JPS61140042A - Reflecting type x-ray generating tube - Google Patents

Reflecting type x-ray generating tube

Info

Publication number
JPS61140042A
JPS61140042A JP59261437A JP26143784A JPS61140042A JP S61140042 A JPS61140042 A JP S61140042A JP 59261437 A JP59261437 A JP 59261437A JP 26143784 A JP26143784 A JP 26143784A JP S61140042 A JPS61140042 A JP S61140042A
Authority
JP
Japan
Prior art keywords
target
anode
vessel
ray
container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP59261437A
Other languages
Japanese (ja)
Inventor
Koichiro Oba
大庭 弘一郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hamamatsu Photonics KK
Original Assignee
Hamamatsu Photonics KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hamamatsu Photonics KK filed Critical Hamamatsu Photonics KK
Priority to JP59261437A priority Critical patent/JPS61140042A/en
Priority to DE19853543591 priority patent/DE3543591A1/en
Priority to FR858518315A priority patent/FR2574592B1/en
Publication of JPS61140042A publication Critical patent/JPS61140042A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00X-ray tubes
    • H01J35/02Details
    • H01J35/04Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/06Cathodes
    • H01J35/065Field emission, photo emission or secondary emission cathodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00X-ray tubes
    • H01J35/02Details
    • H01J35/04Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08Anodes; Anti cathodes
    • H01J35/12Cooling non-rotary anodes
    • H01J35/13Active cooling, e.g. fluid flow, heat pipes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00X-ray tubes
    • H01J35/22X-ray tubes specially designed for passing a very high current for a very short time, e.g. for flash operation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00X-ray tubes
    • H01J35/02Details
    • H01J35/04Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08Anodes; Anti cathodes
    • H01J35/112Non-rotating anodes
    • H01J35/116Transmissive anodes

Landscapes

  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Image-Pickup Tubes, Image-Amplification Tubes, And Storage Tubes (AREA)
  • X-Ray Techniques (AREA)

Abstract

PURPOSE:To strengthen a reflecting target and prevent temperature of the target from being raised, and to thereby form a high power ultra-short X-ray pulse generator tube by supporting the target with an anode exposed in part externally of a vessel. CONSTITUTION:A spherical X-ray entrance window 2 is fixedly mounted frontally of a cylindrical vacuum glass vessel 3, and a photoelectric surface 1 is formed interiorly of said window. A converging electrode 4 is arranged interiority of the vacuum glass vessel 3, said converging electrode forming an electron lens serving to project photoelectrons produced from the photoelectric surface 1 in a prescribed direction. A target 5, sufficiently thick, fixedly mounted on an anode electrode 7 is disposed at a focal position where spreading of the electron beams 11 is made minimum with use of the converging electrode 4. The anode 7 is fixed on the vessel with part thereof exposed externally of the vessel, whereby temperature of the target 5 can be prevented from being raised by forcedly cooling that portion.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、パワーの大きな超短X線パルスの発生が可能
な反射形X線発生管に関する。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a reflection type X-ray generating tube capable of generating ultra-short X-ray pulses with large power.

(従来の技術) 通常のX線発生装置はカソードをヒータで加熱し、熱電
子を発生させ、静電集束系で細い電子ビームを形成しタ
ーゲットを照射してX線を発生させるように構成されて
いる。
(Prior art) A normal X-ray generator is configured to heat a cathode with a heater to generate thermoelectrons, form a narrow electron beam using an electrostatic focusing system, and irradiate a target with it to generate X-rays. ing.

鋭いパルス状のX線を用いて種々の計測を行いたいとい
う強い要請があるが、熱陰極形の電極を用いたX線発生
装置は高い周波数応答に適していない。
Although there is a strong desire to perform various measurements using sharp pulsed X-rays, X-ray generators using hot cathode-type electrodes are not suitable for high frequency response.

前記要請に応えるために本件発明者は光電陰極(光電面
)を電子源とするX線発生管をすでに提案している。
In order to meet the above requirements, the inventor of the present invention has already proposed an X-ray generating tube using a photocathode (photocathode) as an electron source.

第4図は前記提案に係るX線発生管の要旨を示す断面図
である。
FIG. 4 is a sectional view showing the gist of the X-ray generating tube according to the proposal.

