JPS61140041A - Multi-spectral x-ray generating tube - Google Patents
Multi-spectral x-ray generating tubeInfo
- Publication number
- JPS61140041A JPS61140041A JP59261435A JP26143584A JPS61140041A JP S61140041 A JPS61140041 A JP S61140041A JP 59261435 A JP59261435 A JP 59261435A JP 26143584 A JP26143584 A JP 26143584A JP S61140041 A JPS61140041 A JP S61140041A
- Authority
- JP
- Japan
- Prior art keywords
- target
- deflection
- rays
- generating tube
- ray generating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
- H01J35/06—Cathodes
- H01J35/065—Field emission, photo emission or secondary emission cathodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/14—Arrangements for concentrating, focusing, or directing the cathode ray
- H01J35/153—Spot position control
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/22—X-ray tubes specially designed for passing a very high current for a very short time, e.g. for flash operation
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は単一のX線発生管で複数の特性X線を発生する
ことのできるマルチスペクトルX線発生管に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a multispectral X-ray generating tube that can generate a plurality of characteristic X-rays with a single X-ray generating tube.
本発明によるマルチスペクトルX線発生管は結晶回折に
よる結晶構造の時間的変化の解析とか、高時間分解の計
測等に利用できる。The multispectral X-ray generator tube according to the present invention can be used for analysis of temporal changes in crystal structure by crystal diffraction, high time-resolved measurements, etc.
(従来の技術)
通常のX線発生装置はカソードをヒータで加熱し、熱電
子を発生させ、静電集束系で細い電子ビームを形成し、
ターゲットを照射してX線を発生させるように構成され
ている。(Prior art) A normal X-ray generator heats a cathode with a heater to generate thermoelectrons, and forms a thin electron beam with an electrostatic focusing system.
It is configured to irradiate a target and generate X-rays.
熱陰極形の電極は高い周波数応答に通していないので鋭
いパルス状のX線を得たいという要請に応えることがで
きない。Hot cathode type electrodes do not allow high frequency response and cannot meet the demand for obtaining sharp pulsed X-rays.
この要請に応えるために本件発明者は光電陰極を電子源
とするX線発生管(特願昭58−153663)をすで
に提案している。In order to meet this demand, the inventor of the present invention has already proposed an X-ray generating tube (Japanese Patent Application No. 153,663/1982) using a photocathode as an electron source.
この提案によれば、光電子銃から発生した電子ビームは
、光電子銃に対向した他端側に配置されたX線ターゲッ
トに衝突させられ、そのターゲット材料から固有の特性
X線を発生させる。チタン(T i )をターゲ・ノド
としたときに発生する特性X線の例を第4図に示す。According to this proposal, an electron beam generated from a photoelectron gun is made to collide with an X-ray target disposed at the other end facing the photoelectron gun, thereby generating characteristic X-rays from the target material. FIG. 4 shows an example of characteristic X-rays generated when titanium (T i ) is used as the target.
前記提案に係るX線発生管は、光電子銃(光電陰極)を
使用しているから、前記光電陰極をレーザ光源等によっ
て励起することにより、鋭いパルス伏の特性X線を得る
ことができるという優れた特徴がある。Since the X-ray generating tube according to the above proposal uses a photoelectron gun (photocathode), it has the advantage of being able to obtain characteristic X-rays with a sharp pulse curve by exciting the photocathode with a laser light source or the like. It has some characteristics.
ところが近時、数種類の特性X線を利用して測定を行い
たいという要請があり、そのような場合にはクーゲット
のf!類の異なる前記X線発生管を複数本用意する必要
がある。However, recently there have been requests to perform measurements using several types of characteristic X-rays, and in such cases, Cooget's f! It is necessary to prepare a plurality of X-ray generating tubes of different types.
(発明の目的)
本発明の目的は、一本のX線発生管で多数の特性X線を
発生できるようにしたマルチスペクトルX線発生管を提
供することにある。(Object of the Invention) An object of the present invention is to provide a multispectral X-ray generating tube that can generate a large number of characteristic X-rays with a single X-ray generating tube.
