関法人高エネルギー加速器研究機構 | Photo-cathode high-frequency electron-gun cavity apparatus |
| US9224571B2 (en) | 2010-09-27 | 2015-12-29 | Inter-University Research Institute Corporation | Photocathode high-frequency electron-gun cavity apparatus |
| WO2017071878A1 (en) * | 2015-10-30 | 2017-05-04 | Asml Netherlands B.V. | Electron source, with photocathode illuminated off-axis |
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