すなわち、レーザ光源(図示せず)の超短光パルス8に
より励起され光電面lより発生した電子ビームは、フォ
ーカス電wA4で集束され、微少なスポットになりX線
ターゲット5゛を照射する。
That is, an electron beam excited by an ultrashort light pulse 8 of a laser light source (not shown) and generated from a photocathode 1 is focused by a focusing electric field wA4, becomes a minute spot, and irradiates the X-ray target 5'.

この電子ビーム11で発生したX線は、まずX線ターゲ
ツト5自体を透過した後、ベリリウム金属窓6を透過し
容器外部へ取り出される。
The X-rays generated by the electron beam 11 first pass through the X-ray target 5 itself, and then pass through the beryllium metal window 6 and are taken out of the container.

このX線は前記超短光パルス8に対応するX線パルス1
0となる。
This X-ray is an X-ray pulse 1 corresponding to the ultrashort optical pulse 8.
It becomes 0.

このようにして発生させられたX線は鋭いパルス状であ
り種々の応用が可能である。
The X-rays generated in this manner have a sharp pulse shape and can be used in various applications.

しかしながら、前記構成の装置では発生したX線は、タ
ーゲツト5自体を透過する際の減衰を少なくするために
このターゲットの厚さをあまり厚(できない。
However, in the apparatus with the above configuration, the thickness of the target 5 cannot be made very thick in order to reduce the attenuation of the generated X-rays when they pass through the target 5 itself.

そのために、電子ビームパワー(電圧×電流)をあまり
大きくすることができないので、X線の出力パワーが制
限されており大出力が得られないという問題がある。
Therefore, the electron beam power (voltage×current) cannot be increased very much, so there is a problem that the output power of X-rays is limited and a large output cannot be obtained.

前述した装置のターゲット5として約10μmのチタン
膜が用いられているが、この場合電子ビーム加速をl0
KVとすると、電流量の上限は約10μAが上限となる
A titanium film of about 10 μm is used as the target 5 of the above-mentioned device, but in this case, the electron beam acceleration is
KV, the upper limit of the current amount is approximately 10 μA.

これ以上のビーム電流を供給すると、ターゲット5が赤
熱し、孔がおいてしまう。
If a beam current higher than this is supplied, the target 5 will become red hot and a hole will be formed.

(発明の目的) 本発明の目的は、出力の大きな超短X線パルスの発生が
可能な反射形X線発生管を提供することにある。
(Object of the Invention) An object of the present invention is to provide a reflection type X-ray generator tube capable of generating ultra-short X-ray pulses with large output.

(発明の構成) 前記目的を解決するために本発明による反射形X線発生
管は、真空容器と、前記真空容器内に形成された光電面
と、前記光電面の発生する光電子を一定方向に投射し、
かつターゲット上に微少スポットとして集束させるため
の電子レンズと、前記電子レンズにより形成されたスポ
ット状の電子ビームに照射されX線を発生する反射形の
ターゲットと、前記ターゲットを前記容器に支持するア
ノードと、前記X線を前記容器外に容易に透過させる薄
い金属板とから構成されている。
(Structure of the Invention) In order to solve the above object, a reflective X-ray generating tube according to the present invention includes a vacuum container, a photocathode formed in the vacuum container, and a method for directing photoelectrons generated by the photocathode in a fixed direction. project,
and an electron lens for focusing the electron beam as a minute spot on the target, a reflective target that generates X-rays when irradiated with the spot-shaped electron beam formed by the electron lens, and an anode that supports the target in the container. and a thin metal plate that allows the X-rays to easily pass through to the outside of the container.

(実施例) G’T′tgi*t$= M?:*)IK°林8翳  
 1詳細に説明する。
(Example) G'T'tgi*t$= M? :*) IK°Hayashi 8kou
1 will be explained in detail.

第1図は本発明による反射形X線発生管の実施例を示す
断面図である。
FIG. 1 is a sectional view showing an embodiment of a reflection type X-ray generating tube according to the present invention.

円筒状の真空ガラス容器3の前面に球面のX線入射窓2
が固定されており、その内面に光電面1が形成されてい
る。
A spherical X-ray entrance window 2 is placed in the front of a cylindrical vacuum glass container 3.
is fixed, and a photocathode 1 is formed on its inner surface.