(発明の構成)
前記目的を達成するために、本発明によるマルチスペク
トルX線発生管は、真空容器と、前記真空容器内に形成
された光電子放出層と、前記光電子放出層の発生した光
電子を収束して、電子ビームとして一定方向に投射する
電子レンズと、前記電子ビームの到来する方向に向けて
複数種類のターゲット要素金属を配列して形成したX線
ターゲットと、前記電子ビームの投射方向を制御して前
記X線ターゲットの任意の要素金属を照射するように前
記電子ビームを偏向する偏向器とから構成されている。(Structure of the Invention) In order to achieve the above object, a multispectral X-ray generating tube according to the present invention includes a vacuum vessel, a photoelectron emission layer formed in the vacuum vessel, and photoelectrons generated by the photoelectron emission layer. an electron lens that converges and projects the electron beam in a certain direction; an X-ray target formed by arranging a plurality of types of target element metals toward the direction in which the electron beam arrives; and a deflector that deflects the electron beam so as to control and irradiate any elemental metal of the X-ray target.
(実施例)
以下、図面等を参照して本発明をさらに詳しく説明する
。(Example) Hereinafter, the present invention will be described in more detail with reference to the drawings and the like.
第1図は本発明によるマルチスペクトルX線発生管の第
1の実施例を示す断面図、第2図は前記実 1
施例の偏向電極とターゲット要素金属との関係を示す断
面図である。FIG. 1 is a sectional view showing a first embodiment of the multispectral X-ray generating tube according to the present invention, and FIG.
FIG. 3 is a cross-sectional view showing the relationship between the deflection electrode and the target element metal in the example.
直空容器1の内面には光電子放出層2が形成されている
。A photoelectron emission layer 2 is formed on the inner surface of the open container 1 .
光電子放出層照射光源からの光束10で照射されて、前
記光電子放出層2から放出された光電子は、集束電極4
によって発生させられている集束電界により集束されて
偏向空間に進む。前記光電子放出層2の形成されている
面に対向する面にX線を透過させるベリリウム(Be)
Niのマルチターゲツト面5が設けられている。The photoelectrons emitted from the photoelectron emission layer 2 by being irradiated with the light beam 10 from the photoelectron emission layer irradiation light source are transferred to the focusing electrode 4.
The beam is focused by the focusing electric field generated by the beam and propagates into the deflection space. Beryllium (Be) that allows X-rays to pass through the surface opposite to the surface on which the photoelectron emission layer 2 is formed.
A multi-target surface 5 of Ni is provided.
この面にはターゲット要素金属6a、6b、5cが図示
のように1列に配列されている。On this surface, target element metals 6a, 6b, and 5c are arranged in one row as shown.
偏向電極3a、3b間には偏向電圧源7から偏向電圧が
印加されている。集束電極4によって集束された電子ビ
ームは、偏向電極3a、3b間で偏向させられる。A deflection voltage is applied from a deflection voltage source 7 between the deflection electrodes 3a and 3b. The electron beam focused by the focusing electrode 4 is deflected between the deflection electrodes 3a and 3b.
偏向電圧源7の偏向電圧を変更することにより、任意の
要素金属に電子ビームを向けることができる。電子ビー
ムで照射された要素金属はその金属固有の特性X線を放
出する。By changing the deflection voltage of the deflection voltage source 7, the electron beam can be directed to any element metal. The elemental metal irradiated with the electron beam emits characteristic X-rays specific to that metal.
この実施例は以下の金属中から3種類を選んで使用して
いる。それぞれの金属の特性X線のエネルギーを示しで
ある。In this example, three types of metals are selected from the following metals. It shows the characteristic X-ray energy of each metal.
チタン(Ti) 4.5 KeVバナジュウム
(V) 4.96KeVクロム(Cr) 5
.42KeV鉄(Fe) 6.40KeV
コバルト (Co) 6.92KeV二y’rル
(Ni) 7.47KeVail (Cu)
8.04KeVこの特性X線の時間幅は、光電
子放出層を照射する光のパルス幅の程度に短くできる。Titanium (Ti) 4.5 KeV Vanadium (V) 4.96 KeV Chromium (Cr) 5
.. 42KeV Iron (Fe) 6.40KeV Cobalt (Co) 6.92KeV Ni'r (Ni) 7.47KeVail (Cu)
8.04 KeV The time width of this characteristic X-ray can be made as short as the pulse width of the light that irradiates the photoelectron emission layer.
したがって、超短レーザ光を使った場合の超短X線パル
スから、直流光を照射した時の直流X線まで、任意にコ
ントロールが可能である。Therefore, it is possible to arbitrarily control from ultra-short X-ray pulses using ultra-short laser light to DC X-rays when direct current light is irradiated.
第3図は本発明によるマルチスペクトルX線発生管の第
2の実施例の偏向電極と金属ターゲット要素との関係を
示す断面図である。FIG. 3 is a sectional view showing the relationship between the deflection electrode and the metal target element of a second embodiment of the multispectral X-ray generating tube according to the present invention.