前記真空ガラス容器3の内側には前記光電面1の発生す
る光電子を一定方向に投射する電子レンズを形成する集
束電極4が配置されている。
A focusing electrode 4 forming an electron lens for projecting photoelectrons generated by the photocathode 1 in a fixed direction is arranged inside the vacuum glass container 3.

前記集束電極4により、電子ビーム11の広がりが最小
となる焦点位置にアノード電極7に固定した充分厚いタ
ーゲット5を配置する。
A sufficiently thick target 5 fixed to the anode electrode 7 is placed at a focal position where the electron beam 11 spreads minimally by the focusing electrode 4.

アノード7は容器に固定されており、一部は容器外に露
出させられている。
The anode 7 is fixed to the container, and a portion is exposed outside the container.

前記ターゲット5の表面は電子ビーム11の入射線に対
して1頃斜させられている。
The surface of the target 5 is inclined about 1° with respect to the incident line of the electron beam 11.

前記ターゲット5の表面で発生したX線9を容器外部に
透過させるように、薄い500μm以下の厚さの金属板
(Be)の窓6が設けられており、X線9は前記窓6を
介して容器外に取り出される。
A window 6 made of a thin metal plate (Be) with a thickness of 500 μm or less is provided so that the X-rays 9 generated on the surface of the target 5 are transmitted to the outside of the container, and the X-rays 9 pass through the window 6. and removed from the container.

この窓はその面がターゲット5の表面で発生したX線9
に直角になるように取付けられている。
The surface of this window is the X-ray 9 generated on the surface of the target 5.
It is installed at right angles to.

ターゲット5の材料は必要なX線エネルギーに対応して
決定される。
The material of the target 5 is determined depending on the required X-ray energy.

次にターゲット材料とその材料の特性X線のエネルギー
を示す。
Next, the target material and the characteristic X-ray energy of that material are shown.

チタン(Ti)      4.5KeVバナジウム(
V)     4.96KeVクロム(Cr)    
  5.42KeV鉄(Fe)         6.
42KeVコバ′ルト (Co)      6.92
KeVニツケル(Ni)     7.47KeVカル
シウム(Ca)    8.04KeV前述のように本
発明ではアノード7の一部を容器外に露出させであるか
ら、この部分を強制的に冷却してターゲット5の温度上
昇を制限することができる。
Titanium (Ti) 4.5KeV Vanadium (
V) 4.96KeV Chromium (Cr)
5.42KeV iron (Fe) 6.
42KeV cobalt (Co) 6.92
KeV Nickel (Ni) 7.47KeV Calcium (Ca) 8.04KeV As mentioned above, in the present invention, a part of the anode 7 is exposed outside the container, so this part is forcibly cooled to lower the temperature of the target 5. rise can be limited.

第2図はアノード邪の冷却構造の実施例を示す断面図で
ある。
FIG. 2 is a sectional view showing an embodiment of an anode cooling structure.

この実施例はアノード7に冷却フィン12を設け、これ
を空冷用のファン13で強制的に冷却するように構成し
である。
In this embodiment, cooling fins 12 are provided on the anode 7, and the cooling fins 12 are forcibly cooled by an air cooling fan 13.

第3図はアノード部の冷却構造の他の実施例を示す断面
図である。
FIG. 3 is a sectional view showing another embodiment of the cooling structure for the anode section.

この実施例はアノード7の端面にペルチェ素子15を設
けたものである。このペルチェ素子15には端子16を
介してペルチェ効果を発生させる電力が接続されている
In this embodiment, a Peltier element 15 is provided on the end face of the anode 7. Power for generating the Peltier effect is connected to this Peltier element 15 via a terminal 16.

このペルチェ素子15に冷却水の出入口1日、19をも
つ水冷用のパイプ17を接触させてさらに冷却効果を増
大させである。
A water cooling pipe 17 having a cooling water inlet/outlet 19 is brought into contact with this Peltier element 15 to further increase the cooling effect.