この実施例は垂直偏向電極3a、3bと、水平偏向電極
3c、3dを用い、電子ビームを2次元的に偏向できる
ようにしたものである。This embodiment uses vertical deflection electrodes 3a, 3b and horizontal deflection electrodes 3c, 3d, so that the electron beam can be deflected two-dimensionally.
X線を透過させるヘリリウム(Be)板のマルチターゲ
ツト面5には要素金属6e〜6pが図示のように平面的
に配列されている。On a multi-target surface 5 of a helium (Be) plate that transmits X-rays, elemental metals 6e to 6p are arranged in a plane as shown.
偏向電極33〜3d間には図示を省略した偏向電圧源7
から偏向電圧が印加されており、電子ビームは2次元的
に偏向させられる。A deflection voltage source 7 (not shown) is provided between the deflection electrodes 33 to 3d.
A deflection voltage is applied to the electron beam, and the electron beam is deflected two-dimensionally.
これにより、任意の要素金属を逐次選択して異なる特性
X線を得ることができる。Thereby, different characteristic X-rays can be obtained by sequentially selecting arbitrary element metals.
(変形例)
以上詳しく説明した実施例につき本発明の範囲内で種々
の変形を施すことができる。(Modifications) Various modifications can be made to the embodiments described in detail above within the scope of the present invention.
前記各実施例は、静電偏向形の偏向器を用いたが、良く
知られている電磁偏向形の偏向器を用いることもできる
。In each of the above embodiments, an electrostatic deflection type deflector is used, but a well-known electromagnetic deflection type deflector can also be used.
(発明の効果)
以上詳しく説明したように、本発明によるマルチスペク
トルX線発生管では、多数の異なった特性X線が、一本
のX線管で得られる。(Effects of the Invention) As described in detail above, in the multispectral X-ray generating tube according to the present invention, a large number of different characteristic X-rays can be obtained with a single X-ray tube.
偏向器により逐次界なる要素金属を高速で選択すること
ができるから、従来不可能であった高い時間分解の計測
が可能゛となる。Since elemental metals in the field can be selected at high speed sequentially using the deflector, highly time-resolved measurements, which were previously impossible, become possible.
また結晶回折による結晶構造の時間的変化の解析等にも
利用できる。It can also be used to analyze temporal changes in crystal structure using crystal diffraction.
第1図は本発明によるマルチスペクトルX線発生管の第
1の実施例を示す断面図である。
第2図は前記実施例の偏向電極とターゲット要素金属と
の関係を示す断面図である。
第3図は本発明によるマルチスペクトルX線発生管の第
2の実施例の偏向電極とターゲット要素金属との関係を
示す断面図である。
第4図は特性X線スペクトルの1例を示すグラフである
。
1・・・真空容器
2・・・光電子放出層
3・・・偏向器
3a、3b、3d、3e−−・偏向電極
14・・・集束電極
5・・・マルチターゲツト面
6a−c、5 e −p・・・ターゲット要素金属7・
・・偏向電源FIG. 1 is a sectional view showing a first embodiment of a multispectral X-ray generating tube according to the present invention. FIG. 2 is a sectional view showing the relationship between the deflection electrode and the target element metal in the embodiment. FIG. 3 is a sectional view showing the relationship between the deflection electrode and the target element metal in a second embodiment of the multispectral X-ray generating tube according to the present invention. FIG. 4 is a graph showing an example of a characteristic X-ray spectrum. 1... Vacuum container 2... Photoelectron emission layer 3... Deflector 3a, 3b, 3d, 3e --- Deflection electrode
14...Focusing electrode 5...Multi-target surfaces 6a-c, 5e-p...Target element metal 7.
・・Deflection power supply
Claims (4)
放出層と、前記光電子放出層の発生した光電子を収束し
て、電子ビームとして一定方向に投射する電子レンズと
、前記電子ビームの到来する方向に向けて複数種類のタ
ーゲット要素金属を配列して形成したX線ターゲットと
、前記電子ビームの投射方向を制御して前記X線ターゲ
ットの任意の要素金属を照射するように前記電子ビーム
を偏向する偏向器とから構成したマルチスペクトルX線
発生管。(1) A vacuum container, a photoelectron emission layer formed in the vacuum container, an electron lens that converges photoelectrons generated by the photoelectron emission layer and projects them in a fixed direction as an electron beam, and arrival of the electron beam. an X-ray target formed by arranging a plurality of types of target element metals in the direction of A multispectral X-ray generating tube consisting of a deflector that deflects.