(発明の効果) 以上詳しく説明したように本発明によるX線発生管は、
反射形のターゲットを、アノードで容器に支持しである
から、前述した通過形のターゲットを用いるものに比較
してターゲット自体を強固にすることができる。
(Effects of the Invention) As explained in detail above, the X-ray generating tube according to the present invention has
Since the reflective target is supported in the container by the anode, the target itself can be made stronger compared to the case where the above-mentioned pass-through target is used.

また前記ターゲットを前記容器に支持するアノードは放
熱効果をもつものであるがらターゲ7)の温度上昇を制
限することができる。
Further, although the anode supporting the target in the container has a heat dissipation effect, it can limit the temperature rise of the target 7).

また前記アノードを容器外に露出させて強制的に冷却す
ることができるから、電子ビームパワーは、従来の透過
形ターゲット方式に比べ格段に増加できることになる。
Furthermore, since the anode can be exposed outside the container and forcibly cooled, the electron beam power can be significantly increased compared to the conventional transmission target method.

その結果出力の制限は、光電面の電子流放出実力により
決められる。
The resulting output limit is determined by the electron flow emission capability of the photocathode.

従来の装置では光電流の上限は10pA程度であったが
、前述した強制冷却を行う実施例では、光電面の面積を
大きくし、その前面の電界強度を強くすることにより、
1mA〜10mAまで増加することができる。
In conventional devices, the upper limit of photocurrent was about 10 pA, but in the above-mentioned forced cooling example, by increasing the area of the photocathode and increasing the electric field strength in front of it,
It can be increased from 1 mA to 10 mA.

また、発生したX線はターゲット自体を透過する必要が
なくなるため、外部への取り出し効率を格段に増加する
ことになる。
Furthermore, since the generated X-rays do not need to pass through the target itself, the efficiency of extracting them to the outside can be significantly increased.

本発明によるX線発生管は、本件発明者の前述した先の
出願同様に光電面を電子源とするものであるから、同様
に高速のパルス状のX線が得られる。
Since the X-ray generating tube according to the present invention uses a photocathode as an electron source like the previous application by the present inventor, it can similarly obtain high-speed pulsed X-rays.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明による反射形X線発生管の実施例を示す
断面図である。 ’$ 2 rl!J 、t 7 /  f’ gRO)
74; ajRii!i (’)Xh% 911 @ 
i t It    ’□面図である。 第3図はアノード部の冷却構造の他の実施例を示す断面
図である。 第4図は先の発明に係るX線発生装置の構成例を示す断
面図である。 1・・・光電面     2・・・光入射窓3・・・真
空ガラス容器 4・・・フォーカス電極5・・・ターゲ
ット   6・・・Be窓7・・・アノード電極  8
・・・光パルス9・・・X線      10・・・X
線パルス11・・・電子ビーム  12・・・空冷フィ
ン13・・・空冷用ファン 14・・・空気流15・・
・ペルチェ素子 16・・・ペルチェ素子電流端子 17・・・水冷用パイプ 18・・・水入口19・・・
水出口
FIG. 1 is a sectional view showing an embodiment of a reflection type X-ray generating tube according to the present invention. '$2 rl! J, t7/f'gRO)
74; ajRii! i (')Xh% 911 @
It is a □ side view. FIG. 3 is a sectional view showing another embodiment of the cooling structure for the anode section. FIG. 4 is a sectional view showing an example of the configuration of the X-ray generator according to the previous invention. 1... Photocathode 2... Light incidence window 3... Vacuum glass container 4... Focus electrode 5... Target 6... Be window 7... Anode electrode 8
...Light pulse 9...X-ray 10...X
Line pulse 11...Electron beam 12...Air cooling fin 13...Air cooling fan 14...Air flow 15...
・Peltier element 16...Peltier element current terminal 17...Water cooling pipe 18...Water inlet 19...
water outlet

Claims (3)