特許請求の範囲第1項記載のマルチスペクトルX線発生
管。(2) The multispectral X-ray generating tube according to claim 1, wherein the deflector is an electrostatic deflector or an electromagnetic deflector.
許請求の範囲第1項記載のマルチスペクトルX線発生管
。(3) The multispectral X-ray generating tube according to claim 1, wherein the deflector is a one-dimensional or two-dimensional deflector.
、Co、Ni、Cuから選択されたものである特許請求
の範囲第1項記載のマルチスペクトルX線発生管。(4) The target element metal is Ti, V, Cr, Fe.
2. The multispectral X-ray generating tube according to claim 1, wherein the tube is selected from , Co, Ni, and Cu.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59261435A JPS61140041A (en) | 1984-12-11 | 1984-12-11 | Multi-spectral x-ray generating tube |
DE19853543598 DE3543598A1 (en) | 1984-12-11 | 1985-12-10 | Multi-spectrum X-ray emitter |
FR858518314A FR2574591B1 (en) | 1984-12-11 | 1985-12-11 | MULTI-SPECTRUM X-RAY TUBE |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59261435A JPS61140041A (en) | 1984-12-11 | 1984-12-11 | Multi-spectral x-ray generating tube |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61140041A true JPS61140041A (en) | 1986-06-27 |
Family
ID=17361843
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59261435A Pending JPS61140041A (en) | 1984-12-11 | 1984-12-11 | Multi-spectral x-ray generating tube |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS61140041A (en) |
DE (1) | DE3543598A1 (en) |
FR (1) | FR2574591B1 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6516048B2 (en) | 2001-02-01 | 2003-02-04 | Hamamatsu Photonics K.K. | X-ray generator |
JP2009277462A (en) * | 2008-05-14 | 2009-11-26 | Bruker Axs Kk | X-ray generating device |
WO2012063379A1 (en) * | 2010-11-08 | 2012-05-18 | 株式会社ライフ技術研究所 | Field emission apparatus and hand-held nondestructive inspection apparatus |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE202005017496U1 (en) * | 2005-11-07 | 2007-03-15 | Comet Gmbh | Target for a microfocus or nanofocus X-ray tube |
DE102011079179A1 (en) * | 2011-07-14 | 2013-01-17 | Siemens Aktiengesellschaft | Monochromatic X-ray source |
DE102020134487A1 (en) | 2020-12-21 | 2022-06-23 | Helmut Fischer GmbH Institut für Elektronik und Messtechnik | X-ray source and method of operation therefor |
DE102020134488A1 (en) | 2020-12-21 | 2022-06-23 | Helmut Fischer GmbH Institut für Elektronik und Messtechnik | X-ray source and method of operation therefor |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52142984A (en) * | 1976-05-24 | 1977-11-29 | Yokogawa Hokushin Electric Corp | X-ray generator |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2298335A (en) * | 1940-09-10 | 1942-10-13 | Gen Electric X Ray Corp | Multiple target anode |
BE475842A (en) * | 1942-04-25 | |||
US3033984A (en) * | 1959-02-17 | 1962-05-08 | United States Steel Corp | Apparatus for increasing the energy of x-rays |
FR2076604A5 (en) * | 1970-01-21 | 1971-10-15 | Commissariat Energie Atomique | |
US4048496A (en) * | 1972-05-08 | 1977-09-13 | Albert Richard D | Selectable wavelength X-ray source, spectrometer and assay method |
GB2133208B (en) * | 1982-11-18 | 1986-02-19 | Kratos Ltd | X-ray sources |
-
1984
- 1984-12-11 JP JP59261435A patent/JPS61140041A/en active Pending
-
1985
- 1985-12-10 DE DE19853543598 patent/DE3543598A1/en active Granted
- 1985-12-11 FR FR858518314A patent/FR2574591B1/en not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52142984A (en) * | 1976-05-24 | 1977-11-29 | Yokogawa Hokushin Electric Corp | X-ray generator |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6516048B2 (en) | 2001-02-01 | 2003-02-04 | Hamamatsu Photonics K.K. | X-ray generator |
JP2009277462A (en) * | 2008-05-14 | 2009-11-26 | Bruker Axs Kk | X-ray generating device |
WO2012063379A1 (en) * | 2010-11-08 | 2012-05-18 | 株式会社ライフ技術研究所 | Field emission apparatus and hand-held nondestructive inspection apparatus |
Also Published As
Publication number | Publication date |
---|---|
DE3543598C2 (en) | 1987-07-16 |
FR2574591A1 (en) | 1986-06-13 |
FR2574591B1 (en) | 1990-01-19 |
DE3543598A1 (en) | 1986-06-12 |
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