【特許請求の範囲】[Claims] (1)真空容器と、前記真空容器内に形成された光電面
と、前記光電面の発生する光電子を一定方向に投射し、
かつターゲット上に微少スポットとして集束させるため
の電子レンズと、前記電子レンズにより形成されたスポ
ット状の電子ビームに照射されX線を発生する反射形の
ターゲットと、前記ターゲットを前記容器に支持するア
ノードと、前記X線を前記容器外に容易に透過させる薄
い金属板とから構成した反射形X線発生管。
(1) a vacuum container, a photocathode formed in the vacuum container, and projecting photoelectrons generated by the photocathode in a certain direction;
and an electron lens for focusing the electron beam as a minute spot on the target, a reflective target that generates X-rays when irradiated with the spot-shaped electron beam formed by the electron lens, and an anode that supports the target in the container. and a thin metal plate that easily transmits the X-rays to the outside of the container.
(2)前記ターゲットを支持するアノードの一部は前記
真空容器の外側に冷却可能に露出させられている特許請
求の範囲第1項記載の反射形X線発生管。
(2) A reflection type X-ray generating tube according to claim 1, wherein a part of the anode supporting the target is exposed to the outside of the vacuum container so that it can be cooled.
(3)前記薄い金属板はベリリウム板である特許請求の
範囲第1項記載の反射形X線発生管。
(3) The reflective X-ray generating tube according to claim 1, wherein the thin metal plate is a beryllium plate.
JP59261437A 1984-12-11 1984-12-11 Reflecting type x-ray generating tube Pending JPS61140042A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP59261437A JPS61140042A (en) 1984-12-11 1984-12-11 Reflecting type x-ray generating tube
DE19853543591 DE3543591A1 (en) 1984-12-11 1985-12-10 X-ray tube
FR858518315A FR2574592B1 (en) 1984-12-11 1985-12-11 REFLECTION TYPE X-RAY TUBE

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59261437A JPS61140042A (en) 1984-12-11 1984-12-11 Reflecting type x-ray generating tube

Publications (1)

Publication Number Publication Date
JPS61140042A true JPS61140042A (en) 1986-06-27

Family

ID=17361873

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59261437A Pending JPS61140042A (en) 1984-12-11 1984-12-11 Reflecting type x-ray generating tube

Country Status (3)

Country Link
JP (1) JPS61140042A (en)
DE (1) DE3543591A1 (en)
FR (1) FR2574592B1 (en)

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US5422926A (en) * 1990-09-05 1995-06-06 Photoelectron Corporation X-ray source with shaped radiation pattern
RU2161843C2 (en) 1999-02-17 2001-01-10 Кванта Вижн, Инк. Point high-intensity source of x-ray radiation
US6195411B1 (en) 1999-05-13 2001-02-27 Photoelectron Corporation Miniature x-ray source with flexible probe
US6377659B1 (en) * 2000-12-29 2002-04-23 Ge Medical Systems Global Technology Company, Llc X-ray tubes and x-ray systems having a thermal gradient device
US6781060B2 (en) * 2002-07-26 2004-08-24 X-Ray Optical Systems Incorporated Electrical connector, a cable sleeve, and a method for fabricating an electrical connection
US7469040B2 (en) 2004-03-02 2008-12-23 Comet Holding Ag X-ray tube for high dose rates, method of generating high dose rates with X-ray tubes and a method of producing corresponding X-ray devices
DE102008007413A1 (en) * 2008-02-04 2009-08-27 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. X-ray target

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52142984A (en) * 1976-05-24 1977-11-29 Yokogawa Hokushin Electric Corp X-ray generator
JPS5435078A (en) * 1977-08-11 1979-03-14 Minoru Kohana Litter treating method of pig breeding farm

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE228930C (en) *
US1565969A (en) * 1924-03-26 1925-12-15 Spiro Harry Cooling device for x-ray tubes
DE875247C (en) * 1935-04-28 1953-04-30 Siemens Reiniger Werke Ag High-voltage protective housing for discharge tubes, especially X-ray tubes
FR2076604A5 (en) * 1970-01-21 1971-10-15 Commissariat Energie Atomique
JPS5553050A (en) * 1978-10-12 1980-04-18 Taiji Yoneda Cooled rotary anticathode x-ray tube by brush

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52142984A (en) * 1976-05-24 1977-11-29 Yokogawa Hokushin Electric Corp X-ray generator
JPS5435078A (en) * 1977-08-11 1979-03-14 Minoru Kohana Litter treating method of pig breeding farm

Also Published As

Publication number Publication date
FR2574592B1 (en) 1992-03-20
FR2574592A1 (en) 1986-06-13
DE3543591A1 (en) 1986-06-12

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